| 研究生: |
顏君乘 Yen, Chun-Sheng |
|---|---|
| 論文名稱: |
高真空退火處理對氧化釩薄膜
磁性與結構的研究 Magnetism and structure of the vacuum annealed vanadium oxide thin films |
| 指導教授: |
黃榮俊
Huang, Jung-Chun |
| 學位類別: |
碩士 Master |
| 系所名稱: |
理學院 - 物理學系 Department of Physics |
| 論文出版年: | 2005 |
| 畢業學年度: | 93 |
| 語文別: | 中文 |
| 論文頁數: | 92 |
| 中文關鍵詞: | 過渡金屬氧化物 、氧化釩 、稀磁性半導體 |
| 外文關鍵詞: | vanadium oxide, diluted magnetic semiconductors |
| 相關次數: | 點閱:96 下載:5 |
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聰穎材料氧化釩薄膜對溫度變化非常靈敏,具有特別電性與磁性的特性最近引起高度的討論。在塊材的形式,許多穩定的釩氧化物,例如,VOX 、V2O3、VO2、V2O5已經被廣泛的討論在熱、電的特性。
然而,在文獻上釩氧化物薄膜具有鐵磁性的性質幾乎未被討論,在此我們首位利用離子束濺鍍成長氧化釩薄膜發現具有鐵磁性的性質。接而我們詳細的討論在此製成成長出的氧化釩薄膜,在高真空中不同退火溫度時,各別的結構、價數、磁性、電性變化與關連性。最後以V的吸收前緣(XANES)與延伸吸收光譜(EXAFS)確認此氧化釩的能態、價數與電子耀遷等行為。
結果顯示此製成在剛沉積時 、高真空退火200℃及300℃為室溫鐵磁性,而再退火到400℃具有反磁的行為。在這一系列的系統中200℃退火有最大的飽和磁化量。另外在XANES、EXAFS與電性顯示此釩氧化物的價數介於三價到五價之間隨著高真空退火而價數漸漸降低,此結果推測磁性來源是V2O5結構因退火氧空缺所致。
The thin film material with ”smart” properties sensitive to temperature variations, electrical, magnetic field, has recently attracted great attention. In bulk form, various vanadium oxides with unusual thermal ,optical and electrical properties, such as VOx, V2O3, VO2, V2O5 , have been widely studied.
However, the ferromagnetic properties of vanadium oxide thin films are rarely discussed in public domain. In this presentation, we first compose ferromagnetic thin films of vanadium oxides by ion beam sputter. Then, we discuss the property changes of structural, valence, magnetic and electric characteristics by annealing treatment. Finally, we apply XANES and EXAFS to identify the variation of vanadium oxidation state and present our approach to the vanadium oxide films.
The result indicated RT ferromagnetism has been observed for the as deposited , 200℃ and 300℃ annealed films, while diamagnetic behavior appears for 400℃ annealed film. The 200℃ annealed VOx films possess the highest magnetic moment in this system. Its XANES,EXAFS and electric properties could show the possible valence distribute among pentad to trivalence with annealing process which implied origin of magnetism maybe cause from oxygen vacancy.
【Reference】
[1.1] 黃迪靖等,半金屬氧化物之能譜研究,物理雙月刊(廿十卷六期)
[1.2] S.Surnev,M.G. Ramsey, F.P. Neter, Surface Science 73,117-165(2003)
[1.3] Yuan Ningyi, Li Jinhua,etc ,Applied surface science 191, 176-180(2002)
[1.4] E.Baba Ali, J.C. Bernede,etc ,Journal of Crystal Growth 208(2000)471-481
[1.5] A.I. Gavrilyuk, F.A. Chudnovski, Sov.Tech. Phys. Lett. 3 (1977) 69.
[1.6] S.F. Cogan, N.M. Nguyen, S.J. Perrotti ,etc,J.Appl. Phys. 66 (1989) 1333.
[1.7] Se-Hee Lee, z Ping Liu, C. Edwin Tracy, and David K. Benson ,Solid-State Letters, 2 (9) 425-427 (1999)
[1.8]Y.Shimizu,K.Nagase, N.Miura, N.Yamazoe,Jpn.J.Appl. Phys.29(1990)L1708.
