本篇論文是以程序控溫反應/脱附(temperature- programmed reaction/desorption, TPR/D）和反射吸收紅外光譜(reflection absorption infrared spectroscopy, RAIRS) 探討超高真空系統中，FCH2CH2OH於乾淨及有氧覆蓋的Ni(111)表面的熱化學、吸附位向及反應中間物。FCH2CH2OH在乾淨的Ni(111)表面會分解形成氫氣及CO脫附。在約180 K~200 K的溫度範圍內，FCH2CH2OH分子的C-F和O-H鍵會斷裂並在表面生成(-CH2CH2O-)的中間物，此Oxametallacycle可在280 K穩定存在。
FCH2CH2OH在有氧覆蓋的Ni(111)表面除了分解形成氫氣及CO脫附外，還有乙醛和CO2。隨著曝露量的增加這些產物的相對量會先增加後減少。我們推測FCH2CH2OH於170 K在表面開始形成FCH2CH2O-。當溫度超過300 K，FCH2CH2O-中間物會轉變成Oxametallacycle(-CH2CH2O-)。

Temperature-programmed reaction/desorption (TPR/D) and reflection absorption infrared spectroscopy (RAIRS) have been employed to investigate the adsorption geometry and thermal reactions of FCH2CH2OH on bare and oxygen-preadsorbed Ni(111) in an ultra-high vacuum system. The C-F and O-H bonds of FCH2CH2OH dissociate on Ni(111) in the temperature range ~180-200 K, forming -CH2CH2O- . This oxametallacycle is stable at 280 K, however it decomposes to form CO2 and H2 at higher temperature.
On oxygen-precovered Ni(111), FCH2CH2OH decomposes to form acetaldehyde and CO2 in addition to H2 and CO. The relative yields of these products increase and then decrease with increasing the exposure. FCH2CH2OH on O/Ni(111) starts to decompose at ~170 K by OH-bond scission, generating FCH2CH2O- , which exists stably at 280 K. When the temperature is raised higher than 300 K, this intermediate transforms to the oxametallacycle (-CH2CH2O-).

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