本研究主要探討鉻鉬釩合金鋼基材於進行磷酸錳化成皮膜處理時，不同之化成溫度及其外加電位對所生成之化成皮膜結構與耐蝕性質的影響。研究中利用掃瞄式電子顯微鏡（Scanning electron microscopy, SEM）、能量散佈光譜儀（Energy dispersive spectroscopy, EDS）及X光繞射分析儀(X-ray diffraction, XRD)等分析皮膜的微觀結構及其化學組成，並以電化學交流阻抗頻譜（Electrochemical impedance spectroscopy, EIS）測試及鹽水噴霧試驗評估其皮膜之耐蝕性。

　　研究結果顯示，於不同化成溫度下所生成之皮膜的結晶性會有所差異。當化成溫度為70及80 ℃時，所生成之皮膜主要為結晶性不佳之磷酸錳層，其極化阻抗值約為1000～1500 Ω-cm2左右。隨著化成處理時間的增加，皮膜厚度增加，但其阻抗值並未隨之有明顯地增加；而於90 ℃下進行化成皮膜處理時，會先於基材表面上生成結晶性較差之磷酸錳皮膜，再於其上沈積一層顆粒狀的結晶層，其組成為(Mn,Fe)5H2(PO4)4‧4H2O。而該溫度下化成約40分鐘後，即可於基材表面生成一完整被覆之磷酸鹽皮膜，其阻抗值可達13000 Ω-cm2左右。

　　於不同外加電位下進行化成皮膜處理所生成之皮膜具不同之結構與耐蝕性。於90℃下，外加陽極電位所生成之皮膜可得較厚之皮膜，而皮膜相對於開路電位下所得之皮膜，有較高的鐵含量，且有較低極化阻抗；外加陰極電位時，所生成之皮膜則相對開路電位下生成之皮膜有較低的鐵含量，以及較高之阻抗值。

　The manganese phosphating conversion coating formed on Cr-Mo-V steel with different temperature and applied potential is investigated in this study. The morphology, cross section and crystal structure have been investigated by SEM, EDS and XRD. And the corrosion resistance has been evaluated by EIS and salt spray test.

　The result showed that the crystallinity of the manganese phosphating conversion coating formed at 70 or 80 ℃ was poor, and its polarization resistance was about 1000～1500 Ω-cm2. The XRD showed that phosphate coating with poor crystallinity was formed on the surface of Cr-Mo-V steel. The thickness of the coating increased with the increasing of phosphating time. And the resistance didn’t vary obviously with the increasing of thickness. The whole phosphating reaction involved two steps: forming of manganese phosphating coating layer with poor crystallinity and forming of crystalline (Mn,Fe)5H2(PO4)4‧4H2O. As the phosphating increased, the coverage of the phosphating coating increased. The surface of substrate would be completely covered with crystalline phosphating coating. And the polarization resistance would be raised to the value 13000 Ω-cm2 approximately.

　The phosphating coating formed at 90 ℃ with applied anodic potential would be thicker than the coating formed without applying potential because of the increase in thickness of amorphous phosphating layer. Besides, the resistance was inferior to the coating formed without applying potential.

　On the contrary, the phosphating coating formed at 90 ℃ with applied cathodic potential would be thinner than the coating formed without applying potential because of the decrease in thickness of the amorphous phosphating layer. Besides, the resistance was superior to the coating formed without applying potential.

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