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研究生: 蔡淑卿
Tsai, Sue-Ching
論文名稱: ZnO與ZnS摻錳螢光薄膜之發光性質研究
Study of the Luminescent Properties of Thin Film Phosphors, ZnO:Mn and ZnS:Mn
指導教授: 陳引幹
Chen, In-Gann
學位類別: 碩士
Master
系所名稱: 工學院 - 材料科學及工程學系
Department of Materials Science and Engineering
論文出版年: 2004
畢業學年度: 92
語文別: 中文
論文頁數: 110
中文關鍵詞: 硫化鋅氧化鋅光致發光
外文關鍵詞: Mn, ZnS, ZnO, PL
相關次數: 點閱:65下載:4
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  •   本實驗研究氧化鋅藍色螢光薄膜材料,並在H2S的氣氛下進行硫化處理,使ZnO:Mn轉變成ZnS:Mn,而得到發黃綠光的螢光薄膜。

      本實驗以射頻磁控濺鍍系統沉積氧化鋅材料。沉積後的氧化鋅薄膜具有纖鋅礦的結構,屬於六方晶系,其垂直c軸平面為最緊密堆積面,濺鍍後薄膜具有c軸從優取向。此外,經硫化處理所得的硫化鋅,同樣為具有c軸從優取向的六方晶結構。

      研究結果顯示,沒有摻雜任何元素的氧化鋅在未退火的狀況下,會有由缺陷所貢獻的黃綠光產生,以退火方式提升其結晶性的結果會降低材料的缺陷,並增強氧化鋅能帶邊緣間隙所發的光.(Band edge emission)。

      氧化鋅摻錳(ZnO:Mn(1at%))的螢光層薄膜於900℃退火,會有最佳的結晶性,其六方晶相之(002)半高寬為0.290,從PL光譜的結果可知,其發光位置落在藍光(450nm)與近紫外光(390nm)的範圍。

      經過硫化處理後的ZnO:Mn,PL光譜可得到位在570nm的黃綠光,為錳離子在硫化鋅主體晶格中,於4T1→6A1能階間躍遷(d-d transition)所得。硫化時間越久,硫化鋅對氧化鋅的含量比增加,570nm處的光譜強度也跟著增加。

      There are two objectives in this experiment. The first is to study the blue emission characteristics of ZnO thin film. The Second is to study the sulfidation ZnO:Mn thin film, which will transfom into ZnS:Mn with yellow-green emission.

      In the experiment, hexagonal wurtzite ZnO thin film is deposited on Si(100) by RF-magnetron sputtering system. The close-packed c-axis plane perpendicular to the Si substrate is obtained. Moreover, preferential oriented c-axis hexagonal ZnS transformed from ZnO thin film is obtained by sulfidation treatment.

      The results show that the as-deposited ZnO thin film without dopant emit yellow-green color due to intrinsic defects. Annealing treatment could increase the crystallinity of ZnO with decreasing the defects in ZnO with enhancement of the band-edge emission intensity at near-UV range.

      ZnO:Mn(1at%) thin film has optimum crystalinity by annealing at 900℃ with the GIXRD (002) FWHM (full width of half maximum) of 0.290. PL spectra of the emission is located at the wavelength of 450nm (blue) and 390nm (Near-UV).

      The PL of ZnS:Mn obtained by sulfidation treatment results in the yellow-green emission peaked at 570nm,which is attributed to the d-d transition (4T1→6A1) of Mn2+ in the ZnS lattice. It is noted that as the ratio of ZnS to ZnO increases with sulfidation time, the intensity of the yellow-green 570nm emission is also increases.

