本論文係針對射頻電漿設備用阻抗匹配器，研究並改良其動態調控機制。為使電漿製程設備於操作中維持穩定且獲得最大功率轉移，須藉由阻抗匹配器調控，令等效輸入阻抗與射頻電源特性阻抗同為50Ω，即達成阻抗匹配之目的。本文對於操作頻率13.56MHz之L型匹配網絡，探討可變元件與整體等效阻抗間靈敏度關係。建立改良型阻抗匹配調控機制，對射頻信號轉換之阻抗與相位訊號判斷，優先以阻抗值50Ω調整，調控達成等效阻抗50Ω之目的。最後於MATLAB建模分析，模擬調控機制過程與阻抗變化，藉由模擬與實驗測試結果，驗證本論文阻抗匹配調控機制可行性。

This thesis investigates and modifies the tuning mechanism for matching box using in plasma chamber system. In order to maintain the plasma chamber system operating in stable and the best power transmission, impedance matching box must be tuned so that the equivalent impedance is equal to 50 ohms. For the L-type matching network operating at 13.56 MHz, this study analyzes the sensitivity between matching network components and the overall equivalent impedance. According to the magnitude and phase of the signal of RF power, tuning reaches the equivalent impedance equal to 50 ohms, and giving priority to the 50 ohms magnitude value is the main feature of the modified tuning mechanism. Finally, simulating and experimental results show the feasibility of this tuning mechanism.

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