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研究生： 呂昀積
Lu, Yun-Chi
論文名稱： 結合全像微影技術及光化學還原奈米金製作選擇性生成圖案化單層金奈米粒子分布
Combining holographic lithography and photoreduction of gold nanoparticles for selective generation of patterned monolayer gold nanoparticles distribution
指導教授： 林俊宏
Lin, Chun-Hung
學位類別： 碩士
Master
系所名稱： 理學院 - 光電科學與工程學系
Department of Photonics
論文出版年： 2022
畢業學年度： 111
語文別： 中文
論文頁數： 153
中文關鍵詞： 全像微影技術 、SU-8 光化學還原 、單層金奈米粒子 、選擇性成長 、圖案化製作
外文關鍵詞： Holographic lithography, SU-8 photoreduction, Monolayer gold nanoparticles, Selective growth, Patterning
相關次數： 點閱：59  下載：0 
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    • 摘要 i Abstract ii 致謝 x 目錄 xi 表目錄 xv 圖目錄 xxi 第 一 章 緒論 1 1.1 前言 1 1.2 研究動機 5 1.3 論文架構 6 1.4 內文縮寫 7 第 二 章 理論原理與文獻回顧 8 2.1 全像微影技術(Holographic lithography) 8 2.2 光化學還原法 14 第 三 章 研究方法 21 3.1 模具製作 21 3.1.1 矽母模具製作方法 21 3.1.2 全氟聚醚軟模具製作方法 23 3.2 使用LED曝光進行金奈米粒子還原製作 26 3.2.1 LED燈源曝光時實驗步驟及曝光架構設置 27 3.2.2 以冰塊輔助樣品降溫實驗步驟及曝光架構設置 28 3.2.3 以加熱板輔助樣品增溫實驗步驟及曝光架構設置 28 3.3 利用汞燈曝光進行金奈米粒子還原製作 31 3.3.1 實驗步驟及曝光架構設置 31 3.4 相位光罩製作 33 3.4.1 以PMMA光柵圖案為遮罩將鉻薄膜以濕式蝕刻法蝕刻 34 3.4.2 製作PMMA光柵圖案並進行正鍍鉻後舉離PMMA 36 3.4.3 以鉻光柵圖案作為遮罩並蝕刻石英玻璃製作相位光罩 37 3.5 400.5 nm雷射曝光測試 40 3.5.1 將雷射光入射至相位光罩後對SU-8進行曝光 40 3.5.2 將雷射光對SU-8進行曝光固化 41 3.6 使用LED曝光還原進行金奈米粒子的圖案化製作 44 3.6.1 圖案化前以LED向上曝光實驗步驟及曝光架構設置 45 3.6.2 以封閉空間輔助樣品增溫實驗步驟及曝光架構設置 45 3.6.3 以光罩曝光進行圖案化實驗步驟及曝光架構設置 46 3.6.4 經1次還原圖案化之樣品進行高次還原實驗步驟 46 3.7 實驗樣品光學影像之拍攝 49 3.8 實驗樣品光學顯微鏡(OM)及CCD相機影像量測 49 3.9 實驗樣品穿透率之量測 52 3.9.1 以光源及光譜儀直接進行穿透頻譜量測 52 3.9.2 以積分球及光譜儀進行穿透頻譜量測 53 3.10 電子顯微鏡(SEM)樣品表面及切面影像量測 55 3.11 原子力顯微鏡(AFM)檢測樣品表面影像量測 57 3.12 各種實驗透明材料及光源的頻譜量測 59 3.12.1 實驗使用透明材料之穿透頻譜(由3.9.2節方法量測) 59 3.12.2 實驗使用光源波長對強度之關係 59 3.13 確認400.5 nm雷射能否用於干涉式微影圖案化 64 第 四 章 實驗結果與討論 68 4.1 使用LED曝光進行金奈米粒子還原製作 68 4.1.1 370 nm LED還原效果比較及結論 68 4.1.2 370 nm LED及406.5 nm LED還原效果比較及結論(1) 78 4.1.3 370 nm LED及406.5 nm LED還原效果比較及結論(2) 81 4.1.4 LED還原方法與汞燈還原方法比較及結論 83 4.1.5 370 nm LED及406.5 nm LED還原效果比較及結論(3) 87 4.1.6 370 nm LED不同高度還原效果 90 4.1.7 LED曝光進行金奈米粒子還原製作的重複性 94 4.2 相位光罩(Phase mask)製作 95 4.2.1 以PMMA光柵圖案為遮罩將鉻薄膜以濕式蝕刻法蝕刻 95 4.2.2 製作PMMA光柵圖案並進行正鍍鉻後舉離PMMA 99 4.2.3 以鉻光柵圖案作為遮罩並蝕刻石英玻璃製作相位光罩 102 4.3 400.5 nm雷射曝光測試 105 4.3.1 將雷射光入射至相位光罩後對SU-8進行曝光 105 4.3.2 將雷射光對SU-8進行曝光固化 108 4.4 使用LED曝光還原進行金奈米粒子的圖案化製作 111 4.4.1 圖案化前以370 nm LED向上曝光還原效果比較及結論 111 4.4.2 以封閉空間輔助樣品增溫之曝光還原效果比較及結論 114 4.4.3 以光罩曝光進行圖案化之曝光還原效果比較及結論 119 4.5 改良還原流程與實驗參數最佳化 125 4.5.1 樣品進行曝光還原前對於SU-8預固化之要求 125 4.5.2 以優化後參數及固有參數進行汞燈還原之比較 130 4.5.3 調控SU-8預固化時間及HAuCl4溶液濃度 133 4.5.4 以還原參數最佳化進行圖案化製作 138 4.6 驗證樣品是否需要SU-8才可進行化學還原 142 第 五 章 結論與展望 144 5.1 結論 144 5.1.1 光化學還原實驗結果歸納 144 5.1.2 全像微影技術難以結合光化學還原的因素 146 5.2 未來展望 147 5.3 參考文獻 149

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