本研究分別以濺鍍法與凝膠旋轉塗佈法沉積二氧化錫薄膜。主要目的是探討不同鍍膜方式與製程參數對二氧化錫薄膜的微結構與對氧氣的感測性之影響，並比較找出彼此間的關係。

　　濺鍍過程中，本研究使用摻雜2wt%鋰原子的二氧化錫做為感測薄膜的靶材，氬氣與氧氣流量比為3:1的條件下作濺鍍製程，之後在空氣下做600℃、2小時的退火處理。經靜態量測後發現，當工作溫度在300℃時，對氧氣具有最高靈敏度，其值為25.1。

　　另外，以凝膠旋轉塗佈法方式沉積二氧化錫薄膜可得到具多孔隙薄膜的微結構。鍍膜後，在空氣下做650℃，1小時的退火處理，薄膜具有比濺鍍產生的薄膜高的表面積。經靜態量測後，當工作溫度在250℃時，可得到對氧氣具有最高靈敏度，其值為111。

　　因此，以凝膠旋轉塗佈法方式沉積二氧化錫感測薄膜會比濺鍍法沉積二氧化錫感測薄膜得到對氧氣有較高的靈敏度值，而工作溫度也較低。

　In this study, two fabrication methods were used to deposit the tin dioxide thin film to investigate the influence of the fabrication parameters on the lattice orientation and oxygen gas sensitivity of the tin dioxide thin films.

　The tin dioxide layer with the 2 wt% doped Li, which served as the sensing materials, was deposited by sputtering with Ar/O2 (3:1) gas mixtures and annealed in an oxygen gas at 600℃ for 2 hours. By the static measurement, the experimental data showed that the maximum sensitivity was 25.1, and it achieved when the tin dioxide film was grown at 300℃.

　With the spin coating process, the porous films with high surface areas can be generated, and the sensitivity for O2 gas can reach 111. By the static measurement, experimental data also indicated that the pours film will generate the maximum sensitivity when the tin oxide films are grown at 250℃.

　Thus, the sensitivity of the tin dioxide thin film used the spin coating process deposition is higher than that of sputtering method. In addition, the temperature of the former is also at lower than that of the latter.

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