對於光伏元件的應用，實現寬頻帶光波上具有接近於零的反射率為達到高能量轉換效率之太陽能電池的首要目標。現今的表面處理方式，是用於降低太陽光在太陽能電池構造中的光反射率之商業化技術。儘管如此，大約10％的光學損耗仍然歸因於太陽能電池和周圍介質之間的折射率不匹配所造成，這顯著地阻礙了提高光電效率的可能性。因此，在本研究中，系統地研究了具有優異光吸收能力的矽（Si）奈米線陣列結構，潛在地克服這些關鍵問題。通過有限時域差分法(FDTD)模擬，揭示了Si奈米線結構參數（包括直徑，長度和間距）對光捕獲能力的影響。在奈米線陣列的週期性以及電場分佈方面的相互因素被建模以優化所具有的光學特性，並進一步闡明了其基本機制，以完全理解奈米等級的結構依賴性。預計這些結果實際上將指導用於高性能光伏應用的奈米線設計。
此外，本研究藉由實驗和模擬可視化矽奈米線結構的光學吸收特性以應用於太陽能電池中，搭配低成本的奈米球微影方法與濕式金屬輔助化學蝕刻技術的結合，以實現具有精確尺寸的矽奈米線陣列的調控，這使我們能夠優化混合太陽能電池的光捕獲效應，模擬計算結果和製作設計上對於低成本且穩定的高性能太陽能電池具有很大潛力。

A low cost nanosphere lithographic method in combination with wet chemical etching technique were performed to realize the controlled formation of silicon nanowire arrays with precisely defined dimensions. Designs of nanostructures were modeled with FDTD analysis, which enabled us to optimize the light-trapping effects of hybrid solar cells. The results along with design strategy were anticipated to be highly potential for the low-cost, simplified and reliable high-performance solar cells. Therefore, the enhanced light absorption of silicon nanowire arrays can be effectively observed under wide wavelengths of incident light by tuning their diameters and spacing modeled by FDTD simulation. As a consequence, the ultimate efficiency of nanowire-based solar cells can reach 36.8% based on the optimized structural designs of nanowire structures, which is quite promising for the development of next-generation photovoltaic cells with superior optoelectronic properties.

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