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研究生: 王致惟
Wang, Zhi-Wei
論文名稱: 磊晶鉍化硒薄膜於自旋幫浦效應研究
The effect of spin pumping in epitaxial Bi2Se3 films
指導教授: 黃榮俊
Huang, Jung-Chun
學位類別: 碩士
Master
系所名稱: 理學院 - 物理學系
Department of Physics
論文出版年: 2014
畢業學年度: 102
語文別: 中文
論文頁數: 56
中文關鍵詞: 自旋幫浦反轉自旋霍爾效應鉍化硒
外文關鍵詞: spin pumping, inverse spin Hall effect (ISHE), Bi2Se3
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  • 本實驗中以MBE成長Bi2Se3於Al203(0001)基板上,並利用RHEED、AFM和XRD的表面和結構量測,確認樣品的品質是非常良好且表面平坦的單晶薄膜,並在室溫下利用自旋幫浦(spin pumping)機制,在鎳鐵層和Bi2Se3接面的樣品上,提供外加磁場和微波是使鐵磁層發生鐵磁共振,使鎳鐵層向Bi2Se3層傳遞一自旋角動量,即為自旋流,此自旋流可以在Bi2Se3層引發反轉自旋霍爾效應(Inverse spin Hall effect, ISHE),是為自旋幫浦。由此量測在以自旋幫浦在Bi2Se3產生的電壓,再利用文獻中的電壓來源於對稱和反對稱的訊號,擬合出對稱的電壓訊號(Vsym),並改變頻率、功率或磁場強度以確認量測到對稱訊號的電壓(Vsym)確實是為反轉自旋霍爾效應所產生的電壓(VISHE)。並且改變Bi2Se3薄膜的厚度以探討厚度對Bi2Se3與ISHE之間的特性和其物理意義。

    Bi2Se3 is one of the promising “second generation” topological insulator (TI) materials, which have both helical spin polarization and strong spin-orbit coupling. In this work, high quality Bi2Se3 thin films were grown on c-plane sapphire (Al2O3) substrates by molecular beam epitaxy (MBE). The central part of the Bi2Te3 layer was covered with a permalloy (Ni80Fe20) layer by IBS with a shadow mask. Through the spin-electricity conversion, and the spin injection into the topological insulator Bi2Se3 thin film can be observed at room temperature (RT) by a spin pumping method. The DC voltage VISHE were obtained and heating effect signals are hard to observed in a Py/Bi2Se3 bilayer system at RT. Our measurements reveal that Py/Bi2Se3 bilayer system could be used as spin-based devices or spintronic devices.

    摘要 II Abstract III 誌謝 VI 目錄 VII 表目錄 IX 圖目錄 X 第 1 章 緒論 1 1-1 前言 1 1-2 文獻回顧 1 1-3 動機 8 第 2 章 原理介紹 10 2-1 拓樸絕緣體之簡介 10 2-2 自旋霍爾效應 15 2-3 反轉自旋霍爾效應 16 2-4 自旋幫浦 17 第 3 章 實驗流程及儀器介紹 21 3-1 實驗流程 21 3-2 製成樣品儀器 22 3-2-1 分子束磊晶系統(Molecular Beam Epitaxy system) 22 3-2-2 離子束濺鍍系統(Ion Beam sputter) 27 3-3 分析樣品儀器 29 3-3-1 薄膜X光繞射儀(X-ray Diffraction) 29 3-3-2 反射式高能電子繞射儀(RHEED) 30 3-3-3 原子力顯微鏡(Atomic Force Microscope) 32 3-3-4 自旋幫浦系統(Spin pumping system) 34 第 4 章 結果與討論 36 4-1 鉍化銻與鉍化硒之磊晶薄膜結構分析 36 4-1-1 RHEED pattern 36 4-1-2 X ray Diffraction 38 4-1-3 AFM 40 4-1-4 霍爾電性及四點量測 40 4-2 自旋幫浦在鉍化銻與鉍化硒薄膜的效應 42 4-2-1 鐵磁共振訊號 42 4-2-2 電壓訊號 45 4-2-3 改變頻率固定功率對應的電壓值 47 4-2-4 改變功率固定頻率對應的電壓值 49 4-2-5 改變Bi2Se3厚度對應的VISHE 52 第 5 章 結論 54 參考文獻 55

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