快速且經濟的奈米結構製作方法是奈米科技領域中最重要的研究之一，相較於傳統光學微影技術，奈米壓印技術具有高產量、低成本的優點，且相對不受光源曝光的物理限制；而在改良式的壓印技術中，逆式壓製程可直接在已圖案化的基材表面上堆疊、製作多層結構，此3D結構克服了多層結構的限制，並廣泛應用於生物感測器、微機電元件、光學元件…等方面。
本研究結合逆式壓印製程與微過濾技術，利用多孔陶瓷的製作原理製備壓印用多孔模具。其方式為以低表面能材料PMSQ覆蓋多孔模具凸面孔洞，以機械幫浦提供的驅動力使奈米粒子的溶劑被凹槽孔洞排除後讓奈米粒子選擇性截留在凹槽形成濾餅。再利用模具與基板表面改質後的表面能差異在PET基板上轉印出無殘餘層圖案，且此技術可直接疊印出3D圖案結構，不需反應性乾蝕刻製程或殘餘層移除步驟。另一方面，若多孔模具凸面孔洞未經覆蓋的情況下，以微過濾將溶劑與粒子分離後，奈米粒子沉積於多孔模具上，亦可利用微接觸法轉印模具凸面的奈米粒子圖案至PET基板，並以此模具含浸乙醇應用於溶劑輔助壓印技術。

Low cost and high speed nano structure manufacturing is always the first concern of nano technology. Nano imprinting lithography (NIL) breaks the physical limitation of exposure in conventional optical lithography, and looks after both high production and low cost. Among these improved imprinting techniques, reversal-imprinting process is more advanced in producing multi-layer structure, which is, fabricating structure above a patterned substrate. This three dimensional structure is widely applied on biosensors, micro-electronic devices, and many optical devices.
This research employs reversal-imprinting and microfiltration, using manufacturing process of porous ceramics material to produce porous imprinting mold. Porous mold protruding facet is covered with poly(methylsilsesquioxane) (PMSQ), a low-surface energy material. In favor of mechanical pump, solvent is expelled from concave holes and nano particles selectively fill into concave structure and forming a cake. This technique fabricates non-residual layer pattern on PET substrate. Because surface modification providing surface energy difference between mold and substrate, the process does not require any further reactive ion etching (RIE) or residual layer remove. Three dimensional structures can be fabricated fast and easy. On the other hand, if porous mold uncovered, nano particles deposit at porous hole unselectively. Micro-contact printing transfers nano particle pattern on top of mold to PET substrate, which can be further applied on solvent-assisted imprinting by ethanol impregnation.

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