一般而言，半導體製造業作業場所空氣中有害物濃度可能遠低於職業暴露限值，但製程中會使用複雜的化學物質，伴隨多種副產物的產生，其多重化學暴露之健康危害仍值得重視。特別是黃光區廣泛使用多種揮發性有機化合物 (Volatile organic compounds, VOCs)，其中部分已經被證實會對人體造成不良的健康效應。唯目前作業環境監測方式仍然以單日量測單一化學物質為主，相反的，針對多重化學物質長期暴露評估之研究仍有限，如何有效解決以上問題有其急迫性與重要性。
本研究選取半導體製造業黃光區為研究對象，分為五個區域 (A、B、C、D、E)採樣，目標監測化學物質包括18種VOCs，並針對日常作業及預防維修保養作業 (Preventive maintenance process, PM)與三種作業型態進行探討。採樣使用不鏽鋼熱脫附管填充吸附劑Carbograph5TD 60/80進行採樣，並以熱脫附儀搭配火焰離子化偵測器氣相層析儀 (automatic thermal desorption system coupled with gas chromatography flame ionization detector, ATD-GC/FID)分析，同時利用直讀式光離子化檢測器(Photoionization detector, PID)量測，以瞭解VOCs濃度及其分布情形。本研究利用前述結果，針對日常作業時建立化學物質的暴露推估模式及其長期資料庫，再結合貝氏統計決策分析，推估長期多重化學物質之暴露及致癌風險，及提供改善建議。本研究將同時利用採樣結果進行PM作業最高瞬間暴露及短時間暴露濃度的評估，及降低暴露濃度之可行方案。
本研究發現日常作業區域採樣偵測到的物質濃度都在ppb等級，主要暴露物質為PGME、PGMEA、乳酸乙酯、乙酸丁酯，未被偵測到的物質包括甲醇、TMAH、丙酮、甲氧苯、異丙醇、環己酮；主要污染暴露區域為E區。多重化學物質暴露評估比單一物質之暴露評估更具代表性，不考慮化學物質之拮抗與協同作用時，其健康效應結果約為10-3，考慮化學物質不同健康效應時約介於10-5~10-3之間。本研究以多重化學物質暴露評估的角度探討PID之管制值的結果，若以0.01為總暴露基準：A區PID量測數值不得超過180 ppb；B/C區為118 ppb；而D/E區為153 ppb，以區域來劃分制訂管制值會比整個廠區採用相同數值進行管制更具有代表性，且不會低估高污染區域之健康效應。暴露濃度推估時，以PID數據及產能資料當作替代暴露指標，其推估結果皆具有良好的線性關係及適用性 (R2大於0.65)。將推估結果以貝氏統計分析進行評估，長期多重化學暴露之暴露等級會落在1、2、3，Total exposure值皆會小於7.5*10-3，顯示勞工之長期暴露不至於產生嚴重危害及廠區日常作業有良好的控制措施。致癌風險的部分，男性及女性技術員或助理工程師/工程師在三個年齡層之計算結果約為10-7，小於可接受之風險10-6，將結果以貝氏統計決策分析進行評估，仍然會有少許機會超過本研究所訂定之10-6之風險。
本研究PM作業結果之污染逸散情況比日常作業高出很多，且PID濃度會達到ppm等級，勞工主要暴露污染來源均來自於PM作業，在有使用溶劑之作業程序會出現高濃度暴露，本研究發現丙酮之瞬間暴露濃度最高可達504.68 ppm；短時間暴露濃度最高達96.33 ppm。本研究建議PM作業時應使用可攜式局部排氣系統、執行PM作業人員應全程配戴防護具、減少溶劑使用量，以減少勞工之暴露，並應立即將使用後之廢棄物密封於廢棄袋中，以免化學物質逸散造成二次污染。

The concentration of air pollutants found in the semiconductor manufacturing industry might be much lower than the occupational exposure limit, but the use of complex composition and toxic chemicals and by-products generated during process still cause many concerns. Most chemicals widely used in photolithography process are VOCs. Some VOCs are known to be hazardous to human health, so they might cause adverse health effects on workers after long-term exposure. The current adopted method for environmental monitoring simply focuses on monitoring of single compound during one single day, which clearly is inadequate for assessing workers' long-term multiple chemical exposures and describing their exposure profiles. Therefore, the development of technologies for solving the above mentioned problems have become urgent and important.
