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研究生: 馮家蔚
Feng, Chia-Wei
論文名稱: 鹵化物成分工程調控二維鈣鈦礦類神經元件之電性機制與突觸特性之研究
Halide Compositional Engineering for Tuning Electrical Mechanisms and Synaptic Properties of 2D Perovskite Neuromorphic Devices
指導教授: 陳昭宇
Chen, Chao-Yu
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年: 2026
畢業學年度: 114
語文別: 中文
論文頁數: 121
中文關鍵詞: 二維鈣鈦礦憶阻器人工突觸阻態切換離子極化
外文關鍵詞: Two-dimensional perovskite, Neuromorphic device, Halide compositional engineering, Resistive switching, Ionic polarization, Artificial synapse
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  • 隨著大數據時代的來臨,傳統計算機的馮紐曼架構(von Neumann architecture)因處理器與記憶體分離而面臨的傳輸瓶頸日益凸顯。類神經運算(Neuromorphic Computing)作為一種用於模擬人腦突觸可塑性(Synaptic Plasticity)的新型運算架構,因其運算與儲存並行性與低功耗特性,被視為解決此瓶頸的關鍵技術。本研究聚焦於二維Ruddlesden-Popper相有機-無機雜化鈣鈦礦(PEA₂PbI₍₄₋ₓ₎Brₓ),利用其層狀結構帶來的低能耗與優異的環境穩定性,開發高效能之人工突觸元件。本研究的核心貢獻在於系統性地探討了鹵素比例(I/Br ratio)對阻態切換(Resistive Switching, RS)機制的決定性影響。實驗發現,隨著溴(Br)含量的增加,元件的電性行為呈現從「電感性(Inductive)氧化還原切換」向「電容性(Capacitive)極化」的連續轉變。富含碘(Iodide-rich)的元件展現了典型的雙極性切換行為,其開關比(ON/OFF ratio)高達10⁴,並成功模擬了脈衝相依可塑性(SNDP,SVDP,SDDP,SFDP)。相對地,富含溴(Bromide-rich)的元件則表現出顯著的順時針電容迴圈,顯示極強的離子屏蔽效應。基於上述實驗結果,本研究提出了一套「離子動力學通用模型」(Universal Ion-Kinetics Model)。該模型結合了Kröger-Vink缺陷化學理論與離子遷移機制,闡明了在低電壓區由離子位移主導的介電極化,與高電壓區由碘空缺VI•成核主導的導電通道生長之間的競爭關係。此外,透過改變掃描速率(Scan-rate dependent)實驗,本研究進一步證實了導電通道的形成受限於動力學時間尺度(Kinetic time-scale)。此發現為解決混合鹵素鈣鈦礦在人工突觸元件應用中的問題提供了重要的證據。

    Mixed ionic-electronic conduction in metal halide perovskites has attracted considerable attention for neuromorphic computing because ion migration enables analog conductance modulation similar to biological synapses. In this study, two-dimensional Ruddlesden–Popper (RP) mixed-halide perovskites, PEA₂Pb(I₄₋ₓBrₓ) (x = 0–4), were employed as the active layer to fabricate Au/PEA₂Pb(I₄₋ₓBrₓ)/FTO artificial synaptic devices. The influence of halide composition on crystal structure, electrical characteristics, and synaptic plasticity was systematically investigated.
    Electrical measurements demonstrated that the iodide-rich device exhibited stable bipolar resistive switching with an ON/OFF ratio of approximately 10⁴ and a read current of 10⁻⁷ A. In contrast, increasing the Br content gradually suppressed resistive switching and transformed the hysteresis from inductive to capacitive behavior. Furthermore, scan-rate-dependent measurements indicated that slower voltage sweeping promoted conductance modulation, whereas fast voltage sweeping mainly resulted in capacitive polarization due to insufficient ionic migration.
    The fabricated devices successfully emulated various synaptic functions, including spike-number-dependent plasticity (SNDP), spike-voltage-dependent plasticity (SVDP), spike-duration-dependent plasticity (SDDP), and spike-frequency-dependent plasticity (SFDP). The PEA₂PbI₄ device exhibited the largest synaptic weight modulation, while Br-rich devices showed lower energy consumption but reduced conductance variation.
    Based on the experimental observations and previous reports on ion migration and halide redox chemistry, a Universal Ion-Kinetics Model is proposed. Under low electric fields, the device behavior is dominated by ionic polarization. At higher electric fields, selective iodide oxidation generates iodine vacancies that gradually accumulate to form vacancy-mediated conductive pathways. The resulting defect-assisted hopping transport continuously modulates device conductance, accounting for both resistive switching and analog synaptic behavior. This work demonstrates that halide composition engineering provides an effective strategy for regulating ionic kinetics and optimizing two-dimensional perovskite neuromorphic devices.

