簡易檢索 / 詳目顯示

研究生: 林琮皓
Lin, Tsung-hau
論文名稱: 利用陽極氧化鋁模板製作銅銦硒陣列式奈米柱
Copper indium diselenide nanowire arrays by electrodeposition in porous alumina templates
指導教授: 洪茂峰
Houng, Mau-Phon
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2014
畢業學年度: 102
語文別: 中文
論文頁數: 86
中文關鍵詞: 陽極氧化鋁銅銦硒太陽能電池陣列式奈米柱
外文關鍵詞: AAO, CuInSe2, nanowire arrays
相關次數: 點閱:108下載:0
分享至:
查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報
  •   本研究是以陽極氧化鋁(Anodic aluminum oxide,AAO)模板進行電鍍,製作銅銦硒(CuInSe2,CIS)奈米柱陣列,以奈米結構提升CuInSe2材料有效能帶,進而提升其應用於太陽能電池效率。以鋁基板進行陽極氧化反應,經拋光蝕刻等製程,能有效地移除阻擋層使模板與工作金極具有良好接觸。CuInSe2沉積技術,為達到大範圍且均勻沉積及材料比例正確之成果,討論有機物二甲基亞碸(DMSO)濃度及調整工作週期(duty cycle)對於CuInSe2材料比例及沉積均勻探討分析,並於最後移除多孔氧化鋁模板。
      陽極氧化鋁模板孔徑約80-100nm,厚度經九小時陽極氧化反應約24-27μm,調變DMSO濃度及工作週期(duty cycle)進行沉積CuInSe2,填孔率可達約92%,沉積後可達1-1.5μm,速率約95nm/min,CuInSe2材料比例經量測分析,其Cu:In:Se約為1:1:2,為CuInSe2最佳比例。

    We successfully fabricated ternary CuInSe2 nanowire arrays in a novel acidic Dimethyl sulfoxide (DMSO)-aqueous electrolyte using pulse electrodeposition techniques with the assistance of an anodized aluminum oxide (AAO) template and investigated the effects of deposition potential and a DMSO additive on the composition and crystallization of CuInSe2 nanowires.The addition of DMSO into the electrolyte significantly affects the pore-filling ratio and the growth rate of CuInSe2 nanowires. Proposed mechanism for the growth mechanism of nanowires deposited in the electrolyte with DMSO was presented on the basis of kinetic and thermodynamic process. Photoelectrochemical (PEC) characterizations showed that the CuInSe2 nanowires deposited in the electrolyte containing 0.5 mM DMSO exhibited a superior photocurrent response than the CuInSe2 nanowires deposited in the electrolyte without DMSO.

    目錄 摘要………………………………………………………………………………......….iii Abstract…………………………………………………………...…………......…......iv 誌謝…………………………………………………………………………...................ix 目錄………………………………………………………………....…………......…….xi 表目錄……………………………………………………………...…………….....…xiv 圖目錄…………………………………………………………………..……….....…...xv 第一章 緒論………………………………………………………………..........1 1.1 前言……………………………...……………………….....……………....…..1 1.2 太陽能電池簡介…………………..……………………….…………….....…..2 1.2.1 銅銦硒太陽能電池……......……………………………………......…...4 1.2.2 銅銦硒奈米結構……………………………………………......……...5 1.3 陣列式奈米柱……………………...………………………….………….....….6 1.3.1 奈米柱製作………………….…………………………………….........7 1.3.2 模板沉積法………………….…………………………………….........8 1.4 研究動機…………………………….………………………………….....….11 第二章 理論基礎……………………………………………………..........…12 2.1 陽極氧化鋁…………………………………………………………….....…...12 2.1.1 陽極氧化反應……………………………………………………......…13 2.1.2 多孔氧化鋁…………………………………………………………......15 2.2 DMSO應用………………………………………………….………….....…...18 2.2.1 DMSO……………………………………………………………….......18 2.2.2 模板沉積應用…………………………………………………......….19 2.3 電鍍調變參數…………………………………………….…………….....…20 2.3.1 循環伏安法…………………………………………………….......…20 2.3.2 工作週期……………………………………………………….......…21 2.4 成核機制………………………………………………….…………….....…23 2.4.1 動力學……………………………………………………….…......…23 2.4.2 熱力學…………………………………………………………….......24 第三章 實驗方法與量測儀器介紹……………………...........…….25 3.1 實驗流程………………………………………………….…………….....…25 3.1.1 模板製程…………………………………………….…………......…26 3.1.2 阻擋層蝕刻…………………………………….………………......…28 3.1.3 CuInSe2沉積….…………………………………...…………….....…29 3.1.4 模板蝕刻….………………………………………………………......31 3.2 實驗藥品與材料………………………………………….……………….....32 3.2.1 模板製作藥品……………………………………….……………......32 3.2.2 沉積CuInSe2藥品……...………………………….….……………......32 3.3 實驗參數…………………………………………………….…………….....33 3.3.1 模板製程參數……………………………………………….…......…33 3.3.2 CuInSe2電解液參數……………………………………..…………......33 3.3.3 DMSO濃度參數……………………………………………….…….....33 3.3.4 Duty Cycle電鍍參數………………………………………..………......34 3.3.5 模板蝕刻參數……………………………………………………..........34 3.4 量測儀器介紹………………………………………………….……….........35 3.4.1 場發射掃描式電子顯微鏡(FE-SEM)……...……………….….........…35 3.4.2 能量分析光譜儀(EDX)……………………...…………..…………......35 3.4.3 X光繞射儀(XRD)………......………....……………………….…….....36 3.4.4 拉曼光譜儀(Raman)………….…………………………..………......38 3.4.5 穿透式電子顯微鏡(TEM)……………………………….....…….......39 第四章 結果與討論………………………………………………............…41 4.1 模板製作…………………………………………………………………........42 4.1.1 鋁基板拋光….…………………………………………………......…42 4.1.2 模板結構…….………………………………………………......……45 4.1.3 鋁蝕刻….………………………………………………………......…46 4.1.4 阻擋層蝕刻….………………………………………………......……47 4.2 DMSO影響………………………………………………………….......…48 4.2.1 接觸角……………………………………………………….…......…48 4.2.2 沉積情形....…………………………………………….………......…49 4.2.3 CuInSe2材料討論…..………....…………..………………................53 4.2.4 DMSO影響…………………....………………………………......…54 4.3 脈衝電位………………………………………………………………........…61 4.3.1 還原電位….………………………………………………………......61 4.4 工作週期(duty cycle) …………………………………………......…………..65 4.4.1 沉積情形(SEM) ………………………………………………......….66 4.4.2 CuInSe2材料討論……………………………………………..…......…69 4.4.3 成長機制…………………………………………………….…......…75 4.5 模板蝕刻………………………………………………………………........…79 4.5.1 蝕刻製程…………………………………………………………......…79 第五章 結論……………………………………………………………..........…82 參考文獻……………………………………………………………....…….......…84

