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研究生: 鄭詩穎
Cheng, Shih-Ying
論文名稱: 藉陽極氧化鋁模板製作銅奈米線及其接合行為之研究
The manufacture and bonding behavior of copper nanowire prepared with the aid of anodized aluminum oxide template
指導教授: 林光隆
Lin, Kwang-Lung
學位類別: 碩士
Master
系所名稱: 工學院 - 材料科學及工程學系
Department of Materials Science and Engineering
論文出版年: 2023
畢業學年度: 111
語文別: 中文
論文頁數: 159
中文關鍵詞: 陽極氧化鋁模板脈衝電鍍奈米銅線接合強度破損機制
外文關鍵詞: anodic aluminum oxide template, pulse plating, copper nanowire, bonding strength , fracture mechanism
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  • 本研究藉由自製陽極氧化鋁模板(Anodic Aluminum Oxide, AAO),以脈衝電鍍的方式沈積奈米銅線並施以不同的熱壓接條件,探討模板和奈米線之微結構、奈米線對接之機械性質、擴散行為和破斷面之破損機制。觀察模板微結構得知鋁的表面粗糙度越低,製作出的AAO其孔徑越大; 陽極處理時,透過電壓下降之速率調控可控制AAO底部分支狀結構厚度,藉此達到阻障層薄化以利於後續電鍍。觀察奈米線微結構得知以定電流、固定正向脈衝時間(Tf)並在特定的反電鍍時間(Tr)和停留時間(Toff)下,奈米線填孔率可達到100 %,可製作出長度10 μm、直徑約75 nm且長度均勻性良好(在10 μm的AAO內奈米線長度達10 μm的比例約為90 %)的銅奈米線。於室溫下以不同壓力對接奈米線,進一步於還原氣(95 % N2+5 % H2)加熱,結果顯示於室溫在壓接壓力為23±1 MPa壓接10分鐘後,其最大拉伸強度為 1.17± 0.13 MPa,再加熱至250 ℃持溫30分鐘後,其最大拉伸強度提升為 8.41 ± 0.27 MPa,於此條件下的拉伸破斷面顯示奈米線由於加熱表面擴散導致緊燒結成團簇,拉伸破裂呈現五種可能的破斷機制,除了沿奈米線接合之界面,大部分沿尚未反應的鋁和殘留的AAO之間劈裂,少部分由殘留的AAO分支狀起始點劈裂;研究結果顯示不同界面間的接合強度差異導致不均勻的劈裂行為。

    Cu nanowire has been proposed as interconnects alternate for Cu to Cu bonding to fulfill the low-temperature packaging of high performance fine pitch electronic devices. This work investigated the manufacturing of Cu nanowire via the assistance of anodic aluminum oxide (AAO) template. The microstructures of AAO prepared under different pretreatments and barrier layer thinning processes were investigated. The 75 nm diameter copper nanowires with length of around 10 μm and good uniformity (~90 %10 μm NW in 10 μm AAO) were successfully fabricated by appropriate optimal stripping time (Tr) and pause time (Toff) for electroplating. The fabrication process achieved 100 % pore filling rate. The pulse plating gave rise to a flat Cu appearance on AAO surface. The bonding strength, diffusion behavior and fracture mechanism were investigated for the joined specimens. The joining was conducted by compressing bonding under forming gas (95% N2 + 5% H2).The maximum bonding strength achieved was 1.17 ± 0.13 MPa for bonding at room temperature with a bonding pressure of 23 ± 1 MPa for 10 minutes. The bonding strength increased to 8.41 ± 0.27 MPa when bonding at 250 °C for 30 minutes. The sintering cluster of nanowires was observed at the fracture surfaces of the high-temperature bonding specimens. The fracture mechanism investigation showed that the fracture may occur within copper nanowires and at the interface between the remaining aluminum and AAO. This indicated that there are 5 possible fracture interfaces due to different bonding strength between NWs and AAO and Al.

