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研究生: 劉侑明
Liu, Yu-Ming
論文名稱: 微波電漿輔助化學氣相沉積奈米鑽石 及其於機械式共振器之應用
Microwave Plasma Enhanced Chemical Vapor Deposition of Nanodiamond and Its Application for Mechanical Resonators
指導教授: 曾永華
Tzeng, Yonhua
學位類別: 碩士
Master
系所名稱: 工學院 - 奈米科技暨微系統工程研究所
Institute of Nanotechnology and Microsystems Engineering
論文出版年: 2010
畢業學年度: 98
語文別: 中文
論文頁數: 93
中文關鍵詞: 奈米鑽石微波電漿輔助化學氣相沉積機械式共振器
外文關鍵詞: nanodiamond, MPECVD, resonator
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  • 本研究利用微波電漿輔助化學氣相沉積成長奈米鑽石薄膜於矽基
    東上,並搭配基東加熱系統成功地於低於攝氏六百度以下沉積鑽石薄
    膜,且其粗糙度(8.17 nm)及均勻性極佳,更將此參數用於沉積奈米鑽
    石於兩吋的矽基東上,其表面依然保有鏡面的特性。於奈米鑽石的沉
    積參數利用改變氫氣的流量,使得鑽石的晶粒大小產生改變,並利用
    掃描式電子顯微鏡、拉曼及原子力顯微鏡等設備分析並探討鑽石薄膜
    的特性。
    之後將所沉積出來的鑽石薄膜利用黃光微影及蝕刻製程製作出鑽
    石懸臂式共振器,並透過雷射都普勒振動量測儀量測其共振頻率,同
    時利用有限元素分析法進行模擬,並與量測的結果進行比較及探討。
    利用模擬及量測結果的比較,發現當鑽石共振器的長度較短時,會產
    生共振頻率大幅衰減的現象,此乃能量耗損所造成的結果。並透過模
    擬的結果進行楊氏模數匹配,發現利用Ar/H2/CH4=150/10/1 參數所沉
    積出來之鑽石膜其楊氏模數接近1000 GPa,而利用其他參數沉積之鑽
    石薄膜的楊氏模數也有500 GPa 以上。最後透過掃描電子顯微鏡及拉
    曼散射來探討參數的改變對於鑽石薄膜的影響及其造成共振頻率改變
    之效應。

    In this research, Nanodiamond films are deposited on silicon substrate
    by Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD).
    Nanodiamond films which have good roughness and uniformity are
    deposited in low microwave power and low temperature (<600℃) with
    substrate heating system. With this growth condition, nanodiamond films
    can be also deposited on 2 inch silicon wafer and the surface is still mirror
    like. We decrease the flow rate of hydrogen and the grain size of diamond
    will be decreased. Nanodiamond films will be analyzed by SEM, AFM and
    Raman scattering.
    The diamond resonator will be fabricated by lithography, RIE and wet
    etching process. The resonant frequencies will be measured by Laser
    Doppler Vibrometer and simulated by Finite Element Method. The results
    of measurement and simulation will be compared and discussed. We found
    the frequency will decrease heavily because the energy loss when the
    cantilever is less than 180μm. We do the Young’s modulus fitting with the
    results of measurement and simulation. The Young’s modulus of
    nanodiamond film is near 1000 GPa in Ar/H2/CH4=150/10/1 condition and
    the Young’s modulus of other nanodiamond films are over 500 GPa. We
    also discuss the frequency shift and measured nanodiamond properties by
    Raman scattering and SEM.