    [1]楊德仁,“太陽能電池材料”, 五南圖書出版公司,(2009).

    [2] L.L. Kazmerski, F.R. White, G. K. Morgan , Applied Physics Letters,
    Vol.29, No.4 , pp.268-270,(1976).

    [3] M.A.Contreras, A. M. Gabor, A. L. Tennant, S. Asher, J.Tuttle, R.
    Noufi,Progress in Photovoltaics:Research and Applications,No.2, pp.287-292,(1994).

    [4] P. Jackson , D. Hariskos , E.Lotter ,S. Paetel , R. Wuerz , R. Menner , W.Wischman , M , Powalla , Progress in Photovoltaics : Research and Applications ,Vol.19, No.7, pp. 894-897, (2011).

    [5] Piao Liu,Vijay P. Singh, Suresh Rajaputra, Sovannary Phok, Zhi Chen, Characteristics of copper indium diselenide nanowires embedded
    in porous alumina templates,Vol. 25, No. 2,(2010).

    [6] Sovannary Phok, Suresh Rajaputra and Vijay P Singh, Copper indium diselenide nanowire arrays by electrodeposition in porous alumina templates, Nanotechnology 18,(2007) .

    [7] A. Palacios-Padrós , F. Caballero-Briones , Fausto Sanz, Enhancement in as-grown CuInSe2 film microstructure by a three potential pulsed electrodeposition method, Electrochemistry Communications 12,pp. 1025–1029 ,(2010).

    [8] Dongsheng Xu1, Yajie Xu, Dapeng Chen2, Guolin Guo), Linlin Gui, Youqi Tang, Preparation and characterization of CdS nanowire arrays by dc electrodeposit in porous anodic aluminum oxide templates, Chemical Physics Letters 325,pp. 340–344,(2000).

    [9] Terry T. Xu, Richard D. Piner, and Rodney S. Ruoff, An improved method to strip aluminum from porous anodic alumina films, Langmui,pp.1443-1445,(2003).

    [10]吳明道,”陽極氧化之奈米多孔氧化鋁的研究” ,國立成功大學材料科學及工程學系博士論文,(2005).

    [11] Wen-Jin Li, Way-Ling Yu, Chia-Ying Yen, Pulsed electrodeposition of Bi2Te3 and Bi2Te3/Te nanowire arrays from a DMSO Solution, Electrochimica Acta 58,pp. 510– 515 ,(2011).

    [12] Humberto Gomez & Gonzalo Riveros & Daniel Ramirez & Rodrigo Henriquez & Ricardo Schrebler & Ricardo Marotti & Enrique Dalchiele, Growth and characterization of ZnO nanowire arrays electrodeposited into anodic alumina templates in DMSO solution, J Solid State Electrochem16:197–204,(2012).

    [13] Pin-Kun Hung, Tsung-Hau Lin, and Mau-Phon Houng, Characteristics of CuInSe2 nanowire arrays electrodeposited into anodic alumina templates with dimethyl sulfoxide (DMSO) additive, Journal of The Electrochemical Society,pp.79-86,(2014)

    [14] A. J. Yin, J. Li, W. Jian, A. J. Bennett, and J. M. Xu, Fabrication of highly ordered metallic nanowire arrays by electrodeposition, applied physics letters volume 79,(2001).

    [15]Sangwoo Shin,a Beom Seok Kim,Kyung Min Kim,Bo Hyun Kong,Hyung Koun Chob and Hyung Hee Cho, Tuning the morphology of copper nanowires by controlling the growth processes in electrodeposition,(2011).

    [16] A. Kampmann , V.S. , J. Rechid , R. Reineke-Koch , Large area electrodeposition of Cu(In,Ga)Se2. Thin Solid Films , vol.361-362 pp.309-313, (2000).

    [17] Naglaa Fathy , R.K. , Masaya Ichimura , Preparation of ZnS thin films by the pulsed electrochemical deposition , Materials Science and Engineering , vol.107 , p p. 271-276, (2004).

    [18]許樹恩,吳泰伯,”X 光繞射原理與材料結構分析”,中國材料學會,p.169,(1996).

    [19]汪建民,”材料分析”,中國材料科學學會,(1998).

    [20]莊達人,VLSI製造技術,高立圖書股份有限公司,(1995).

    無法下載圖示 校內:2024-12-31公開
    校外:不公開
    電子論文尚未授權公開,紙本請查館藏目錄
    QR CODE