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研究生: 陳建志
Chen, Jian-Zhi
論文名稱: 不同介電薄膜覆蓋於銀奈米粒子/氮化鎵工作電極在光電化學反應上的效應
The effect of Ag nanoparticles/ GaN working electrode capped with different dielectric layers on photoelectrochemical reaction
指導教授: 許進恭
Sheu, Jinn-Kong
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年: 2018
畢業學年度: 106
語文別: 中文
論文頁數: 64
中文關鍵詞: 氮化鎵侷域性表面電漿共振離子佈植光電化學
外文關鍵詞: Gallium nitride, Localized surface plasma resonant, ion-implantation, photoelectronchemical
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  • 數位時代的來臨使我們生活更加便利,而我們追求便利的背後,其代價並不便宜。現今科技對於電及石化燃料的需求日益增加,燃煤發電及石化燃料的使用製造了數十億噸的溫室氣體,PM2.5等空氣汙染使的氣喘、過敏及肺腺癌患者增加,溫室氣體也使全球平均溫度持續升高。本論文研究的方向就是利用半導體電解水的方式將光能轉換成乾淨的氫能,氫能可以達到發電、交通運輸及環境保護等優點,我們使用氮化鎵半導體作為基板,結合表面電漿效應及佈植技術來進行光電化學分解水。
    表面電漿效應方面,使用退火的方式製作出銀奈米粒子,電磁輻射通過銀奈米粒子時,粒子中的電子受交流電場的驅動在粒子表面產生振盪,若電磁輻射的波長接近銀粒子的共振波長,會因侷域性表面電漿共振而在特定波長有很大的光吸收,實驗中我們在可見光與紫外光波段都觀察到了光吸收的現象,也確實會提升氮化鎵的光電化學反應。我們比較能隙、折射率、電阻值差異極大的介電質(TiO2、SiO2)濺鍍於奈米銀粒子的效應,並分析元件的光學特性、電性以及光電化學特性。
    佈植方面,我們使用佈植矽進入未摻雜的氮化鎵,使其轉變成N型氮化鎵,經過矽佈植的區域在載子濃度及電阻率都得到改善,佈植區就像導線一樣可以將光生載子快速傳輸到外部電路進行光電化學反應。透過結合侷域化表面電漿光吸收的特性與佈植區導線的特性,以兩種效應的優勢使光電化學反應達到更高的增益,實驗中以不同交會比例的佈植區與侷域性表面電漿區來觀察光電流的趨勢,預期能在光電流、氫氣與甲酸產率、轉換效率上獲得提升。

    Our research is about solar water splitting with a semiconductor photoelectrode and a metal counter electrode. In order to conduct the reaction of hydrogen producing, the band edge positions of photoelectrode must cover the oxidation and reduction potentials of water. Gallium nitride just meets the condition of hydrogen producing. Nevertheless, Gallium nitride only extracts the energy of ultraviolet owing to energy band gap. In order to solve the problem, we use metal nanoparticles to achieve localized surface plasma resonant (LSPR) effect that absorbing visible light energy. We adopt silver nanoparticles capped with silicon dioxide on gallium nitride substrate. The experiment results reveal an enhancement on photo current. On the other hand, we also apply implant technology in our research. After implanting silicon into gallium nitride, the implanted area forming metal line effect that fast transfer the carrier to carry out hydrogen production reaction. Last, we combine the plasma effect increasing light absorption and ion implantation forming metal line effect to conduct experiment and discuss the production rate and conversion efficiency of hydrogen and formic acid.

    摘要 i 致謝 vii 目錄 viii 圖目錄 xi 表目錄 xvi 第一章 序論 1 1.1 前言 1 1.2光電化學電解水的發展 2 1.3研究動機與目的 4 第二章 理論基礎 7 2.1 光電化學原理 7 2.2 表面電漿效應[24、25、26] 10 第三章、元件製程與使用的儀器 14 3.1 氮化鎵基板的成長 14 3.2表面電漿子製作於氮化鎵工作電極 14 3.2.1製作表面電漿子 14 3.2.2周期性條狀表面電漿子 17 3.3表面電漿子製作於經過離子佈植的氮化鎵基板 21 3.3.1週期性條狀表面電漿子製作於週期性佈植氮化鎵基板 21 3.3.2面表面電漿子製作於週期性佈植氮化鎵基板 25 3.4使用的儀器 27 第四章、實驗結果 29 4.1週期性條狀表面電漿子製作於週期性佈植氮化鎵基板 29 4.1.1穿透光譜與吸收光譜的量測 30 4.1.2光電化學特性:IV scan & 偏壓1V的光電流量測 33 4.1.3使用掃描式顯微鏡進行元件表面形貌觀測 36 4.2使用SiO2當介電質製作表面電漿子於氮化鎵工作電極的量測 38 4.2.1穿透光譜與吸收光譜的量測 38 4.2.2光電化學特性:IV scan & 偏壓1V的光電流量測 41 4.2.3搭配N-GaN Bulk和410 nm long pass filter量測光電化學特性 44 4.3使用SiO2當介電質製作表面電漿子於週期性佈植氮化鎵基板 46 4.3.1穿透光譜與吸收光譜的量測 46 4.3.2光電化學特性:IV scan & 偏壓1V的光電流量測 51 4.3.3使用掃描式顯微鏡進行元件表面形貌觀測 53 4.3.4氫氣與甲酸的產率、轉換效率 57 第五章、結論與未來展望 59 參考資料 61

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