    摘要 I Abstract II 目錄 III 表目錄 VI 圖目錄 VII 第一章 緒論 1 1-1 EL元件的分類 1 1-2 ACTFEL元件的優點與缺點 2 1-3 彩色薄膜電激發光顯示器--螢光層的結構【1】 3 1-4 研究目的 4 第二章 理論基礎與文獻回顧 9 2-1 電激發光元件之歷史演進 9 2-2 電激發光(Electroluminescent,EL)之發光機制 10 2-2.1 「直接撞擊激發模式」(direct impact excitation) 10 2-2.2 能量轉移模式 10 2-3 元件構造與材料需求 11 2-3.1 元件結構—雙絕緣層結構 11 2-3.2 各層材料需求 12 2-4 螢光層的選擇 15 2-4.1 氧化物材料 15 2-4.2 氧化鋅螢光體材料 18 2-4.2.1 晶體結構 18 2-4.2.2 濺鍍參數 19 2-4.2.3 發光特性 19 2-4.3 硫化鋅螢光體材料簡介 22 2-4.3.1 發展歷史: 22 2-4.3.2 晶體結構 23 2-4.3.3 ZnS:Mn螢光光譜介紹 23 2-4.3.4 硫化處理 24 2-4.4 錳的發光特性 24 2-4.4.1 錳之3d軌域能階特性 24 2-4.4.2 結晶場理論(Crystal field theory) 25 2-4.5 發光機制(Luminescence Mechanism) 26 2-4.5.1 ZnO 26 2-4.5.2 ZnO:Mn 27 2-4.5.3 ZnS:Mn 28 2-5 CIE色度座標 29 2-6 濺鍍理論 29 2-6.1 電漿反應 30 2-6.2 濺鍍機構 30 2-6.3 薄膜成長 31 第三章 實驗方法及步驟 56 3-1 實驗藥品 56 3-2 製備ZnO:Mn及ZnS:Mn螢光層步驟57 3-2.1 基板清洗 57 3-2.2 製作ZnO:Mn靶材 57 3-2.3 濺鍍步驟與濺鍍參數 57 3-2.4 退火處理方式 58 3-2.5 硫化處理(Sulfidation Treatment) 58 3-3 性質量測 59 3-3.1 膜厚量測(α-step) 59 3-3.2 結構分析 59 3-3.2.1 低掠角X-光繞射(GIXRD) 59 3-3.2.2 粉末X光繞射儀 (X-ray Diffractometer Spectrometer) 60 3-3.3 掃描式電子顯微鏡(SEM)表面分析 60 3-3.4 原子力顯微鏡 (Atomic Force Microscopy, AFM)表面分析 60 3-3.5 光致發光(Photoluminescence, PL)特性量測 61 3-3.6 歐傑(Auger)電子能譜儀 61 第四章 結果與討論 69 4-1 氧化鋅螢光層薄膜之性質分析 69 4-1.1 結構分析 69 4-1.2 光致激發光譜特性分析 69 4-1.2.1 氧化鋅初鍍膜之發光特性 69 4-1.2.2 退火處理對發光特性的影響 70 4-2 氧化鋅摻錳(ZnO:Mn)螢光層薄膜之性質分析 72 4-2.1 結構分析 72 4-2.2 表面型態分析 72 4-2.2.1 SEM表面分析 72 4-2.2.2 AFM表面分析 73 4-2.3 光致激發光譜(PL Spectra)特性分析 73 4-2.3.1 ZnO:Mn-1at%之PL光譜 73 4-2.3.2 光譜分析與發光機制之探討 73 4-2.3.3 結晶性與發光性質的探討 74 4-3 硫化處理後螢光層之性質分析 76 4-3.1 結構分析 76 4-3.2 表面型態分析 77 4-3.2.1 SEM表面分析 77 4-3.2.2 AFM表面分析 77 4-3.3 光致激發光譜(PL Spectra)特性分析 78 4-3.3.1 光譜特性 78 4-3.3.2 光譜分析與發光機制之探討 78 4-3.3.3 結晶性與發光性質的探討 78 4-4 硫化深度的探討 79 第五章 結論 103 參考文獻 104

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