| 研究生: |
吳姿蓉 Wu, Tzu-Jung |
|---|---|
| 論文名稱: |
電子束蒸鍍製備氧化鎳薄膜之電致色變性質研究 Investigation of Electrochromic Properties of Nickel Oxide Films Prepared by Electron Beam Evaporation |
| 指導教授: |
黃肇瑞
Huang, Jow-Lay |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 材料科學及工程學系 Department of Materials Science and Engineering |
| 論文出版年: | 2008 |
| 畢業學年度: | 96 |
| 語文別: | 中文 |
| 論文頁數: | 118 |
| 中文關鍵詞: | 薄膜厚度 、電子束蒸鍍 、電致色變 、氧化鎳 |
| 外文關鍵詞: | electron beam evaporation, electrochromism, film thickness, nickel oxide |
| 相關次數: | 點閱:90 下載:4 |
| 分享至: |
| 查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
本篇論文利用電子束蒸鍍法製備氧化鎳薄膜,並利用三電極系統探討氧化鎳薄膜於濃度0.1M過氯酸鋰-碳酸丙烯之中的電致色變性質。實驗中藉由工作功率的改變(100~360 watt)與蒸鍍厚度的不同來討論薄膜其化學成分、結晶方向、微結構、表面形貌等對於電致色變性質的影響。
實驗結果發現,隨著工作功率的增加,薄膜的結晶優選方向會由(200)轉變為(111),這會使得微結構分析中有明顯的四面體島狀結構出現。另外,表面形貌粗糙度也跟著提昇,且過高蒸鍍功率會造成薄膜均勻度變差。ESCA分析中也得到初鍍膜其化學環境都是非計量比的狀態,由晶格常數的計算後得知此現象乃是鎳空缺所致,Ni+3的比例隨功率增加而上升,因此加深初鍍膜的顏色。
本實驗中最佳參數A55具有最高相對比例的(111)結晶方向,薄膜呈現四面體島狀型態且均勻性一致的形貌,晶粒大小是奈米尺寸(20nm),有最多鎳空缺等特性,這些原因皆造成其擁有最佳的電致色變性質。它的表現(1)著去色穿透度變化44%,(2)著色效率Coloration Efficiency (CE)= 34.15㎝2/C,(3)經過800次去著色循環還未退化。
薄膜厚度不會影響結晶型態,化學環境等,只從微結構上發現表面顆粒大小會隨厚度而變大,實驗結果170nm其CE=53.1 (㎝2/C),540nm其CE=32.4 (㎝2/C),較薄的膜對於電量轉換成變色效率有較佳的運用,應該是因為表面形貌晶界較多所導致。可見電致變色性質當中,形貌的影響大於厚度吸收率造成的影響。不過薄的膜雖然CE值大,但循環壽命不佳,易損毀。
In this study, electrochromic nickel oxide films were initially deposited by electron beam evaporation method. In the second step of analysis, electrochemical properties were activated by using a three-electrode cell system with a 0.1M solution of lithium perchlorate in propylene carbonate. The variations in electrochromic properties of NiOx films, as a function of electron beam working power(100~360 watt) together with film thickness were determined from chemical composition, crystal structure, and surface morphology.
XRD characterizations indicated that lower electron beam working power (EBWP) led to deposition of films with (200) orientation, while EBWP values exceeding 160 watt, led to (111) oriented films. The later films exhibited enhanced electrochromic behavior, while their surface morphology(SEM) showed incipient tetrahedral island structures. Furthermore, the surface roughness(AFM) increased with enhancement in deposition rate. ESCA analysis of the as-deposited NiOx films revealed their nonstoichiometric feature with Ni+2 and Ni+3 ions, due to the presence of large number of Ni vacancies. The transmittances of the as-deposited NiOx films decreased with increasing EBWP. Thus enhancement was attributed to Ni+3.
Sample A55 were found to possess the best electrochromic properties via: (1)maximum transmittance differences upon 44%, (2)CE=34.15㎝2/C,(3) non obvious degradations even after cycling 800 times. These optimum performances are attributed to the following characteristics: (a) highest ratio of (111) plane orientation (b) surface is very uniform with tetrahedral islands (c) nanocrystalline grain.
