| 研究生: |
謝啟中 Hsieh, Chi-Chung |
|---|---|
| 論文名稱: |
磁濾管系統電漿特性模擬研究 Simulation Study of Plasma Characteristics for Magnetic Filter Cathodic Arc System |
| 指導教授: |
藍永強
Lan, Yun-Chiang |
| 學位類別: |
碩士 Master |
| 系所名稱: |
理學院 - 光電科學與工程研究所 Institute of Electro-Optical Science and Engineering |
| 論文出版年: | 2006 |
| 畢業學年度: | 94 |
| 語文別: | 中文 |
| 論文頁數: | 170 |
| 中文關鍵詞: | 陰極電弧放電披覆 、磁濾 |
| 外文關鍵詞: | CAPD, Magnetic Filter |
| 相關次數: | 點閱:44 下載:1 |
| 分享至: |
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提要
本研究採用粒子式模型電漿模擬程式OOPIC Pro為工具。
探討在直筒式磁濾管電漿系統中,改變工作氣體產生量、改變軸向靜磁場以及改變基板偏壓、螺線管壁上外加電壓、螺線管內壁隔板型式等對電漿特性的影響。
執行本研究將可增進對直筒式磁濾管電漿成膜製程系統有以下幫助―
a) 增加成膜製程中電漿特性的了解
b) 協助未來進行製程系統設計時的參考
c) 建立了一套模擬研究平台,作為進一步設計與研究電磁場對電漿特性影響的實用工具。
Abstract
In this simulation study,we use the PIC-model plasma simulation program OOPIC Pro as a tool for related research.
the research is about the effects on system under the variation of the generating rate of the working gas、the type of axial magnetic field、input voltage on substrate、input voltage on solenoid、the type of baffles in the solenoid...etc.
The research is helpful in following three aspects―
a) Improve the comprehension of plasma characteristics.
b) It is helpful to the further design of manufacture process.
c) Constructing a platform of simulation study for further design and research in the characteristics of plasma under the electromagnetic field circumstance.
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