本研究採用電化學沉積法（Electrochemical Deposition, ECD）於導電玻璃基板上製備氧化鋅（ZnO）薄膜，並透過後續熱退火處理以提升其結晶品質與誘導孔洞結構，進一步探討其對微觀結構、光學特性及壓電性能之影響。退火過程分別採用氬氣（Ar）與氫氣（H₂）作為氣氛控制參數，前者在500 °C、0.5 torr條件下進行3、6、9、12與15小時退火；後者則在300 °C、0.5 torr條件下進行15、30與45分鐘的短時處理，以系統性比較氣氛與時間對氧化鋅薄膜結構調控之差異性。
結構與形貌分析部分，透過掃描式電子顯微鏡（Scanning Electron Microscopy, SEM）觀察到退火後樣品表面明顯形成孔洞結構，其數量與孔徑隨退火時間延長而顯著增加，惟超過一定時間後孔洞密度反而略有下降。X光繞射（X-ray Diffraction, XRD）分析顯示薄膜主要沿 c 軸（002）方向成長，並隨退火條件改善，峰強度增加、半高寬（FWHM）縮小，且峰位產生偏移，顯示晶格應力與晶粒尺寸的變化。拉曼光譜（Raman Spectroscopy）進一步驗證晶體品質與缺陷密度之變化；而紫外-可見光吸收光譜（UV-Vis）與光激發螢光（Photoluminescence, PL）結果則顯示，退火可調變能隙大小與缺陷相關能階。原子力顯微鏡（Atomic Force Microscopy, AFM）則提供表面粗糙度與孔洞分布之量化資訊。
本研究進一步將氧化鋅多孔薄膜應用於壓電奈米發電機（Piezoelectric Nanogenerator, PENG）元件之製備，並在不同外加力（10、20、30、50 N）下量測其電流響應。結果顯示，相較於未退火或未具孔洞結構之樣品，經氬氣或氫氣退火後之多孔薄膜顯著提升其壓電輸出，最大輸出電流可達原始樣品之數十倍，顯示孔洞結構有助於應力集中與壓電效應強化。
綜合而言，本研究建立一套結合電化學成長與氣氛退火調控之多孔氧化鋅薄膜製備流程，並證實其於壓電能源採集領域具潛在應用價值。相關分析亦提供深入理解氧化鋅薄膜微觀結構與功能性質間之關聯性，為未來高性能奈米能源裝置材料之設計與優化提供參考依據。

In this study, porous ZnO thin films were fabricated via electrochemical deposition followed by annealing in argon or hydrogen atmospheres. The pore formation mechanisms and their influence on piezoelectric properties were systematically explored. Argon annealing induced pores through gradual grain reorganization and stress relaxation, requiring longer durations but yielding uniform porosity that enhances piezoelectric output. In contrast, hydrogen annealing promoted rapid pore formation via defect generation and gas volatilization, with simultaneous defect passivation (e.g., VOH complex formation), albeit with less uniform pore distribution. The results highlight that optimized porosity can enhance piezoelectric performance, but excessive or poorly distributed pores may hinder it. This work provides insights into tuning ZnO porosity and defects through atmospheric control for improved energy harvesting applications.

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