本實驗利用簡單低成本的電化學沉積方式製備氧化鋅/鉬酸鋅複合薄膜光催化劑，利用定電位法在FTO基板上沉積氧化鋅基底，再利用循環伏安法將鉬酸鋅形成於氧化鋅基底上，成功製備出氧化鋅與鉬酸鋅複合光催化劑，並應用於光催化降解4-硝基苯酚。
透過XRD、SEM、循環伏安法以及EDS mapping 對ZnO/ZnMoO4薄膜進行製備條件最佳化探討，分別探討不同電位、溫度下所形成的ZnO基底對後續的鉬酸鋅形成之影響，以及不同pH值、掃描速率、鍛燒溫度對鉬酸鋅形成結果探討，可得知隨著電位、溫度改變，對鉬酸鋅的形成不會有很大的影響，但當電位較低時氧化鋅的沉積效果較差，而當溫度過高(70℃)時，由於氣泡的增加導致薄膜的破裂，使的薄膜的穩定性降低，此外隨著pH值以及掃描速率的降低，鉬酸鋅之形成量也會增加，但是當pH值(pH = 1)以及掃描速率(3 mV/s)過低時，薄膜會因鉬酸鋅的形成過多導致薄膜破裂進而造成薄膜穩定性降低，並藉由XRD以及SEM得知隨著鍛燒溫度的增加，其晶型結構越佳且顆粒性越明顯。
最佳化之ZnO/ZnMoO4光降解4-硝基苯酚，可在2小時內達到25.9%的降解效率，為了改善薄膜之光催化性能，透過定電位法修飾銀於薄膜表面，抑制光生電子-電洞對再復合速率，其降解4-硝基苯酚之降解效率在兩小時內可提升至46.9%。

In this work, fluorine doped tin oxide (FTO) glass modified with both zinc oxide and zinc molybdate by using simple electrodeposition in two-steps manner. First, zinc oxide was electrodeposited on FTO by constant current method. Then, the zinc molybdate modified layer using ZnO as the substrate is prepared by cyclic voltammetry.
ZnO/ZnMoO4 composite film has been characterized by using XRD、CV、SEM、EDS to optimize the experimental parameters. ZnO/ZnMoO4 composite film applied to photocatalytic degradation of 4-nitrophenol for 2 hours, the degradation rate of 4-nitrophenol reached 25.9%. To improve the photodegradation properties of the ZnO/ZnMoO4 composite film, the recombination of photogenerated electron-hole pairs can be suppressed by modifying metallic silver on film and the charge separation phenomenon can be enhanced. The photodegradation efficiency of the silver-modified ZnO/ZnMoO4 composite film is 21% higher than that of the pure ZnO/ZnMoO4 composite film. In this study, the immobilized photocatalytic composite material was successfully applied to degrade organic pollutants, reduce the possibility of secondary pollution, and improve the problem of water pollution.

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