本論文主要是研究Mo(100)成長於Al2O3(1-102)基板上時，磊晶結構與表面形貌將會受到Mo(100)和Al2O3(1-102)之間的三維晶格匹配和張力釋放的影響，而產生一個傾斜成長的自組織奈米階梯表面。研究中我們藉由RHEED 的繞射條紋來分析Mo(100)的表面磊晶結構特性、利用X-ray 繞射儀來分析Mo(100)的磊晶結構、薄膜與基板間的傾斜角度以及薄膜厚度與晶格應力的關係。最後利用STM 來分析Mo 階梯表面形貌與特性。藉由成長溫度和厚度等參數的控制，我們成功的在溫度1000°C 和厚度100Å 的條件下成長出傾斜成長的自組織奈米階梯表面，此奈米階梯的平台寬度約20Å～60Å，是個階梯密度非常高的自組織結構。

We have investigated the growth of surface nanostructures on a Mo(100)/Al2O3(1-102) film system. The lattice structure and surface morphology will be affected by the 3D lattice match and the tensile relaxation between Mo(100) film and Al2O3(1-102) substrate. Here we use the RHEED
diffraction pattern to analyze the characteristic of surface lattice structures and then use X-ray diffraction to analyze the lattice structure, the tilt angle between film and substrate, and the relationship between the film thickness and lattice stress. At last we use STM to observe the morphology and characteristic of the step surface. We take advantage of controlling the parameters such as growth temperature and film thickness under the conditions of 1000°C and 100Å. Finally we successfully obtain the self-assemble nanosteps surface which is with tilt growth. The terraces width of these nanosteps are about 2nm~6nm and it’s obviously a highly density of self-assemble nanosteps.

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