面板產業的製程過程中除了使用大量化學品進行製程反應外，同時需要大量超純水進行面板清潔及洗淨。
本研究對象為南部科學工業園區某面板製造廠6代廠針對TFT-LCD面板工業洗淨系統中所使用的製程參數現況探討。因面板產業屬於大量用水的產業，如能將面板產業洗淨系統製程參數最佳化，不只能降低放流水排放量，更能節省工業用水水量。
研究對象為洗淨系統中所使用的物理洗淨方式(刷洗(Brush)、高壓水、超音波)進行探討搭配，初期使用時有發現許多問題。例如基板在設備清洗時若水膜佈不夠均勻時或高壓水的壓力不足所造成基板表面潔淨不佳，造成該基板則要進行化學藥劑重工才可進行後續製程等問題，就會造成製造成本的提高與水資源的浪費。本研究實際進行洗淨系統工具參數的搭配來改善，將基板水膜滿佈後搭配著洗淨系統中毛刷高轉速清洗與高壓水系統中的水量與CDA氣體流量調整搭配HPMJ參數最佳化來進行製程。有效提升整體良率0.05%，降低基板重工率3%，也降低原物料使用量。綜合以上實驗後效益，每年約可節省22,978,800元/年。

This study investigated the process parameter in TFT-LCD substrate industrial cleaning system of a 6th generation substrate factory in Southern Taiwan Science Park. Because substrate manufacture uses an immense amount of water, process parameter optimization of substrate cleaning system reduces effluent and industrial water use.
This study investigated the physical cleaning methods (brush, high-pressure water of cleaning systems and discovered several possible problems. For example, non-uniform aqueous film distribution or insufficiently pressurized cleaning water is bad for substrate cleaning. As a result, reworking substrates with chemical agent for following production process increases production cost and wasted water. This study use different cleaning system process parameters together in order to improve cleaning system. After the substrate is fully coated with aqueous film, we increases revolution speed of cleaning brush, reconfigures the water-CDA gas ratio and HPMJ system to optimize production process. Eventually, we raised total yield rate by 0.05%, reduced substrate rework rate by 3% and reduced raw material requirement. 22,978,800TWD/year is saved by the total benefit of the above experiments

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