本論文以反應磁控濺鍍零維/二維之奈米結晶氮化鋁鈦/非晶氮化矽複合薄膜和二維/二維之奈米結晶氮化鋁鈦/非晶氮化矽奈米薄層。藉由探討反應氣體之工作分壓、兩相的成份比例、基板偏壓效應、各層間的週期厚度和不同膜厚比等製程參數對鍍層之成分、微結構及與機械性質的影響，以期能獲得兼具高硬度及高韌性之奈米結構鍍層。

　　實驗結果發現藉由控制輸入於TiAl合金靶(200W)和Si靶之功率(0~200W)可調配兩相之不同成分比。不同成分比之奈米結晶氮化鋁鈦/非晶氮化矽複合薄膜具有不同之從優取向、結晶粒尺寸、橫截面微結構和表面型態等，藉由微結構之改變，可研究其對機械性質之影響。

　　基板偏壓的施加(0~200V)，可有效吸引電漿內惰性氣體離子持續的撞擊鍍層，此效應影響薄膜之成核及成長。由於成核條件改變，薄膜的微觀組織、結晶方向、晶粒尺寸也隨之改變，因此會影響薄膜的機械性質。

　　實驗中嘗試結合奈米結晶/非晶和奈米薄層結構設計觀念，以期能增加薄膜之韌性，改善薄膜因硬度的提高而造成之脆性破壞。在奈米薄層結構中發現，隨著週期厚度的降低(λ=100~20 nm)，可增加層與層間界面之數目和降低結晶粒之尺寸，此結果能有效提高鍍層之硬度。除此之外，藉由層與層間之裂縫轉折，可提升薄膜之韌性，增加薄膜之附著性。

　　實驗中發現在固定週期厚度(λ=100nm)，薄膜之硬度值不隨著膜厚比之變化而改變。雖然在不同膜厚比下，晶粒尺寸會隨著結晶氮化鋁鈦膜厚的降低而線性變小，然而在不同膜厚比下，晶粒尺寸效應並沒有直接影響薄膜硬度值，此時薄層之界面數可能為影響薄膜硬度值之重要參數。

　　實驗結果中亦發現薄膜之化學成份組成和微結構會與反應氣體分壓有關。在反應濺鍍過程中，必須先瞭解化學吸附過程發生於靶材或基材表面上。隨著氮氣流量的增加，靶材表面容易生成陶瓷化合物，此結果將影響薄膜之濺鍍速率、成分、晶粒尺寸、晶粒型態、表面型態、硬度值及彈性係數。

　　In the present study, 0D/2D composite and 2D/2D nanolaminate of nc-(Ti,Al)xN1-x/ a-SiyN1-y films were deposited via reactive magnetron sputtering technique. The effects of the nitrogen flow rate, ratio of both phases, thickness of multilayer period and thickness ratio on the composition, microstructure and mechanical properties were primarily investigated.

　　Results indicated that the composition of nc-(Ti,Al)xN1-x/a-SiyN1-y nanocomposite films could be modulated through the co-deposition process. The content of amorphous SiyN1-y has substantial influence on the preferred orientation, nanocrystallite size, cross-section structure, surface morphology, and hardness.

　　The films were bombarded by noble-gas ions in a plasma form, and the energy of the arriving ions was influenced by the substrate bias voltage (0~200V). The kinetic energy of bombarding ions had substantial effects on the nucleation and growth of films, crystallographic, physical and mechanical properties.

　　Microstructural design combined nc/a and nanolaminate structures was used to enhance the toughness of films. For nc-(Ti,Al)xN1-x/a-SiyN1-y nanolaminate films the presence of layers interfere with dislocation motion over a range of λ(20 to 100 nm) and small crystallite size could harden the material. In addition, the introduction of a number of interfaces parallel to the substrate surface can act to deflect cracks and dissipate energy. This led to apparent increase in coating toughness and adhesion.

　　The effects of thickness ratio of nanolaminate films with λ=100 were also investigated. Results indicated that the crystallite size decreased with decreasing the (Ti,Al)xN1-x thickness. However, the hardness values were fairly constant with different thickness ratio. It could explain that the hardness was independent of crystallite size in nanolaminate films and dominated by the number of interfaces.

　　The partial pressure of reactive gas was related to composition and microstructure of nanolaminate films. In reactive sputtering process, the chemical adsorption took place on the target or substrate surface should be understood. Results indicated that the formation of compound on target surface with increasing the nitrogen flow had substantially influenced on deposition rate, composition, crystallite size, grain features, surface morphology, hardness and reduced elastic modulus.

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