The purpose of this study is to understand the concentration and concentration profile of VOCs during the routine operation of five areas (A: B: C: D: E) and PM periods in photolithography process. Samples were collected by using a direct-reading instrument (photoionization detector, PID) and a stainless steel sorbent tube filled with Carbograph 5TD 60/80. Eighteen VOCs were measured by automatic thermal desorption system coupled with gas chromatography flame ionization detector (ATD-GC/FID). In this study, the monitoring data and productivity was used to develop predictive models, then the Bayesian decision analysis was adopted to evaluate long-term exposure and cancer risk. Meanwhile, assessing the concentrations for both the short-term exposure and instantaneous exposure are also included in this study.
In this study, the thermal desorption monitoring is suitable for the photolithography process for assessing exposures. All of the detected concentration during routine operation is at ppb level, and the results during PM periods are higher than routine operation can be reached to ppm level, so workers’ exposures are affected by PM.
The multiple VOCs assessment is more representative than a single compound for assessing workers’ exposures. And the PID monitoring data and productivity are good surrogate data for assessing multiple chemical exposures. Using Bayesian decision analysis would be a suitable tool for conducting long-term exposure and cancer risk.
Workers’ exposures are affected by PM period, so the control methods in PM periods have become important.

American Conference of Governmental Industrial Hygienists (ACGIH) Documentation of the Threshold Limit Values and Biological Exposure Indices
Banerjee S, Ramachandran G, Vadali M, Sahmel J. 2014. Bayesian hierarchical framework for occupational hygiene decision making. Ann Occup Hyg 58:1079-1093.
Benitez J. 1993. Process engineering and design for air pollution control. PTR Prentice-Hall Inc New Jersey.
Bullock WH, Ignacio JS. 2006. A strategy for assessing and managing occupational exposures:AIHA.
Chein H, Chen TM. 2003. Emission characteristics of volatile organic compounds from semiconductor manufacturing. Journal of the Air & Waste Management Association 53:1029-1036.
Coffey CC, Pearce TA. 2010. Direct-reading methods for workplace air monitoring. Journal of Chemical Health and Safety 17:10-21.
Covello VT, Merkhoher MW. 1993. Risk assessment methods: Approaches for assessing health and environmental risks:Springer Science & Business Media.
Des TA, k VS. 1992. Sampling and analysis of light htdrocarbons(c1~c4)-a review. American IND HYG ASSOCJ Vol52, No3.
Duarte K, Justino CIL, Freitas AC, Duarte AC, Rocha-Santos TAP. 2014. Direct-reading methods for analysis of volatile organic compounds and nanoparticles in workplace air. TrAC Trends in Analytical Chemistry 53:21-32.
Foster PM, Creasy DM, Foster JR, Thomas LV, Cook MW, Gangolli SD. 1983. Testicular toxicity of ethylene glycol monomethyl and monoethyl ethers in the rat. Toxicology and applied pharmacology 69:385-399.
Frist BG. 1996. Exposure characterization of preventative maintenance activities on semiconductor manufacturing equipment.
Guenther A, Hewitt CN, Erickson D, Fall R, Geron C, Graedel T, et al. 1995. A global model of natural volatile organic compound emissions. Journal of Geophysical Research: Atmospheres (1984–2012) 100:8873-8892.
Hewett P, Logan P, Mulhausen J, Ramachandran G, Banerjee S. 2006. Rating exposure control using bayesian decision analysis. Journal of occupational and environmental hygiene 3:568-581.
International Agency for Research on Cancer (IARC) List of Classifications
Jones AP. 1999. Indoor air quality and health. Atmospheric environment 33:4535-4564.
Kaukiainen A, Vehmas T, Rantala K, Nurminen M, Martikainen R, Taskinen H. 2004. Results of common laboratory tests in solvent-exposed workers. International archives of occupational and environmental health 77:39-46.
Kennedy ER. 2010. Introduction to work place air sampling. Journal of Chemical Health and Safety 17:4-9.
Lee EG, Kim SW, Feigley CE, Harper M. 2013. Exposure models for the prior distribution in bayesian decision analysis for occupational hygiene decision making. Journal of occupational and environmental hygiene 10:97-108.
Lee M, Waitzkin H. 2012. A heroic struggle to understand the risk of cancers among workers in the electronics industry: The case of samsung. International journal of occupational and environmental health 18:89-91.
Leidel NA. 1977. Occupational exposure sampling strategy manual.
