本研究旨在探討半導體及光電產業製程中所使用之三氯矽甲烷 (Trichlorosilane, TCS)，在逸散及燃燒時所產生之鹽酸氣膠 (HCl-p)、鹽酸氣體 (HCl-g)及氯氣 (Cl2)其排放特徵。本研究首先建置一暴露腔，確認其環境控制條件 (ACH= 6，RH= 44.0 %、57.3 %、65.5 %、79.8 %及 89.8 %)之穩定性及均勻性。本研究針對TCS所產生之HCl-p係利用微米及奈米微孔均勻沉積衝擊器 (Nano- and Micro-Orifice Uniform Deposit Impactor, Nano-MOUDI及MOUDI)實施粒徑分布採樣，HCl-g及Cl2係依據NIOSH 7903及NIOSH 6011分別利用矽膠管 (Silica gel tube)及銀膜濾紙 (Silver membrane filter)進行樣本採集。HCl-p、HCl-g及Cl2均以離子層析儀 (Ion chromatography-electron capture detection, IC-ECD)進行分析。結果發現：(1) TCS逸散時主要生成物為HCl-p (4.72×103 ~ 5.68×103 mg/m3)，HCl-g (0.714×103 ~ 0.970×103 mg/m3)次之；TCS燃燒時主要生成物亦為HCl-p (1.30×105 ~ 1.46×105 mg/m3)，其次依序為HCl-g (6.38×103 ~ 11.3×103 mg/m3)及Cl2 (1.91×103 ~ 2.18×103 mg/m3)；(2) TCS逸散時所產生HCl-p，若經由呼吸進入人體，穿透於肺泡區之比例 (91.6 ~ 98.1 %) ＞胸腔區 (1.3 ~ 6.3 %) ＞頭區 (0.7 ~ 3.8 %)。而在TCS燃燒時，HCl-p於肺泡區之比例 (82.7 ~ 88.8 %) ＞胸腔區 (6.5 ~ 10.7 %) ＞頭區 (4.7 ~ 6.7 %)；(3) 在不同相對溼度進行TCS逸散測試下，HCl-p及HCl-g之排放係數 (EF)分別為681.9 ~ 704.7 mg/g TCS及92.8 ~ 126.7 mg/g TCS，而排放率 (ER)分別為228.3 ~ 286.5 mg/min及30.5 ~ 48.5 mg/min；在不同相對溼度進行TCS燃燒測試下，HCl-p、HCl-g及Cl2之EF分別為713.7 ~ 741.7 mg/g TCS、37.2 ~ 56.3 mg/g TCS及9.50 ~ 11.6 mg/g TCS；ER分別為6715.7 ~ 7404.1 mg/min、338.1 ~ 584.0 mg/min及98.6 ~ 112.7 mg/min。本研究建議於TCS作業場所應置備全面體複合式之呼吸防護具於緊急應變時使用，以防止TCS洩漏及燃燒產生HCl-p、HCl-g及Cl2所可能造成勞工之健康危害。

This study investigated the emission characteristics of acid aerosols (HCl-p), acid gases (HCl-g) and chlorine (Cl2) during the releasing and burning of trichlorosilane (TCS). An exposure chamber was established and its uniformity and stability were tested under various test conditions prior to conducting experimental campaigns. Five relative humidity conditions (RH= 44.0 %, 57.3 %, 65.5 %, 79.8 % and 89.8 %) were selected and the air exchange rate (ACH) was specified at 6. Each test condition was repeated three times and HCl-p, HCl-g and Cl2 were collected during each test run. HCl-p were collected using Nano- and Micro-Orifice Uniform Deposit Impactor (i.e., Nano-MOUDI and MOUDI). HCl-g and Cl2 were sampled per NIOSH method 7903 and 6011, respectively. All samples were analysed by ion chromatography-electron capture detection, IC-ECD. We found that (1) The concentration of HCl-p and HCl-g were 4.72×103－5.68×103 mg/m3 and 0.714×103－0.970×103 mg/m3, respectively during the TCS releasing process. During the TCS burning process, the concentration of HCl-p, HCl-g and Cl2 were 1.30×105－1.46×105 mg/m3, 6.38×103－11.3×103 mg/m3 and 1.91×103－2.18×103 mg/m3, respectively; (2) the deposition of the resultant HCl-p in the respiratory tract was consistently found as alveolar region ＞tracheobronchial region ＞head region in five selected RH testing conditions; (3) during the TCS releasing process, the emission factor (EF) of HCl-p and HCl-g fell to the range 681.9－704.7 mg/g TCS and 92.8－126.7 mg/g TCS, respectively. The emission rate (ER) of HCl-p and HCl-g fell to the range 228.3－286.5 mg/min and 30.5－48.5 mg/min, respectively; During the TCS burning process, the EF of HCl-p, HCl-g and Cl2 fell to the range 713.7－741.7 mg/g TCS, 37.2－56.3 mg/g TCS and 9.50－11.6 mg/g TCS, respectively. The ER of HCl-p, HCl-g and Cl2 fell to the range 6715.7－7404.1 mg/min, 338.1－584.0 mg/min and 98.6－112.7 mg/min, respectively. High concentrations of HCl-p, HCl-g and Cl2 found in the present study suggests that full-faced respirators with composite functions for the removal of HCl-p, HCl-g and Cl2 should be used for workers during emergency response processes.

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牟科俊，唐嘉鴻，陳新友，施惠雅，張榮興，何大成；2009，化學品衍生副產物危害探討，工業安全衛生技術輔導成果發表會
陳政任，蔡朋枝，李家偉；2008，三氯矽甲烷之緊急應變作業程序與實場測試計畫，南部科學工業園區管理局