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研究生: 張景堯
Chang, Ching-Yao
論文名稱: 氧化錫鋅光感測器與二氧化氮氣體感測器之研究
Investigation of Zinc Tin Oxide Photodetector and NO₂ Gas Sensor
指導教授: 張守進
Chang, Shoou-Jinn
學位類別: 碩士
Master
系所名稱: 電機資訊學院 - 微電子工程研究所
Institute of Microelectronics
論文出版年: 2024
畢業學年度: 112
語文別: 英文
論文頁數: 111
中文關鍵詞: 氧化鋅錫氧化鋅氧化錫氣體感測器紫外光感測器
外文關鍵詞: Zn2SnO4, ZnO, SnO2, Ultraviolet Photodetector, Gas Sensor
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  • 本論文中,主要以射頻磁控濺鍍系統沉積氧化錫鋅作為感測層,改變製程參數並分析薄膜特性後,將其應用在紫外光感測器以及氣體感測器。
    首先,我們使用射頻磁控濺射技術來沉積鋅錫氧化物(Zn2SnO4)薄膜。在沉積過程中,我們調整了氧氣與氬氣的比例,並在沉積後進行退火處理,以獲得具有不同特性的薄膜。這些薄膜隨後進行了結構、光學和材料分析。
    在結構分析中,我們發現所有的Zn2SnO4薄膜均為非晶態。AFM結果顯示,隨著退火溫度的升高,薄膜表面的粗糙度下降,並在500度時達到最佳均勻度,這證實了退火能夠改善表面缺陷。
    在光學分析中,所有薄膜在可見光區域的平均透光率均超過80%,且不受退火溫度和氧氣流量的影響。在材料分析中,X射線光電子能譜顯示,隨著氧氣流量的增加,氧空缺有下降的趨勢。且隨著退火溫度上升,氧空缺比例也會隨之降低。
    在第二部分的研究中,我們使用射頻磁控濺鍍技術製作氧化錫鋅光感測器,並調整氧氣流量和退火溫度作為製程參數,具體為0%、4%、10%的氧氣比例以及400度、500度和600度的退火溫度。研究結果表明,當氧氣流量為0%時,元件電阻較大,光電流和暗電流均非常小。經過退火處理後,光感測器的光電流和暗電流有所提升,光響應也得到了增強。隨著氧氣流量增加,在高溫退火下,感測器的時間響應也有所增加。
    研究進一步發現,當氧氣流量為4%並在500度真空環境下退火一小時後,光感測器的響應度最佳,其光暗電流比為 9.86×10^(-4),響應值為7.25×10^(-4) (A/W),響應拒斥比為 9.67×10^(-3),但開關時間均超過100秒。為了在保持高響應值的同時獲得較好的開關時間,我們得出當氧氣流量為10%並在500度真空環境下退火一小時後,光感測器的開關時間最佳,其具體參數為光暗電流比8.9×10^(-2),響應值4.47×10^(-3) (A/W),響應拒斥比 1.21×10^(-3),開關時間分別為32秒和13秒。
    第三部分,我們使用氧化錫鋅薄膜製作毒害氣體感測器,與常見的氧化錫鋅氣體感測器比較起來,我們藉由調整退火溫度以及氧氣流量改善了感測器對NO₂氣體的響應度,在退火溫度繼續上升時,由於表面粗糙度的降低以及氧空缺的減少對於整體元件的影響降低,元件而對於 NO₂ 的響應反而變差。
    最後,我們在MEMS結構上實現了Zn2SnO4薄膜,並用偏壓式金屬加熱電極取代了傳統的加熱載台,以解決加熱載台功率溢散的問題,加快熱傳導的速度。我們也研究了以Zn2SnO4作為感測層的EGFET結構pH傳感器,發現其響應度與其他常見材料相比具有相當的競爭力,未來有潛力成為重要的研究方向。

