NdFeB磁石具有體積小、重量輕和磁性強的特點，是迄今為止性能價格比最佳的磁石，為可實現環保節能的功能材料之一，其應用朝小型化、輕量化、高性能化和節能方向發展，項目包括電動汽機車、壓縮機、風力發電機等應用領域。燒結型NdFeB為最常使用磁石材料之一，由於磁石內含富釹相具高的電化學活性，極易氧化，且燒結磁石的結構疏鬆，存在大量孔隙，耐腐蝕性很差，這是大多數磁石應用中急需解決的問題。
本研究分別在燒結釹鐵硼 (NdFeB) 磁石表面上濺鍍鉬基薄膜 (MoN、Cu(MoN)及Ag(MoN)) 及鎳基薄膜 (NiCrAlV及NiCrAlVN)，達到改善磁石表面性質之目的，鍍膜對於磁石表面改善機制探討以 (1). X射線繞射及穿透式電子顯微鏡做鍍膜成分及微結構分析；(2). 原子力顯微鏡分析薄膜表面形貌、奈米壓痕分析薄膜硬度及薄膜與基材間接合力；(3). 電化學阻抗頻譜分析儀分析抗腐蝕能力。
鉬基薄膜中以MoN薄膜為γ-Mo2N單一成分相，Cu及Ag摻雜後形成兩相混雜之薄膜；鎳基薄膜皆屬於非晶質薄膜。所製備薄膜與基材皆具有良好的附著特性，經刮痕測試觀察刮道內薄膜與基材分離特徵皆呈現碎裂模式 (Chipping mode)。保護NdFeB磁石最佳選擇為MoN薄膜，此薄膜具高強度奈米結構特性，包括平均表面粗糙度2.23 nm、晶粒大小約為17.9 nm及硬度為11.61 GPa；具單一γ-Mo2N薄膜為耐腐蝕能力最佳者，經由電化學測試結果顯示，其低頻阻抗相較於沒有鍍膜的NdFeB磁石提升了接近40倍。

Mo-based and Ni-based thin films were sputtered on the NdFeB magnet surfaces using pulse magnetron sputtering technique. The microstructures of thin films were examined by X-ray diffraction and transmission electron microscopy. The γ-Mo2N phase of fcc structure is a potential candidate for an ultra-incompressible and hard material. The composition of Mo-based films as well as the structures and properties depend on the sputtering parameters of the process used to deposit the films. The amorphous NiCrAlV and NiCrAlVN thin films exhibit a smooth surface with an average roughness of about 2 nm. Eventually, MoN and amorphous NiCrAlVN thin-film exhibit corrosion resistance in the NaCl and H2SO4 solutions.

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