    摘要 .............................................. I Abstract...........................................II 誌謝 ............................................ III 目錄............................................... V 圖目錄 ......................................... VIII 表目錄 ........................................... XI 第一章 緒論........................................ 1 1.1 前言........................................... 1 1.2 鑽石的沿革 .................................... 1 1.3 鑽石及碳元素簡介 .............................. 2 1.4 鑽石的性質及應用............................... 3 1.4.1 鑽石的性質 .................................. 3 1.4.2 鑽石的應用 .................................. 6 第二章 CVD 鑽石薄膜製程文獻探討 ................... 9 2.1 CVD 的種類 .................................... 9 2.1.1 直流化學氣相沉積法(DCCVD) ................... 9 2.1.2 熱燈絲化學氣相沉積法(HFCVD) ................ 10 2.1.3 微波電漿化學氣相沉積法(MPECVD) ............. 11 2.2 CVD 的比較 ................................... 13 2.3 鑽石的成核機制 ............................... 14 2.4 CVD 的鑽石成長機制 ........................... 15 2.4.1 鑽石薄膜的成長 ............................. 16 2.4.2 成長鑽石薄膜基東的選擇 ..................... 17 2.5 反應氣體對鑽石的重要性 ....................... 19 2.5.1 甲烷(CH4) .................................. 19 2.5.2 氫氣(H2) ................................... 21 2.5.3 氬氣(Ar) ................................... 23 2.6 鑽石薄膜的種類 ............................... 23 2.6.1 微米多晶鑽石薄膜(Micro Crystalline Diamond, MCD) .. 23 2.6.2 奈米鑽石薄膜(Nano Crystalline Diamond, NCD) ....... 25 2.6.3 超奈米鑽石(Ultra Nano Crystalline Diamond, UNCD) .. 26 2.7 鑽石膜的檢驗 ................................. 28 2.7.1 掃描式電子顯微鏡(Scanning Electron Microscope, SEM) 28 2.7.2 拉曼散射光譜(Raman Spectrum) ............... 29 2.7.3 分光光譜分析(Optical Emission Spectrum, OES) .......29 2.7.4 原子力顯微鏡 (Atomic Force Microscope, AFM) ....... 32 第三章 機械式共振器文獻探討 ...................... 33 3.1 機械式共振器的驅動方式 ....................... 34 3.1.1 靜電力驅動 ................................. 34 3.1.2 熱力驅動 ................................... 36 3.1.3 其他驅動法 ................................. 37 3.2 鑽石懸臂式共振器 ............................. 38 3.3 各種的機械式共振器 ........................... 41 第四章 研究及實驗方法 ............................ 45 4.1 基板的前處理 ................................. 45 4.1.1 基板的清潔 ................................. 45 4.1.2 基板的前處理 ............................... 46 4.2 微波電漿化學氣相沉積系統 ..................... 47 4.3 基東加熱系統 ................................. 50 4.4 鑽石懸臂樑製程 ............................... 51 4.4.1 鑽石懸臂樑(黃光微影製程) ................... 51 4.4.2 鑽石懸臂樑(蝕刻製程) ....................... 53 4.4.2.1 反應離子蝕刻(Reactive Ion Etch, RIE) ..... 53 4.4.2.2 濕式蝕刻(BOE ) ........................... 56 第五章 結果與討論 ................................ 58 5.1 鑽石薄膜的成長 ............................... 58 5.1.1 氫氣鑽石製程(H2-rich) ...................... 58 5.1.2 氬氣鑽石製程(Ar-rich) ...................... 59 5.1.2.1 氣體流量的影響 ........................... 62 5.1.2.2 降低氫氣的影響 ........................... 64 5.1.2.3 低溫奈米鑽石製程 ......................... 72 5.1.3 鑽石鍍膜於兩吋矽基板 ....................... 75 5.1.4 鑽石鍍膜討論 ............................... 76 5.2 懸臂樑共振器的製作 ........................... 77 5.3 鑽石懸臂共振器量測 ........................... 80 5.3.1 鑽石懸臂共振器頻率模擬 ..................... 80 5.3.2 鑽石共振器的頻率量測 ....................... 82 5.4 鑽石懸臂共振器結果討論 ....................... 85 第六章 結論 ...................................... 88 第七章 未來展望 .................................. 89 第八章 參考文獻 .................................. 90

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