| 研究生: |
胡世國 Hu, Shih-Kuo |
|---|---|
| 論文名稱: |
發展多光束干涉儀於薄膜厚度與折射率之量測 Development of Multiple Beam Interferometry Apparatus to Measure Thin Film Thickness and Refractive Index |
| 指導教授: |
陳元方
Chen, Terry Yuan-Fang |
| 學位類別: |
碩士 Master |
| 系所名稱: |
工學院 - 機械工程學系 Department of Mechanical Engineering |
| 論文出版年: | 2006 |
| 畢業學年度: | 94 |
| 語文別: | 中文 |
| 論文頁數: | 65 |
| 中文關鍵詞: | 薄膜厚度、折射率、對稱式三層公式、多光束干涉、等色階條紋、多層膜矩陣法 |
| 外文關鍵詞: | Multiple Beam Interferometry, Multilayer Matrix Method, Refractive index, Thickness of thin film, Symmetrical three-layer formula, Fringe of Equal Chromatic Order |
| 相關次數: | 點閱:68 下載:2 |
| 分享至: |
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在奈米尺度下,材料將會展現出顯著不同的特性和現象。欲瞭解並有效掌控在奈米尺度下的材料特性,建立及運用精確的量測技術與系統,即成為不可或缺的一環。
表面力分析儀除了可用於微奈米級薄膜厚度與折射率的量測外,還可用於薄膜間的力學性質分析,例如:表面吸附力、摩擦力等,所以表面力分析儀可做為研究奈米科技的重要工具之一。
本文的主要目的是建構出表面力分析儀的雛型系統,用於薄膜厚度及折射率的量測。其計算方法主要是利用Israelachvili發表的對稱式三層公式來分析多光束干涉所產生的等色階條紋。本文將會利用多層膜矩陣法來模擬等色階條紋並與實驗圖做比較,以及探討影響等色階條紋清晰度的因素,進而幫助表面力分析儀的發展。
The material will show remarkable different characteristic and phenomenon in the nano scale. It has become unlackable to build and use precise measuring technology and system to understand and control the material characteristic.
The surface force apparatus not only be used in the measurement of thin film thickness and refractive index but also in the analysis of mechanics. For example: surface adsorbability ,friction.Therefore,the surface force apparatus can be used as one of the important tools to research nano science and technology.
In this article,the main purpose is to build model system of surface force apparatus that applied to measure the thickness and refractive index of thin film. The main method to analyze the Fringe of Equal Chromatic Order(FECO) produced from multiple beam interferometry is by using symmetrical three-layer formula from Israelachvili. In this article, I used multilayer matrix method to simulate FECO and comparing it with the FECO from the experiment. And I researched the factors that influencing the definition of FECO. Finally, let the results in this article to aid development in the surface force apparatus.
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