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研究生: 林良澤
Lin, Liang-Ze
論文名稱: 氮化鎢/氮化鈦奈米多層膜之週期厚度與濺鍍偏壓對機械與磨耗性能影響之研究
Mechanical and Tribological Properties of W-N/Ti-N Multilayer Films with Different Bilayer Period and Bias Voltage
指導教授: 蘇演良
Su, Yean-Liang
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2013
畢業學年度: 101
語文別: 中文
論文頁數: 186
中文關鍵詞: 氮化鎢氮化鈦多層膜
外文關鍵詞: Tungsten nitride, Titanium nitride, multilayer films
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  • 本研究使用非平衡磁控濺鍍系統,配置鎢靶與鈦靶,並通入氮氣,製備多組W-N/Ti-N多層膜、W-N膜、Ti-N膜,並進行一系列的實驗,以分析鍍膜的結晶結構、組成成分、機械性質、抗磨耗性能。
    實驗流程分為兩階段:第一階段,製備數組週期厚度不同的W-N/Ti-N多層膜,探討多層膜週期厚度對鍍膜各項性質的影響;第二階段,使用較低的偏壓製備第一階段中抗磨耗性能最好的W-N/Ti-N多層膜,並製備較低偏壓的W-N膜與兩組不同偏壓的Ti-N膜,探討改變偏壓是否能改善鍍膜的機械性質與抗磨耗性能。
    由實驗結果得知,第一階段製備的多層膜中週期厚度40nm到10nm之間多層膜的週期厚度越低硬度越高,但對鍍膜的抗磨耗性能沒有幫助,週期厚度8nm的磨耗性質最好,被覆週期厚度8nm多層膜的鑽針較不易斷針;第二階段降低濺鍍偏壓有助於晶粒的形成,並且會改善鍍膜的附著性與抗磨耗性能,較低的濺鍍偏壓亦能使SRV磨耗試驗的摩擦係數降低;大部分的鍍膜與氮化矽球進行SRV磨耗,皆因為鍍膜附著性不足與韌性不夠而發生剝落,只有以偏壓75V製備的W-N/Ti-N週期厚度8nm多層膜沒有剝落;與鉻鋼球的磨耗試驗中週期厚度8nm多層膜與偏壓75V製備的W-N鍍膜的磨耗深度都較淺;鑽削實驗中,被覆偏壓75V週期厚度8nm多層膜能有效降低鑽針的磨耗

    This study used the closed unbalanced magnetron sputtering system, configured a tungsten target and titanium targets, and induced nitrogen, to deposite W-N/Ti-N multilayers, Ti-N layers and a W-N layer. And designed a serie of experiments to analyze the crystal structure, the composition, the mechanical properties and the wear resistance of the coating.
    Experiment was divided into two stage. In first stage preparing an array of W-N/Ti-N multilayers, and discussing the influence of multilayer’s bilayer period on the coating’s properties. In second stage, preparing a W-N/Ti-N multilayer and a W-N coating with lower bias, and preparing two Ti-N coatings with different biases, discussing whether changing bias could improve the mechanical properties and the wear resistance of the coatings.
    The result shows that, in first stage, hardness of coatings increase with decreasing of the bilayer period of multilayers while bilayer period is between 40nm and 10nm. But decreasing of the bilayer period has no benefit to the wear resistance of coatings; the multilayer with 8nm bilayer period has the best wear resistance, the micro-drills deposited 8nm bilayer period multilayer are not easier to break.
    In second stage, decreasing of bias voltage has benefit to growth of the grain, and could improve adhesion and wear resistance, the lower bias voltage could also decrease the friction coefficient of SRV wear tests. Most of the coatings peeled off while wearing with Si3N4 ball, because they are lack of adhesion and toughness. Only the W-N/Ti-N multilayer with 8nm bilayer period didn’t peel off while wearing with Si3N4 ball. The 8nm bilayer period multilayer had more shallow wear depth than other coatings. In micro-drilling tests, depositing bias 75V, 8nm bilayer period multilayer could Effectively reduce the wear of drills.

    總目錄 摘要 II Abstract IV 誌謝 VI 總目錄 VIII 圖目錄 XI 第一章 緒論 1 1-1 前言 1 1-2 研究動機 2 第二章 理論探討與文獻回顧 3 2-1 磁控濺鍍原理 3 2-2 切削刀具鍍膜 4 2-3 多層膜之性質 5 2-4 週期厚度對鍍膜的影響 7 2-5 氮化鎢 7 2-6 氮化鈦 8 2-7 鍍膜性質測定 9 2-8 國內相關研究 10 第三章 實驗方法與步驟 12 3-1 實驗目的 12 3-2 實驗流程 12 3-3 實驗方法與規劃 13 3-3-1 鍍層參數與鍍膜安排 13 3-3-2 實驗材料 14 3-3-3 成份分析 14 3-3-4 結構分析 15 3-3-5 硬度實驗 15 3-3-6 附著性實驗 15 3-3-7 磨耗實驗 16 3-3-8 表面、斷面、磨痕分析 16 3-3-9 PCB鑽削實驗 17 3-4 實驗設備清單 17 第四章 實驗結果與討論 20 4-1 週期厚度對鍍膜的影響 20 4-1-1 結構分析 20 4-1-2 膜厚與成分分析 21 4-1-3 表面與斷面 21 4-1-4 硬度分析 23 4-1-5 附著性分析 23 4-1-6 磨耗性質分析 24 4-1-7 鑽削性能分析 26 4-1-8 小結 27 4-2 濺鍍偏壓對鍍膜的影響 28 4-2-1 鍍膜結構分析 28 4-2-2 膜厚與成分分析 29 4-2-3 表面與斷面 29 4-2-4 硬度分析 30 4-2-5 附著性分析 30 4-2-6 磨耗性質分析 31 4-2-7 鑽削實驗 33 4-2-8 小結 34 第五章 結論與未來展望 35 5-1 結論 35 5-2 未來展望 36 第六章 參考文獻 37 附錄一、GDS分析圖 171 附錄二、SRV磨痕 175 附錄三、內應力分析 184 附錄四、上試件磨痕寬度 185

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