本論文主旨在於研製非對稱式雙極性脈衝電壓源之定功率電漿驅動系統，並在系統前級採用升壓型功率因數校正電路，以提升系統整體功率因數，同時整合一雙輸出之返馳式電源轉換器於系統中，以產生適當之正負直流準位電壓，並藉由半橋式換流器之開關切換，進而產生非對稱式雙極性脈衝電壓，最後利用升壓變壓器之協助進行升壓，即可驅動電漿系統。此外，本論文亦設計閉迴路伏-秒平衡控制及系統定功率控制，可用以防止因脈衝電壓不平衡而導致變壓器飽和現象，亦可利用定功率控制使電漿負載操作於較優良之工作區域，有助於產生較佳之電漿品質。本文將所提系統概念予以實務雛型研製，並經由不同情形之測試及分析，應有助於提供相關電漿系統工業發展參考。

The main theme of this thesis is to deign an asymmetric bipolar pulsed constant power supply for plasma drive systems. In this proposed system, the boost converter with power factor correction circuit is adopted in the front stage. This is followed by the integration of a flyback converter to generate the appropriate level of positive-negative DC level voltage. Next, through the switching design of half-bridge converter, the asymmetric pulsed power can be produced to deliver to the transformer to increase the voltage to drive the plasma system. Meanwhile, a scheme of volt-second balance as well as constant power control has been included in this circuit design, anticipating reaching a higher quality of plasma. This proposed method has been tested through simulation and prototype experiment under different scenarios. Test results are expected to serve as useful reference for plasma system industry development.

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