    摘要i 誌謝xii 表目錄xvii 圖目錄xviii 第一章緒論1 1.1 前言1 1.2 生物神經元結構與運作機制簡介1 1.3 類神經元件運作機制與簡介4 1.3.1 離子遷移與阻態切換4 1.3.2 鈣鈦礦材料的軟晶格與缺陷熱力學7 1.3.3 微觀遷移路徑與活化能之量化分析8 1.3.4 晶界效應與極化遲滯8 1.4 突觸可塑性之機制與特性介紹10 1.5 類神經網路運作機制14 1.6 鹵化物鈣鈦礦類神經元件16 1.6.1 有機無機混成鹵化物鈣鈦礦OHP16 1.6.2 二維有機無機混成鹵化物鈣鈦礦17 1.7 實驗動機23 第二章文獻回顧25 2.1 鈣鈦礦材料的發展25 2.2 二維鹵化鉛鈣鈦礦27 2.2.1 二維鹵化鉛鈣鈦礦介紹與製程27 2.2.2 二維鹵化鉛鈣鈦礦特性29 2.3 鹵化物鈣鈦礦類神經元件發展32 2.3.1 二極式鹵化物鈣鈦礦類神經元件32 2.3.2 低維度鈣鈦礦結構在類神經元件之發展38 第三章 實驗方法與儀器分析46 3.1 實驗儀器與藥品46 3.2 實驗流程47 3.2.1 基板清洗及切割48 3.2.2 鈣鈦礦前驅液配製48 3.2.3 鈣鈦礦主動層製備49 3.3 金屬電極製備49 3.4 量測特性與分析儀器原理50 3.4.1 電流-電壓特性曲線與元件之突觸可塑性量測分析(I-V and synaptic plasticity measurement)50 3.4.2 光致發光光譜儀(Photoluminescence, PL)50 3.4.3 X光繞射儀(X-ray Diffraction, XRD) 51 3.4.4 掃描式電子顯微鏡(Scanning Electron Microscope, SEM)51 第四章結果與討論53 4.1 不同x值之PEA₂PbI₄₋ₓBrₓ(x=0~4)鈣鈦礦薄膜分析53 4.1.1 薄膜結構分析XRD53 4.1.2 薄膜結構分析SEM54 4.2 元件電性分析56 4.2.1 I-V電性量測分析56 4.3 鹵素成分工程對導電特性動力學之調控 59 4.3.1富碘相(Iodide-rich)的劇烈氧化:59 4.3.2富溴相(Bromide-rich,高x值)的結構錨定與空間限域效應:60 4.4 突觸可塑性:SNDP/SVDP/SDDP/SFDP61 4.4.1 脈衝數量相依可塑性(Spike-Number Dependent Plasticity, SNDP)61 4.4.2 SNDP量測參數設置與指標量化(Measurement Setup and Quantification)61 4.4.3 脈衝電壓相依可塑性 (Spike-Voltage Dependent Plasticity, SVDP)64 4.4.4 SVDP量測參數設置與指標量化65 4.4.5 脈衝電壓時間相依可塑性 (Spike-Duration Dependent Plasticity, SDDP)67 4.4.6 SDDP量測參數設置與指標量化67 4.4.7 脈衝頻率相依可塑性(Spike-Frequency Dependent Plasticity, SFDP)70 4.4.8 SFDP量測參數設置與指標量化70 4.5 元件機制解釋與統整73 4.5.1 二維鈣鈦礦中的離子遷移74 4.5.2 低電場與短時間刺激下的離子極化75 4.5.3 超過臨界條件後的電化學反應76 4.5.4 碘與溴之選擇性氧化差異77 4.5.5 碘空缺形成之高導電路徑79 4.5.6 掃描速率實驗對機制的支持80 4.5.7 脈衝寬度與掃描速率的一致性81 4.5.8 鹵素成分對機制的調控82 4.5.9 可逆回復與突觸可塑性的來源83 4.5.10 Ion-Kinetics Model83 4.6 元件能耗比較85 4.6 元件之突觸可塑性與機制總整理與其他文獻之比較86 第五章結論與未來展望87 參考文獻89

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