近幾年來由於半導體產業對於微小線寬的追求，造成主要的關鍵技術光學微影技術不斷的精進，而奈米壓印技術的發明開啟了新的技術，爾後陸陸續續開發出各種壓印的方式，其中雷射輔助奈米壓印技術更被譽為下一世代最具發展潛力的奈米轉印技術之一，然而由於雷射的因素需要透明的石英作為模仁的材料，但是石英模仁製作複雜的圖形十
分困難且易損壞，因此石英模仁在應用上成為主要的限制因素。
　　本文的研究目的在於建立一套雷射輔助奈米壓印的穩定製程，應用不同的參數進行高分子的雷射輔助壓印以期得到關鍵的加工參數，同時改進雷射輔助奈米壓印技術的缺點，開發出一種新的方法來製造奈米結構，此法主要是利用紅外光脈衝雷射可穿透Si晶圓的特性，對高分子材料進行加熱並將矽模仁壓印至高分子表面進行圖形轉印。由於與矽相關的IC製程已經發展得臻至成熟，因此這項技術能夠提供優於以石英作為模仁材料的傳統雷射輔助壓印技術，其優點包括具高深寬比、可彈性設計三維的圖形與結構，因此此技術可被應用在現今的IC製程中、光子晶體、微光學元件以及可大量製造需要圖形轉印製程的微米或是奈米結構，因此為本研究最主要的貢獻處也是今後發展的重點。

　Recently semiconduction industry in order to achieve more and more small line width, result in mainly key technique constantly advancement for photolithography. Nanoimprint is a new technology which solves the foregoing circumstance. Subsequently, ways of various imprinting is build in succession. Laser assisted nanoimprint technology most is had by the reputation for the next generation one of development potential nano-pattern transfer technologies. However, due to transparency requirement, the material for the mold is quartz, which is too hard and fragile for complex patterns to be made. Thereby, the quartz mold becomes a major limiting factor for applications. The main purpose of this study is to establish a steady process of laser assisted nanoimprint, apply different parameters to imprint polymer for getting key process parameters and furthermore improve drawback of laser assisted nanoimprint technique. We developed a new method to fabricate nanostructures that use the property of silicon pervious to infrared laser pulse. The infrared laser pulse can heat polymer to achieve pattern transfer with silicon mold imprinting. Since Si-related IC process has been well developed, this technique offer advantages over other imprinting techniques using quartz as the mold. The advantages include high aspect ratio, flexible pattern design and pattern structure in three dimensions. Therefore, this technique can be applied in current IC manufacturing, optoelectronic devices, bio-related chips, photonic crystals, micro-optical devices and all mass production that demands pattern transfer process in either micro- or nano-scale. So, the new technique becomes main contribution point of this study and developing key point in future.

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