本篇論文為探討微波干涉計(microwave interferometry)於磁化電漿(magnetized plasma)量測上之應用。
首先我們將討論電磁波於磁化電漿中的行為，電磁波於磁化電漿中會受到入射方向與外加磁場的不同而使得色射關係(dispersion relation)有所不同，因此我們可利用這關係來測量電漿密度。由於實驗電漿架設尚未完成，因此我們利用量測鐵氟龍(Teflon)來驗證此干涉計的可行性，並使用網路分析儀(network analyzer)來確認干涉計量測的正確性。最後將討論此干涉計應用於電漿量測時所需注意及改進的地方。

In this paper, we develop a microwave interferometry system for plasma diagnostics..
First, we discuss the EM wave propagation in magnetized plasma. The dispersion relation of EM wave will be changed by the angle between the magnetic field and EM wave propagation direction, so we can use it to measure and calculate the plasma density. Because our magnetized plasma system is still not operative, we instead measure the dielectric constant of Teflon to test and verify our interferometry system. We also use the network analyzer to confirm the accuracy of interferometry. Finally, we consider the future work of the microwave interferometry for plasma diagnostics.

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