Crystallography, chemical environment were found to be invariant with film thickness. However, the size of surface particles increased gradually with thickness, which effected on the CE value, wherein a 170nm film had CE=53.1(C/㎝2), while a thicker 540nm film had a lower CE value of 32.4(C/㎝2).Furthermore, the thinner films possessed better efficiency than the thicker films; attributed to a higher density of grain boundaries thus facilitating the double intercalation of Li+1 ions as well as electrons. Although the thinner NiOx films possess excellent electrochromic properties; their performance is deteriorated after subjection to 800-cycling tests.
參考文獻
1.焦小浣, 胡文旭, 陳玲, 光窗透明材料的實驗研究,太陽能學報 18,No 4, (1997) 365-370.
2.C. G. Granqvist, A. Azens, A. Hjelm, L. Kullman, G. A. Niklasson, D.Rönnow, M. Stromme Mattsson, M. Veszelei and G. Vaivars, “Recent advances in electrochromics for smart windows applications”, Solar Energy, Vol.63, No.4,(1998) 199-216
3.Yoshijiro Ushio, Akira Ishikawa, Tatsuo Niwa, ”Degradation of
electrochromic nickel oxide films upon redox cycling”, Thin Solid Films
280, (1996) 233-237
4.何國川, 電化學與無窗時代, 化工, Vol 37,No 3,(1990) 32-42
5.L. Michaelis and E.S. Hill, ”The Viologen Indicator ”,J. Gen. Physiol. 16, (1933) 859
6.經濟部能源會, 變色節能玻璃可行性研究87年度工作報告
7.J.R. Platt, ”Electrochromism, A Possible Change of Color Producible in Dyes by An Electric Field"J. Chem. Phys. 34, (1961) 862-863
8.S. K. Deb, U .S. Patent No.3,521, (1970) 941
9.F.G.K. Baucke, Mater. Sci.&Eng.,B10,285, (1991)
10.楊明長, 電致色變系統簡介, 化工 40 , No 2, (1993) 64-67
11.林保章, ”三氧化鎢薄膜電極之製備及其電致色變性質之研究”, 台灣大學化學工程學系,碩士論文, (1998)
12.J. Liu and J. P. Coleman, “Nano structured metal oxide for printed electrochromic displays”, Materials Science and Engineering, A286, (2000) 144-148.
13.C. G. Granqvist, A. Azens, J. Isidorsson, M. Kharrazi, L. Kullman, T. Lindström, G.A. Niklasson, C.-G. Ribbing, D. Rönnow, M. Strømme Mattson, M. Veszelei, "Towards the smart windows: progress in electrochromics", Journal of Non-Crystalline Solids, Vol.218, (1997) 273-279
14.Avendano, A.; Azens, A.; Niklasson, G.A.; Granqvist, C.G., “Sputter Deposited Electrochromic Films and Devices Based on These:Progress on Nickel-Oxide-Based Films ”,Mater. Sci.&Eng. B138, (2007) 112-117
15.李淑端, 有機固態電解質電致色變元件之製作, 逢甲大學材料與製造工程研究所,碩士論文, (2003)
16.D. N. Buckley, L. D. Burke , J. K. Mukahy, J. Chem. Soc., Faraday 72(1), (1976) 1896
17.L. D. Burke, E. J. M. O’sakan, J. Electroanal. Chem. 93, (1978) 11
18.Y. A. Yang, Y.W. Cao, B. H. Loo J. N. Yao, J. Phys. Chem. B102, (1998) 9392
19.A. M. Andersson, W. Estrada and C. G. Granqvist, ”Characterization of electrochromic DC-sputtered nickel-oxide-based films” ,SPIE 1272, (1990) 96-110
20.Z. S. Guan, J. N. Yao, Y. A. Yang, B. H. Loo, J. Electroanal. Chem. 443, (1998) 175
21.Gunnar A. , Niklasson , Claes G. Granqvist, ”Electrochromics for smart windows :thin films of tungsten oxide and nickel oxide, and devices based on these”, J. Mater. Chem.,17, (2007) 127-156
22.陳為峰, 以化學法製備電致色變氧化鎳薄膜之研究, 逢甲大學化學工程學系, 博士論文, (2006) 44
23.C. M. Lampert, T. R. Omstead and P. C. Yu, “Chemical and optical properties of electrochromic nickel oxide films”, Solar Energy Materials, Vol.14, (1986) 161-174
24.P. C. Yu, G. Nazri and C. M. Lampert, “Spectroscopic and electrochemical studies of electrochromic hydrated nickel oxide films”, Solar Energy Materials, Vol.16, (1987) 1-17
25.H. Kamal, E. K. Elmaghraby, S. A. Ali and K. Abdel-Hady, “The electrochromic behavior of nickel oxide films sprayed at different preparative conditions”, Thin Solid Films, Vol.483, (2005) 330-339
26.S. Yueyan, Z. Zhiyang and Y. Xiaoji “Electrochromic properties of NiOxHy thin films”, Solar Energy Materials and Solar Cells, Vol. 1, (2002) 51-59.
