本實驗是在討論平面模型上，可產生出低溫電漿面積之改變與平面震互作用下觀察其震波反射行為，利用配合震波管壓力感測器所紀錄之動態壓力數據來推導震波入射速度與其底面之反射速度的比率，由於放電面積之改變，兩者分別產生不同的反射震波動態壓力值。於設定的馬赫數1.25至1.65的範圍內，來探討入射震波、反射震波之間的速度關係，並探討隨著馬赫數增加，震波動態壓力數據的改變狀況，並採用彩色紋影法的拍攝技術，擷取紀錄震波作用於模型上的影像。結果顯示在沒有電漿作用下，其測試結果與理論值的趨勢是一致的。在有電漿作用的情形下，入射與反射震波之速度比率和壓力改變比率均無因電漿作用而產生改變，其結果與理論值趨勢一致。檢討其可能的原因，是因為入射與反射震波的運動方向垂直於電漿電場的方向，因此電漿無法對於震波的運動產生顯著的影響。

The planar shock reflection over a plane surface model covered with low temperature plasma has been investigated by using a shock tube with rectangular cross section. From the recorded time history of the dynamic pressure in the shock tube in front of the model, the shock wave velocity of both incident shock and reflective shock for model with and without low temperature plasma have been obtained for shock Mach number of 1.25 to 1.65. The flow structure of planar shock reflection is observed by using a color Schlieren method. The measured results show that the effects of plasma on the reflection shock speed as well as strength are negligible.
The observed results show that with and without the interaction of plasma, the experiment results of pressure jump is of similar trend with theoretical results. It has been observed that the plasma does not affect the strength of reflected shock wave. Considering the possible reasoning, since the direction of the incident and reflective shock are both perpendicular to the direction of the electrical field of the plasma, therefore the plasma does not have a significant influence on the reflected shock wave.

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