本論文提出一種新型態的紫外光(UV)固化奈米壓印方法，主要以軟性矽膠(PDMS)材料且具厚度變化的可撓性模仁為基礎，此一PDMS可撓性模仁可以從傳統的矽模仁中翻製出微米與奈米等級的結構，且能以預壓的方式讓模仁產生彎曲，並以中心先貼附光阻液珠與基板的方式，由接觸點以圓形軸對稱逐漸向外擴張的方式進行壓印；此一由內而外的壓力變化可以驅動UV光阻向外運動，並在完成壓印與紫外光固化後，以低速與可控制的方式完成脫模，進而完成整個UV壓印的製程。此一新型的壓印方法，不但可以在平面基板上壓印出PSS柱狀結構(Pattern Sapphire Substrate, 高度2 um，線寬 2 um，週期3 um)，也可以壓印出蛾眼抗反射洞狀結構(直徑150 nm，週期300 nm)。
在壓印成型過程中，壓印壓力及脫模壓力是影響壓印後元件的品質，故需要開發出一種具力學控制的壓印系統。本研究使用一搭配有伺服馬達與高精度荷重元的二軸垂直拉伸系統，並以LabVIEW撰寫一套人機介面，除了可以控制奈米壓印上下移動的速度及距離，同時並進行力量控制。最後，本論文將討論一些成功的壓印實驗成果。

This thesis investigates a new type of UV-curable nano-imprinting method which is based on using a flexible mold. This silicone rubber (PDMS) mold is replicated for a silicon mold to transfer micro/nano-structures to its surface. This flexible mold can be pre-deformed spherically such that its center can be in contact with a drop of photo-resist (PR) and a substrate. Subsequent forward movement and loading force are then complete the imprinting process by driving the PR along radial direction. After UV exposure and solidification of the PR, de-molding process can be completed in the same manner. One significant advantage of this new method is that it can be applied to not only Pattern Sapphire Structure but also Moth’s eye anti-reflection structure on planer substrate.
To accomplish this new imprinting processes, an imprinting system is constructed two servo-motors and their drivers as well as precision load cells. The software system is developed using LabVIEW program language which can control not only the speed and moving distance for imprinting but also the loading forces. The constructed system and machine as well as the experimental results of imprinting will be addressed.

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