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研究生： 陳柔安
Chen, Jou-An
論文名稱： 在氧化鋁/4-乙基吡啶離子液體中電鍍鋁金屬的探討
Study on The Electrodeposition of Aluminum in Aluminum Chloride/4-Ethylpyridine Ionic Liquid
指導教授： 孫亦文
Sun, I-Wen
學位類別： 碩士
Master
系所名稱： 理學院 - 化學系
Department of Chemistry
論文出版年： 2021
畢業學年度： 109
語文別： 中文
論文頁數： 61
中文關鍵詞： 離子液體 、電沉積 、鋁 、中性配體 、含鋁陽離子
外文關鍵詞： Ionic liquid, Electrodeposition, Aluminum, neutral ligand, Al-containing cations
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    • 本篇論文以中性配體4-乙基吡啶(4-ethylpyridine)與氯化鋁(AlCl3)以莫耳比率1.3：1混合形成離子液體，氯化鋁會發生不對稱的裂解產生AlCl2+ 與 AlCl4−，前者會與4-乙基吡啶錯合形成[AlCl2(4-ethylpyridine)2]+，此為離子液體的電活性物質，與傳統用來鍍鋁的離子電活性物質都是含鋁的陰離子(例如Al2Cl7–)不同，同樣可以用來電沉積鋁。本篇實驗分成兩個部分：(1)以循環伏安法、旋轉電極循環伏安法、成核來探討鋁在37℃下，於AlCl3/4-Et-py的電化學行為。(2)透過定電位電鍍、定電流電鍍以及脈衝電位法來電沉積鋁在銅基材上，並利用SEM、EDS、XRD來分析鍍層。SEM結果顯示三種電鍍方法所鍍出來的鋁層形貌分為三種：顆粒狀、片狀與塊狀。

    The electrochemical behaviors of Aluminum were investigated in Aluminum Chloride/4-Ethylpyridine (1.3:1) ionic liquid. The generation of AlCl2+ and AlCl4– resulted from the asymmetric cleavage of AlCl3, and the Al-containing cations ([AICl2(4-Et-Py)2]+) were produced because the coordination occurred between AlCl2+ and 4-Ethylpyridine when they had been proposed. The cyclic voltammograms of this ionic liquid recorded on various electrodes indicated aluminum metal could be electrodeposited at the temperature as low as 37°C. The morphology of aluminum electrodeposited by potentiostatic, galvanostatic, and pulse were studied.

    中文摘要 ii Extended Abstract iii 誌謝 vi 目錄 vii 圖目錄 ix 表目錄 xii 第一章 緒論 1 1-1 離子液體 1 1-1-1 離子液體定義 1 1-1-2 離子液體發展 2 1-1-3 離子液體應用 3 1-2 電沉積鋁的相關文獻回顧 5 1-3 研究動機及目的 10 第二章 實驗原理與方法 11 2-1 電化學基本原理 11 2-2 循環伏安法(Cyclic Voltammetry) 13 2-3 旋轉電極循環伏安法(Rotating Disk Electrode Voltammetry) 15 2-4 計時電流法(Chronoamperometry) 15 2-5 電化學成核(Nucleaction) 16 第三章 實驗方法與儀器介紹 18 3-1 實驗藥品與基材處理 18 3-1-1 實驗藥品 18 3-1-2 金屬 19 3-2 離子液體製備 20 3-3 實驗儀器與配置 20 3-3-1 實驗配置 20 3-3-2 實驗儀器與設備 21 第四章 實驗結果與討論 23 4-1 Al(III)在AlCl3/4-Et-Py的電化學行為 23 4-1-1 循環伏安圖 23 4-1-2 Al(III)在不同電極上的電化學行為 24 4-2 在AlCl3/4-Et-Py的IL中電沉積Al 34 4-2-1 定電位電鍍 — 37℃ 34 4-2-2 定電位電鍍 — 50℃ 37 4-2-3 定電位電鍍 — 37℃ (反覆電鍍) 39 4-2-4 定電位電鍍 — 37℃ (調整Al濃度) 40 4-2-5 定電流電鍍 — 37℃ 41 4-2-6 脈衝定電位法 — 37℃ 42 4-2-7 SEM-EDS line scan analysis — 37℃ 44 4-2-8 不同電位電沉積Al的XRD 48 4-3 CoCl2在AlCl3/4-Et-Py(1.3:1)中的電化學行為與鍍層分析 51 4-4 Corrosion behavior 53 第五章 結論 54 參考文獻 55

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