Lo C-C. 2001. Characteristic study of vocs in the surrounding area of an oil storage and pumping station. A thesis of master degree of the Graduate Institute of Environmental Engineering, National Sun Yat-Sen University:36-39.
Marano DE, Boice JD, Jr., Munro HM, Chadda BK, Williams ME, McCarthy CM, et al. 2010. Exposure assessment among us workers employed in semiconductor wafer fabrication. Journal of occupational and environmental medicine / American College of Occupational and Environmental Medicine 52:1075-1081.
Moen BE, Hollund BE. 2000. Exposure to organic solvents among car painters in bergen, norway. Annals of Occupational Hygiene 44:185-189.
NIOSH Manual of Analytical Methods的2549 Volatile Organic Compounds (Screening)
Park H, Jang JK, Shin JA. 2011. Quantitative exposure assessment of various chemical substances in a wafer fabrication industry facility. Safety and health at work 2:39-51.
Park SH, Shin JA, Park HH, Yi GY, Chung KJ, Park HD, et al. 2011. Exposure to volatile organic compounds and possibility of exposure to by-product volatile organic compounds in photolithography processes in semiconductor manufacturing factories. Safety and health at work 2:210-217.
Radian. 1978. Control techniques for volatile organic emissions from stationary sources.
Ramachandran G. 2005. Occupational exposure assessment for air contaminants:CRC Press.
Smith MT, Jones RM, Smith AH. 2007. Benzene exposure and risk of non-hodgkin lymphoma. Cancer epidemiology, biomarkers & prevention : a publication of the American Association for Cancer Research, cosponsored by the American Society of Preventive Oncology 16:385-391.
Srivastava A, Joseph A, Patil S, More A, Dixit R. 2005. Air toxics in ambient air of delhi. Atmospheric Environment 39:59-71.
Symanski E, Chan W, Chang C-C. 2001. Mixed-effects models for the evaluation of long-term trends in exposure levels with an example from the nickel industry. Annals of Occupational Hygiene 45:71-81.
Torres C, Jones R, Boelter F, Poole J, Dell L, Harper P. 2014. A model to systematically employ professional judgment in the bayesian decision analysis for a semiconductor industry exposure assessment. Journal of occupational and environmental hygiene 11:343-353.
Uusitalo L. 2007. Advantages and challenges of bayesian networks in environmental modelling. Ecological Modelling 203:312-318.
Vadali M, Ramachandran G, Mulhausen J. 2009. Exposure modeling in occupational hygiene decision making. Journal of occupational and environmental hygiene 6:353-362.
Wang J, Chen J. 1993. Acute and chronic neurological symptoms among paint workers exposed to mixtures of organic solvents. Environmental research 61:107-116.
Weschler CJ, Shields HC. 1997. Potential reactions among indoor pollutants. Atmospheric Environment 31:3487-3495.
Woskie SR, Hammond SK, Hines CJ, Hallock MF, Kenyon E, Schenker MB. 2000. Personal fluoride and solvent exposures, and their determinants, in semiconductor manufacturing. Applied occupational and environmental hygiene 15:354-361.
Wu CH, Feng CT, Lo YS, Lin TY, Lo JG. 2004. Determination of volatile organic compounds in workplace air by multisorbent adsorption/thermal desorption-gc/ms. Chemosphere 56:71-80.
Yeh M-p, Wu R-T, Yu J-P. 2000. Probing airborne chemicals of semiconductor work place using gas chromatography mass spectrometry.
張振平, 宋隆佑, 朱振群, 林宜長. 2000. 半導體維修作業勞工有害氣體溢散調查, 勞工安全衛生研究季刊
陳俊勳, 張承明. 2002. 光電廠危害預防研究, 行政院勞工委員會勞工安全衛生研究所
楊秀宜, 張大元. 2014半導體封裝測試製程安全衛生調查研究, 行政院勞工委員會勞工安全衛生研究所
汪禧年, 謝瑞豪. 2011.半導體黃光製程有害物暴露及異味調查研究, 行政院勞工委員會勞工安全衛生研究所
張俊彥. 1997. 積體電路製程及設備技術手冊, 經濟部技術處
揮發性有機物空氣汙染管制及排放標準，2013
健康風險評估技術規範 2011
揮發性有機物洩漏測定方法－火焰離子化偵測法 2011
層析檢測方法總則 2002
環境檢驗方法偵測極限測定指引 2004
環境檢驗檢量線製備及查核指引 2005職業安全衛生法 2013
作業環境監測指引 2015
半導體製程設備安全基準(SEMI-S2)