本論文提出一套適用於電漿輔助化學氣相沉積製程腔體清潔之遠距電漿源電路，此遠距電漿源電路於鍍膜製程設備中，可用於解離氣體及鍍膜腔體潔淨。而由於解離清潔氣體時，需於遠距電漿源腔體上產生高頻電磁場並且加熱，因此本論文提出一套能夠穩定對於負載加熱之遠距電漿源電路，輔以高頻感應加熱技術及結合功率因數修正器、高頻換流器、加熱線圈、加熱負載與諧振電路，同時融入定功率控制技術，確使遠距電漿源電路可以達成穩定功率輸出。又為期佐證遠距電漿源電路之實現可行性，本論文已建置一套遠距電漿源電路及詳以實測，測試結果均顯示本論文所設計之遠距電漿源電路業已符合測試需求，研究成果將可提供製程設備相關產業參考。

This thesis proposes the circuit of remote plasma source fitting for chamber-cleaning during the chemical vapor deposition process. With the aid of this plasma source, the cleaning gas can be dissociated to better ensure the quality of cleaning work. Yet, in order to dissociate the cleaning gas, the electromagnetic field is required to generate so that the sufficient heat is provided for the chamber-cleaning. Therefore, this thesis develops a remote plasma source with the stable power output. The remote plasma source is composed of the power factor correction, the high-frequency inverter, the heating coil, the heating load, and the resonant circuit, where the constant-power control method is also included to make sure that the remote plasma source circuit is capable of delivering the stable power. Meanwhile, by considering the verification of the feasibility of proposed circuit, a remote plasma source is well realized with different tests. Experimental results indicate that the developed circuit of this thesis satisfies the requirements. These test outcomes serve as beneficial references for process equipment manufacturing industry.

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