    中文摘要 I Extended Abstract III 致謝 XXXI 總目錄 XXXII 圖目錄 XXXVII 表目錄 XLIX 第一章 簡介 1 1-1 先進封裝之發展趨勢 1 1-2 銅對銅接合之研究方向 1 1-3 銅對銅接合方法之探討 2 1-3-1 表面活化銅對銅接合(Surface activated Cu-to-Cu bonding) 2 1-3-2 鈍化層輔助銅對銅接合(Passivation layer assisted Cu-to-Cu bonding) 5 1-3-3 織構控制銅對銅接合(Texture modified Cu-to-Cu bonding) 7 1-3-4 銅奈米線接合(Copper nanowire bonding) 9 1-4 銅奈米線製作方法之探討 16 1-4-1 化學氣相沈積法(Chemical vapor deposition, CVD)製備銅奈米線 16 1-4-2 氣液固成長法(Vapor liquid solid, VLS)/氣固成長法(Vapor solid reaction growth, VSRG)製備銅奈米線 18 1-4-3 電化學沈積法(Electrodeposition, ECD)製備銅奈米線 21 1-5 輔助電鍍之陽極氧化鋁模板 27 1-5-1 陽極氧化鋁模板形貌與形成機制 27 1-5-2 影響陽極氧化鋁模板形貌之主要因素 31 1-5-3 陽極處理後製程 36 1-6 銅奈米線微結構和其接合行為探討 42 1-6-1 鋁片退火後對於奈米線微結構之影響 42 1-6-2 表面粗糙度對於奈米線微結構之影響 42 1-6-3 銅奈米線之優選取向 43 1-6-4 銅奈米線接合強度及微結構 43 1-7 研究動機 49 第二章 實驗方法與步驟 50 2-1 實驗構想 50 2-2 鋁陽極處理實驗 53 2-3 脈衝電鍍奈米線實驗 57 2-4 奈米線接合實驗 59 2-6 陽極氧化鋁薄膜微結構觀察 62 2-6-1 掃描式電子顯微鏡分析 62 2-6-2 雙束型聚焦離子束儀分析 62 2-6-3 背向散射電子繞射分析 64 2-6-4 原子力顯微鏡(AFM)分析表面粗糙度 64 2-6-5 奈米線填充於陽極氧化鋁模板之填孔率估算 65 2-6-6 銅奈米線接合面積估算 65 2-7 銅奈米線微結構觀察與機械性質分析 68 2-7-1 掃描式電子顯微鏡分析 68 2-7-2 X-Ray 繞射分析 68 2-7-3 拉伸性質分析 68 2-7-4 穿透式電子顯微鏡分析 68 第三章 實驗結果與討論 70 3-1 AAO 微結構分析 70 3-1-1 一次陽極處理時間對孔徑均勻性之影響 70 3-1-2 表面粗糙度對孔徑大小之影響 73 3-1-3 AAO 厚度與二次陽極處理時間之關係 77 3-1-4 擴孔時間對 AAO 微結構之影響79 3-1-5 阻障層薄化的電壓下降速率對 AAO 底部阻障層之影響 83 3-2 直流電鍍和脈衝電鍍銅奈米線微結構分析 89 3-2-1 直流電鍍和正向脈衝電鍍銅奈米線之微結構分析 89 3-2-2 脈衝電鍍銅奈米線在不同反電鍍時間(Tr)和停留時間(Toff)之微結構分析 95 3-3 移除陽極氧化鋁薄膜表面銅粒之方法探討 99 3-3-1 外加反向電流溶解表面銅粒 99 3-3-2 外加正向電流電鍍表面銅層 103 3-4 電鍍銅奈米線之表面形貌和均勻度探討 105 3-4-1 純鋁試片經退火前處理對電鍍奈米線之微結構分析 105 3-4-2 電鍍銅奈米線之填孔均勻度探討 109 3-5 銅奈米線之優選取向探討 113 3-6 銅奈米線接合之微結構和接合強度分析 116 3-6-1 銅奈米線於室溫接合之界面形貌探討 116 3-6-2 銅奈米線於室溫接合之接合強度分析 122 3-6-3 銅奈米線於加熱後微結構分析 124 3-6-4 銅奈米線於加熱後接合強度分析 130 3-7 拉伸破斷面分析 134 第四章 結論 151 參考文獻 153

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