27.K. Nakaoka, J. Ueyama and K. Ogura, “Semiconductor and electrochromic properties of electrochemically deposited nickel oxide films”, Journal of Electroanalytical Chemistry, Vol.571, (2004) 93-99
28.I. Porqueras and E. Bertran “Electrochromic behaviors of nickel oxide thin films deposited by thermal evaporation”, Thin Solid Films, Vol.398-399, (2001) 41-44
29.S. I. Cordaba-Torresi, A. Hugot-Le Goff, and S. Joiret, ”Electrochromic Behavior of Nickel Oxide Electrodes”,J. Electrochem. Soc.Vol 138,No. 6, (1991) 1558
30.A. Agrawal, H. R. Habibi, R. K. Agrawal, J. P. Cronin, D. M. Roberts, R. Caron-Popowich and C. M. Lampert “Effect of deposition pressure on the microstructure and electrochromic properties of electro- beam- evaporated nickel oxide films”, Thin solid Films, Vol.221, (1992) 239-253
31.A. Šurca, B. Orel and B. Pihlar “Sol-gel derived hydrated nickel oxide electrochromic films: optical, spectroelectrochemical and structural properties”, Journal of Sol-Gel Science and Technology, Vol.8, (1997) 743-749
32.L. D. Kadam and P. S. Patil “Studies on electrochromic properties of nickel oxide thin films prepared by spray pyrolysis technique”, Solar Energy Materials and Solar Cells, Vol.69, (2001) 361-369
33.X. Chen, X. Hu and J. Feng, “Nanostructured nickel oxide films and their electrochromic properties”, NanoStructured Materials, Vol.6, (1995) 309-312
34.M. Chigane and M. Ishikawa, “Electrochromic properties of nickel oxide thin films prepared by electrolysis followed by chemical deposition”, Electrochimica Acta, Vol.42, No.10, (1997) 1515-1519
35.I. Bouessay, A. Rougier, P. Poizot, J. Moscovici, A. Michalowicz and J.-M. Tarascon, “Electrochromic degradation in nickel oxide thin film: A self-discharge and dissolution phenomenon”, Electrochimica Acta, Vol.50, (2005) 3737-3745
36.WebElementsTM, the periodic table on the http://www.webelements.com/, 1993-2001 Mark Winter, The University of Sheffield and WebElements Ltd, UK,
37.D. Adler and J. Feinleib, “Band Structure of Magnetic Semiconductors”, Phys. Rev. B2, (1970) 3112
38.Kwang-Soon Ahn, Yoon-Chae Nah,Jun-Ho Yum and Yung-Eun Sung, ”The effect of Ar/O2 Ratio on Electrochromic Response Time of Ni Oxides Grown Using RF Sputtering System”, Jpn. J. Appl. Phys.41, (2002) 212-215
39.莊達人編著, VLSI製造技術, 高立圖書, (1997)
40.John A. Thornton, ”Influence of Apparatus Geometry and Deposition Conditions on the Structure and Topography of the Thick Sputtered Coating”, J. Vac. Sci. Technil. 11 (4), (1974) 666-670
41.P. B. Barna, and M. Adamik, ”Fundamental Structure Forming Phenomena of Polycrystalline Films and the Structure Zone Models”, Thin Solid Films 317, (1998) 27-33
42.李正中編著, 薄膜光學與鍍膜技術, 第三版, 藝軒出版社, (2002)
43.F. F. Ferreira ,M. H. Tabacniks, M. C .A. Fantini, I.C. Faria, A. Gorenstein, ”Electrochromic nickel oxide thin films deposited under different sputtering conditions” ,Solid State Ionics 86-88, (1996) 971-976