    In this thesis, we focused on depositing Zn2SnO4 as a sensing layer using a radio frequency (RF) magnetron sputtering system. By altering the process parameters and analyzing the film characteristics, we applied this material to UV sensors and gas sensors.
    First, we used RF magnetron sputtering to deposit zinc tin oxide (Zn2SnO4) thin films. During the deposition process, we adjusted the ratio of oxygen to argon and performed post-deposition annealing to obtain films with varying properties. These films underwent structural, optical, and material analyses.
    In the structural analysis, we found that all Zn2SnO4 films were amorphous. AFM results showed that as the annealing temperature increased, the surface roughness of the films decreased, achieving optimal uniformity at 500°C, confirming that annealing improves surface defects. In the optical analysis, the average transmittance in the visible light region for all films exceeded 80%, unaffected by annealing temperature and oxygen flow rate. Material analysis using X-ray photoelectron spectroscopy indicated that oxygen vacancies decreased with increasing oxygen flow rate. Additionally, as the annealing temperature rose, the proportion of oxygen vacancies further declined.
    In the second part of the study, we fabricated Zn2SnO4 UV sensors using RF magnetron sputtering, adjusting the oxygen flow rate and annealing temperature as process parameters, specifically 0%, 4%, and 10% oxygen ratios, and annealing temperatures of 400°C, 500°C, and 600°C. The results showed that at 0% oxygen flow, the devices exhibited high resistance with very low photocurrent and dark current. After annealing, both photocurrent and dark current increased, and the photo response was enhanced. With increasing oxygen flow, the time response of the sensors also increased under high-temperature annealing.
    Further investigation revealed that when the oxygen flow was 4% and the sensor was annealed at 500°C in a vacuum for one hour, the photo response was optimal, with a photo-to-dark current ratio of 9.86×10^(-4), a response value of 7.25×10^(-4) (A/W), and a rejection ratio of 9.67×10^(-3), although the switching times exceeded 100 seconds. To achieve a better switching time while maintaining a high response value, we found that with 10% oxygen flow and annealing at 500°C in a vacuum for one hour, the sensor showed the best switching times, with a photo-to-dark current ratio of 8.9×10^(-2), a response value of 4.47×10^(-3) (A/W), a rejection ratio of 1.21×10^(-3), and switching times of 32 seconds and 13 seconds, respectively.
    In the third part, we fabricated toxic gas sensors using Zn2SnO4 thin films. Compared to common Zn2SnO4 gas sensors, we improved the response to NO₂ gas by adjusting the annealing temperature and oxygen flow rate. However, as the annealing temperature continued to rise, the decreased surface roughness and reduced oxygen vacancies diminished the overall response to NO₂.
    Finally, we implemented Zn2SnO4 thin films in a MEMS structure and replaced the traditional heating stage with a bias-type metal heating electrode to address power dissipation issues and accelerate thermal conduction. We also investigated Zn2SnO4 as the sensing layer in an EGFET structure pH sensor, finding its response to be highly competitive with other common materials, indicating potential for future research directions.

    摘要 I Abstract IV 致謝 VII Content VIII Table Caption XI Figure Caption XII Chapter 1 Introduction 1 1.1 Background and Motivation 1 1.2 Background of Zn2SnO4 material 2 1.3 Overview of Ultraviolet Photodetectors 3 1.4 Overview of Gas Sensor 4 1.5 Organization of this Thesis 5 References 7 Chapter 2 Relevant Theory and Experimental Equipment 10 2.1 Theory of Photodetector 10 2.1.1 Responsivity of the Photodetector 11 2.1.2 Rise and Recovery Time of the Photodetector 12 2.1.3 Photo to Dark Current Ratio (PDCR) 12 2.2 Theory of Gas Sensor 13 2.3 Experimental Equipment 14 2.3.1 Radio-frequency Sputtering System 14 2.3.2 X-ray Photoelectron Spectroscopy (XPS) 17 2.3.3 Atomic Force Microscopy (AFM) 18 2.3.4 Scanning Electron Microscope (SEM) 18 2.3.5 Transmission Eletron Microscopy (TEM) 19 2.3.6 X-ray Diffraction (XRD) 19 References 22 Chapter 3 Fabrication and Characteristic of Zn2SnO4 Sensors 23 3.1 Fabrication of Zn2SnO4 Photodetectors and Gas Sensors 23 3.2 Measurement Equipment of Photodetectors 25 3.3 Measurement Equipment of Gas Sensors 25 3.4 Transmission Electron Microscope (TEM) Analysis 26 3.5 Structural Characteristics 28 3.6 Optical Characteristics 32 3.7 Elemental Analysis 36 References 48 Chapter 4 Characteristics of Zn2SnO4 MSM Photodetectors 49 4.1 Motivation 49 4.2 Characteristics of Zn2SnO4 MSM Photodetectors 50 References 69 Chapter 5 Characteristics of Zn2SnO4 Gas Sensors 71 5.1 Motivation 71 5.2 Characteristics of Zn2SnO4 Gas Sensors 72 5.2.1 Influence of Different Annealing Temperatures on sensors 78 References 91 Chapter 6 Conclusion and Future Work 92 6.1 Conclusions 92 6.2 Future work 93 References 96

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