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研究生: 謝啟中
Hsieh, Chi-Chung
論文名稱: 磁濾管系統電漿特性模擬研究
Simulation Study of Plasma Characteristics for Magnetic Filter Cathodic Arc System
指導教授: 藍永強
Lan, Yun-Chiang
學位類別: 碩士
Master
系所名稱: 理學院 - 光電科學與工程研究所
Institute of Electro-Optical Science and Engineering
論文出版年: 2006
畢業學年度: 94
語文別: 中文
論文頁數: 170
中文關鍵詞: 陰極電弧放電披覆磁濾
外文關鍵詞: CAPD, Magnetic Filter
相關次數: 點閱:44下載:1
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  • 提要

    本研究採用粒子式模型電漿模擬程式OOPIC Pro為工具。

    探討在直筒式磁濾管電漿系統中,改變工作氣體產生量、改變軸向靜磁場以及改變基板偏壓、螺線管壁上外加電壓、螺線管內壁隔板型式等對電漿特性的影響。

    執行本研究將可增進對直筒式磁濾管電漿成膜製程系統有以下幫助―
    a) 增加成膜製程中電漿特性的了解
    b) 協助未來進行製程系統設計時的參考
    c) 建立了一套模擬研究平台,作為進一步設計與研究電磁場對電漿特性影響的實用工具。

    Abstract

    In this simulation study,we use the PIC-model plasma simulation program OOPIC Pro as a tool for related research.
    the research is about the effects on system under the variation of the generating rate of the working gas、the type of axial magnetic field、input voltage on substrate、input voltage on solenoid、the type of baffles in the solenoid...etc.
    The research is helpful in following three aspects―
    a) Improve the comprehension of plasma characteristics.
    b) It is helpful to the further design of manufacture process.
    c) Constructing a platform of simulation study for further design and research in the characteristics of plasma under the electromagnetic field circumstance.

    提要 I 英文摘要 II 致謝 III 圖目錄 VI 表目錄 XIII 第一章 簡介 1.1 電漿製成與鍍膜被覆技術簡介 1 1.2 研究目的及方向 4 第二章 磁濾管結構陰極電弧系統相關原理以及發展概況 2.1 電漿原理及特性簡介 6 2.2 低壓電漿放電型式 14 2.3 電漿鍍膜製程原理及特性 17 2.4 真空陰極電弧技術對於巨型金屬液滴粒子產生問題的解決方式 31 2.5 成膜結構性質分析 36 第三章 模擬軟體介紹以及模擬原理分析 3.1 電漿模擬原理概論 40 3.2 粒子式電漿模擬方法 43 3.3 模擬軟體介紹 52 第四章 實驗系統背景以及模擬環境介紹分析 4.1 實驗系統背景與架構 62 4.2 模擬模型與參數 67 4.3 模擬結果與討論 75 4.3.1 模擬過程荷電粒子運動情形流程與說明 75 4.3.2 工作氣體產量對系統影響之討論 106 4.3.3 磁場變化對系統影響之討論 117 4.3.4 基板外加電壓變化對系統影響之討論 133 4.3.5 螺線管壁上外加電壓變化對系統影響之討論 145 4.3.6 螺線管內壁加隔板對系統影響之討論 153 第五章 結論 165 第六章 未來展望 168 參考文獻 i

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