數位微影系統也稱無光罩微影系統，其中核心部件為數位微鏡面裝置(DMD)，它可以控制微小鏡面進行圖形的曝光，其取代實體光罩，節省光罩的製作成本與時間，在圖形定義上也更加靈活。應用範圍包括半導體積體電路、平面顯示器、微光學元件和微機電等領域。本研究探討DMD 連續曝光圖案運行下，得到大量的圖像幀(pattern frame)數據，但需要很長的時間來計算曝光圖案成像(pattern image)。故旨在解決當數位光罩微影機台執行曝光的過程中，資料計算時間過久而造成的當機問題，因此提出了一種縮減光柵化(rasterization)的資料量方法，該方法使用GDSII 的檔案格式特性，將圖形打包成各單位元(cell) ，並將相同的單位元以陣列的方式展開，進而縮小資料量，使能夠在高速曝光運轉下，達到高品質的曝光圖案成像，並降低整體製程運作時間，增加生產效率。

The digital lithography system is also called as maskless lithography system. The core component is digital micro-mirror device, DMD, which can control the micro mirror for exposure pattern. It replaces the physical mask and saves the production cost and time of the mask. It is also more flexible for the design pattern. It can apply to semiconductor integrated circuits, flat-panel displays, micro-optical components, and micro-electromechanical fields. This study investigates the continuous exposure pattern operation of DMD, which obtains a large amount of pattern frame data, but requires a long time to calculate the exposure pattern image. The purpose of this study is to solve the crash problem caused by long data calculation time when the digital lithography system performs exposure. Therefore, a method for reducing the rasterization data volume is proposed. This method uses the file format characteristics of GDSII to package the polygons into cells, and expands the same cells into an array, thereby reducing the data. It can achieve high-quality exposure pattern imaging under high-speed exposure operation, reduce the overall process operation time, and increase production efficiency.

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