[1.9]L.Fiermans, P.Clauws,W.Lambrecht, Phys. Status Solodi A 59(1980) 485
[1.10] H. Katzke, P. Tole´dano,etc. Phys Review B 68, 024109 (2003)
[1.11] Udo Schwingenschlogl. and Volker Eyert, Ann. Phys. 13, No. 9, 475 (2004)
[1.12]G.Keller,K.Held,V.Eyert,D. Vollhardt,etc .Phys Review B 70 ,205116 (2004)
[1.13] M.Benmousea,E. Ibonouelghazi, etc ,Thin Solid Films 265 ,22-28(1995)
[1.14] C.Hebert ,etc. Catalysts Letter 83,115-119 (2002)
[1.15]Geert Silversmit,Jeroen A. van Bokhoven,etc.Applied Catalysis A285,151-162(2005)
[1.16] Hideto Watanabe, Ken-ichi Itoh, etc. ,Thin Solid Films 386 2001 281-285
[1.17]Yuan Ningyi,Li Jinhua,etc Applied Surface Science 191 176-180(2002)
[1.18] G. Silversmit,. H. Poelman and R. De Gryse, Surf. Interface Anal. 36: 1163–1166(2004)
[1.19] Yong Joon Park,z Kwang Sun Ryu, Nam-Gyu Park, Journal of The Electrochemical Society, 149 (5) A597-A602 (2002)
[1.20] D. H. Kim and H. S. Kwok, Appl. Phys. Lett., Vol. 65, No. 25, 19( 1994)
[1.21] Udo Schwingenschogl. and Volker Eyert Ann. Phys. (Leipzig) 13, No. 9, 475 – 510 (2004)
[1.22]G.Garry, O.Durand, A.Lor dereau, Thin Solid Films 453 –454 (2004) 427–430
[1.23]L. Krusin-Elbaum, D. M. Newns, H. Zeng, V. Derycke*, J. Z. Sun & R. Sandstrom, Nature 431 672-675(2004)
[2.1] 王文楠、田聰, CeMn2Si2和LaMn2Si2中之3d磁序 3d magnetic ordering in CeMn2Si2 and LaMn2Si2 ,國立成功大學物理研究所碩士論文(2002)
[2.2] Sōshin Chikazumi著,張煦、李學養譯,"磁性物理學",聯經出版社,(1982)
[2.3] 宛德福,馬興隆. “磁性物理學”,電子科技大學出版社 (1994).
[2.4] 戴道生,錢昆明,鐘文定,廖紹彬. “鐵磁學”,科學出版社 (2000).
[2.5] 洪振湧、周 雄、鑭鈰錳氧與鑭鈣錳氧雙層薄膜中磁阻與磁化率之界面效應國立中山大學物理研究所碩士論文(2004)
[2.6] A.R.West, Solid state Chemistry and Its Applications, John Wiley &Sons, New York, p.310 ( 1977).
[2.7] Chakrabarti et al, PRB 59 10583 (1999)
[2.8] Mokerov et al, Opt. Spectrosc. 40 58 (1976)
[2.9] 王銀國、郭光宇,以第一原理計算研究過渡金屬化合物的電子結構、X光吸收光譜、光學特質及吳學特性, 國立台灣大學物理研究所博士論文(2003)
【Reference】
[3.1] 戴振益、黃榮俊, [Fe3O4/ZnO]n 多層膜及退火膜結構與磁性之研究,成大物理碩士論文(2004)
[3.2] 國立臺灣大學物理學系,楊鴻昌教授,科儀新知,第十二卷第六期,72-79(1991)。
[3.3] D.C. Koningsberger and R.Prins,X-ray Absorption principles, applications, techniques of EXAFS,SEXAFS and XANES,pp.574-575(1988)
[3.4] J.J.Rehr and R.C. Albers,Rev. Mod. Phys.72,621(2000)
[4.0] Y. Matsumoto et al., Jpn. J. Appl. Phys., Part 2 40, L1204 (2001)
[4.1] Nguyen Hoa Hong, Joe Sakai, and Awatef Hassini, Appl. Phys. Lett. 84, 2602 (2004)
[4.1] K. Ueda, H. Tabata, and T. Kawai, Appl. Phys. Lett. 79, 988 (2001).
[4.2] Jung H. Park, Min G. Kim, Hyun M. Jang,Sangwoo Ryu andYoung M. Kim, Appl. Phys. Lett. 84, 1338 (2003)
[4.3] S. B. Ogale et al., Phys. Rev. Lett. 91, 077205 (2003).
[4.4] G.Garry, O.Durand, A.Lor dereau,,Thin Solid Films 453 –454,427–430 (2004)
[4.5] Yong Joon Park,z Kwang Sun Ryu,etc,Journal of The Electrochemical Society, 149 (5),A597-A602 (2002)
[4.6] J.Wong, F.W.Lytle,etc, Physical Review B 30,5596 (1984)
[4.7] Webatom網址http://millenia.cars.aps.anl.gov/cgi-bin/atoms/atoms.cgi
[4.8]ICSD資料庫網址http://140.110.17.8/icsd/ (需要申請帳號)
[4.9] R Zimmermann,R Claessen,etc,J. Phys:Conden. Matter 10,5697-5716 (1998)