44.D. A. Wruck and M. Rubin, ”Structure and Electronic Properties of Elctrochromic NiO Films”, J. Electrochem. Soc., Vol. 140, No. 4, (1993) 1097-1104
45.J. A. Thornton, Ann. Rev. Mater. Sci. 7, 239, (1977)
46.A. S. Nowick and S.R. Mader, IBM J. Res. Develop.9, 358, (1965)
47.B. Warota, E. Snoecka, P. Baulesa, J.C. Ousseta, M.J. Casanovea, S. Dubourgb, J.F. Bobo, ”Formation of Tetrahedral Islands in Epitaxial NiO Layers Deposited on MgO(111)”, Journal of Crystal Growth 234, (2002) 704-710
48.P. W. Tasker, ”The stability of ionic crystal surfaces ”, J. Phys. C: Solid State Phys., Vol. 12, (1979)
49.R. S. Conell, D. A. Corrigan, B. R. Powell, Solar Energy Mater. Solar Cells 25, (1992) 301
50.周淑金, 葉信宏, 工業材料150期, 民國88年6月
51.E. Avendano, A. Azens, G. A. Niklasson, C.G. Granqvist, “Electrochromism in nikel oxides films containing Mg, Al, Si, V, Zr, Nb, Ag, or Ta ”, Solar Energy Mater. Solar Cells 84, (2004) 337-350
52.E. Avendano, A. Azens, J. Isidorsson, R. Karmhag, G. A. Niklasson, C. G. Granqvist, ”Optimized nickel-oxide-based electrochromic thin films ”, Solid State Ionics 165, (2003) 169
53.B. Sasi, K. G. Gopchandran, ”Preparetion and characterization of nanosreucteured NiO thin films by reactive-pulsed laser ablation technique ”, Solar Energy Materials& Solar Cells 91, (2007) 1505-1509
54.Kwang-Soon Ahn, Yoon-Chae Nah, Yung-Eun Sung, “Thickness-dependent microstructural properties of sputtered-deposited Ni oxides films”, J. Vac. Sci. Technol. A, Vol 20, No. 4, (2002)
55.X. Xiao, X. Hu, X. Chen, ”Interfacial structure of nano granular thin films”, Thin Solid Films 375, (2000) 151-154
56.R. B. Shalvoy, P. J. Reucroft, B. H. Davis, J. Catal. 35, (1974) 336
57.K.S. Kim, N. Winograd, J. Catal. 35, (1974) 66
58.吳囿蓉, “以磁控濺鍍法製備之氧化鎳薄膜應用於固態電致色變元件之研究”, 成功大學,材料科學及工程學系, 碩士論文, 民國96年
59.I. Bouessay, A. Rougier, B. Beaudoin, J.B. Leriche, ”Pulsed Laser-Deposited nickel oxide thin films as electrochromic anodic materials ”, Applied Surface Science 186, (2002) 490-495
60.G. Austin, N. F. Mott, ”Polarons in Crystalline and Non-crystalline Materials”, Adv. In Phys, Vol.80, (1969)
61.Stefano Passerini and Bruno Scrosati, ”Characterization of Nonstoichiometric Nickel Oxide Thin-Film Electrodes”, J. Electrochem. Soc.141,No. 4, (1994) 889-895
62.I. Bouessay, A. Rougier and J.-M. Tarascon, ”Electrochemically Inactive Nickel Oxide as Eletrochromic Material”, J. Electrochem. Soc.151 (6)H145-H152, (2004)
63.Kwang-Soon Ahn, Yoon-Chae Nah, Yung-Eun Sung, ”Surface morphological, microstructure, and electrochromic properties of short-range ordered and crystalline nickel oxide thin films”, Applied Surface Science 199, (2002) 259-269
64.Kwang-Soon Ahn, Yoon-Chae Nah, Jun-Ho, Yung-Eun Sung, ”The effect of Ar/O2 Ratio on Electrochromic Response Time of Ni Oxides Grown Using an RF Sputtering System”, Jpn. J. Appl. Phys. Vol. 41, Pt. 2, No. 2B, (2002)
65.A. Gorenstein, F. Decker, W. Estrada, C. Esteves, A. Andersson, S. Passerini, S. Pantaloni, B. Scrosati, J. Electroanal. Chem.277, (1990) 277