本研究以不同比例的Co、Cr熔製成磁性層靶材，與純白金非磁性層靶材，利用離子束濺鍍機，將磁性層與非磁性層交互濺鍍在矽基板上，改變製程條件如改變鍍膜層數，鍍膜厚度，添加Under-layer與熱處理等，製備出各種不同條件之磁性多層膜。
　　利用EDS，AES等分析薄膜元素組成，以XRD作結構分析，SEM、TEM觀察微結構，AFM觀察表面起伏狀態，SQUID，MOKE作磁性質的量測。
　　實驗結果顯示，以離子束濺鍍之薄膜，晶粒大小約只有7～8nm，然而添加Under-layer與熱處理有助於晶粒成長。未添加Under-layer薄膜之最佳矯頑磁力為靶材Cr15之濺鍍30層30秒（每層15.9A）的Hc = 84.8Oe，經熱處理可使矯頑磁力增加為111Oe。而添加Pt Under-layer後出現之最佳矯頑磁力為靶材Cr20之濺鍍30層30秒（每層16.5A）的Hc = 111.8Oe，經熱處理後可使矯頑磁力增加為157.9Oe。

　　Different composition of Co-Cr alloy targets were prepared as magnetic layer target, and pure Pt is prepared as spacer layer target. The magnetic layer and spacer layer was coated alternately on Si substrate by Ion Beam sputter. The experimental conditions such as the number of layers, the thickness of each layer, under-layer and heat treatment were the variables in this study.
　　The ratio of elements in the samples is measured by EDS and AES. The structure is analyzed by XRD. SEM and TEM observe the surface morphology and microstructure. The surface roughness of magnetic films was measured by AFM. The magnetic properties of magnetic films were determined by SQUID and MOKE.
　　The experimental results show that the grain sizes of the film are only 7～8nm, but the additive of under-layer and heat treatment will increase the grain sizes. The best coercivity of non-under-layer film is 84.8Oe for Cr1530s30L, and heat treatment will increase the coercivity to 111Oe. And the best coercivity of Under-layered film is 111.8Oe for PtCr2030s30L, heat treatment will increase the coercivity to 157.9Oe.

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