本篇論文是以程序控溫反應/脫附(Temperature-programmed reaction/desorption，TPR/D)、歐傑電子能譜學(Auger Electron Spectroscopy，AES)和反射式吸收紅外光譜學(reflection absorption infrared spectroscopy，RAIRS)等技術，於超高真空系統中，研究
1,3-Diiodobenzene分子在Cu(100)表面上的熱反應與存在於表面上的反應中間體。在低曝露量下(≦1monolayer)，1,3-Diiodobenzene分子在表面溫度為~340 K時，會分解成meta-benzyne和碘原子吸附在表面。溫度繼續升高至~500 K後，表面上的meta-benzyne會開始分解產生氫氣脫附。980 K時，表面上只留下碳，而碘原子已脫附。在高曝露量下(2~3 monolayer)，1,3-Diiodobenzene的分子性脫附出現在247 K(來自第二層)和234 K(來自第三層)。當曝露量繼續增加，分子性脫附峯的溫度有往高溫偏移的現象，顯示mutilayer(指第二層以後)的脫附屬於一零級的反應。在Cu(100)表面，曝露量在1~2 mololayer的範圍下，1,3-Diiodobenzene分子吸附的位向為π-ring平行於Cu(100)表面。當吸附的量到達第三層時，則顯示第三層分子的吸附開始轉為π-ring傾斜於表面的吸附。

　Temperature-programmed reaction/desorption (TPR/D), Auger electron spectroscopy (AES) and reflection-absorption infrared spectroscopy (RAIRS) have been employed to investigate the thermal decomposition of 1,3-Diiodobenzene on Cu(100) and the surface intermediates involved.
At low surface coverages (≦1 monolayer), 1,3-Diiodobenzene dissociates at ~340 K on Cu(100) surface to form adsorbed meta-benzyne and atomic I. The meta-benzyne subsequently decomposes at ~500 K to form H2(g). By 980 K, atomic I is completely desorbed, but carbon is left on the surface due to the dehydrogenation of meta-benzyne. At coverages of 2~3 monolayers, 1,3-Diiodobenzene desorbs molecularly at 247 K (second-layer) and 234 K (third-layer). The peak temperatures of molecularly desorption (Tmax) shift to higher temperatures with increasing exposures, indicating that the multilayer (≧3 monolayer) desorption is a zero-order process. The adsorbed 1,3-Diiodobenzene molecules at 1~2
monolayers coverage are adsorbed with their π-rings approximately parallel to the surface plane. However as the exposure is increased to a coverage ≧3 monolaylers, the molecules adopt an orientation with their π-rings inclining from the surface.

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