光學微影技術能投射的最小線寬P_min=2k_1 λ/NA (P_min為圖案線寬，k_1為製成參數，NA為數值孔徑，?為光波長) ，因為繞射極限的限制，需要不斷的縮小光波長才能達到提高光學微影技術的解析度，若能在可見光波段達到突破繞射極限的效果，就可以大幅降低昂貴光源的成本。
我們利用Hyperbolic Metamaterials的超穎介質作為負折射率材料，其構成的完美透鏡可以達到突破繞射極限的聚焦效果，接著透過分析光線在三層、五層、無限層完美透鏡中的色散關係，找到符合負折射率的波長，最後取適合的光波長，藉由FDTD模擬聚焦成像的結果驗證，進一步探討此技術的可行性。

The minimum line width that optical lithography technology can project P_min=2k_1 λ/(N.A.) (P_min is the pattern line width, k_1 is the manufacturing parameter, N.A. is the numerical aperture, ? is the light wavelength). Because of the limitation of diffraction limit, it is necessary to continuously reduce the wavelength of light to improve the resolution of optical lithography technology. If the effect of breaking the diffraction limit in the visible light band can be achieved, the cost of expensive light sources can be greatly reduced.
We use the Hyperbolic Metamaterials as a negative refractive index material. The perfect lens formed by Hyperbolic Metamaterials can achieve a focusing effect that breaks the limit of diffraction. Then, by analyzing the dispersion relation of light in the three-layer, five-layer, and infinite-layer perfect lens. We can find the wavelength that matches the negative refractive index in the dispersion relation. After we pick out the wavelength of light that conforms to the phenomenon of negative refractive index. Furthermore, the Finite Difference Time Domain numerical simulation method is used to simulate the result of focusing images, and we can discuss the feasibility of this technology.

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