由於一維氧化鋅奈米結構具備異向性質，為整合運用於各類元件並有效利用其異向性，必須於適當位置上成長，以獲得預期的性能。本論文研究水浴法中氧化鋅奈米柱陣列成長特性，釐清其成長機制，並進行擇區成長以製作圖案，以提昇氧化鋅奈米柱未來於元件的應用。
本研究採用低溫(＜90℃)水溶液法製備一維氧化鋅奈米柱陣列於矽基板及鋅箔。透過改變水溶液的反應條件，包括濃度、反應時間及基板等製程參數探討對氧化鋅晶體成長特性的變化。利用醋酸鋅及氫氧化鈉粉末均勻混合於異丙醇溶劑中合成氧化鋅奈米粒子，並以旋轉塗佈於基板作為種晶使用。當反應濃度降低(0.025 M)，所得氧化鋅奈米柱長徑比較高(13倍)。另外，有別於一般預先塗佈種晶層之繁複步驟，直接由鋅箔熱處理控制氧化程度以製作種晶，除減少製程步驟外，更能有效製備大面積且高取向之氧化鋅奈米柱。所得氧化鋅奈米柱經結晶性及結構分析，為六方纖鋅礦氧化鋅單晶結構，且生長方向為[0001]。在光電流測試中，發現隨著氧化鋅奈米柱長度與表面積的增加，所得光響應電流及單一波長光電轉換效率較大。
在水浴法成長氧化鋅奈米柱中，氧化鋅奈米粒子最常被作為種晶層使用的材料。然而，並沒有相關文獻針對種晶層的圖案化製作進行研究，本研究以電泳沉積技術結合奈米球微影技術沈積氧化鋅奈米種晶，藉由改變膠體溶液pH值，探討其對界面電位、形態及氧化鋅奈米柱成長之影響。結果顯示：氧化鋅奈米種晶的沈積形貌與膠體溶液及聚苯乙烯值界面電位有關，藉由製程參數控制獲得實心及空心氧化鋅奈米粒子種晶層形貌。
至於擇區成長，主要是應用微接觸技術以轉印十八烷基三氯矽烷自組裝薄膜於種晶層上，以製作規則圖案，即可成長有序氧化鋅奈米柱陣列。反應溶液接觸自組裝薄膜區域與未覆蓋之種晶層時各有不同成長行為，最大原因來自於種晶層的異質成核與經由水溶液中凡得瓦力作用的均質成核。比較不同圖案之氧化鋅陣列場發射性質，點狀圖案具有較佳場發射性質，起始電壓為4.65 V/μm。
本研究亦利用電沈積結合奈米球微影製作鎳膜模板以控制奈米柱擇區成長的特性，藉由改變鎳膜模板的孔洞大小，可有效控制氧化鋅奈米柱陣列密度。於場發射測試中發現氧化鋅奈米柱之陣列密度在1.18 × 108 nanords/cm2時具有最低之起始電場2.98 V/μm。當陣列密度增加，場發射屏蔽效應隨之增加。
最後提出一新穎模板輔助成長方法，可在室溫下以單一步驟於矽基板上製備一維二氧化鈦奈米結構(奈米管及奈米柱)陣列。在前人研究中，指出以一維材料作為核心材料之模板輔助方法，藉由核心材料的移除可獲得奈米管結構，然而僅限於管狀結構。本研究中以一維氧化鋅奈米柱做為模板材料，並利用選擇性蝕刻原理，造成氧化鋅表面上二氧化鈦的沈積及核心氧化鋅的溶解反應之同步進行，待核心氧化鋅材料完全溶解後，可獲得前端封閉之二氧化鈦之奈米管結構。本方法亦可利用沈積時間之長短有效控制二氧化鈦奈米管之管壁厚度，更可獲得前人研究所無法製得之奈米柱結構。

To properly utilize the anisotropic properties of one-dimensional ZnO nanostructures in device applications, the control of the ZnO grown on selected positions is necessity since this would largely determine the device functionality and performance. The growth and characterization of ZnO nanorod arrays by aqueous solution method are explored in this study. The main purposes are to develop the patterning techniques and to understand the related mechanisms.
ZnO nanorod arrays have been synthesized onto both Si substrate and zinc foil by a low-temperature (＜90℃) aqueous solution method. The effects of the concentration, substrate, and reaction period on the nanorod growth have been investigated in this study. The ZnO nanoparticle seeds were prepared from the zinc acetate in 2-propanol with NaOH, the use of ZnO nanoparticles on substrates as seed-layer helps reduce the diameter of grown ZnO nanorods. The aspect ratios of ZnO nanorods are enhanced when the concentration is decreased. In addition, oriented ZnO nanorod arrays could be obtained onto zinc foil directly without the need of pre-depositing ZnO nanoparticels. A dense and homogeneous ZnO thin film grown on the zinc foil was used as a seed-layer by way of varying the oxidation conditions of zinc foil. The structure of ZnO nanorods onto the zinc foil is single crystalline and grown in the [0001] direction with the wurzite structure. The photocurrent and IPCE are enhanced as the length of the nanorods is increased due to the increase of the surface area of the nanorod.
ZnO nanoparticles are the most commonly used as seed-layer materials for the ZnO nanorods growth in the aqueous solution process. However, the preparation of patterned ZnO nanoparticles seedlayer has never been reported. Electrophoretic deposition and nanosphere lithography were combined to fabricate periodic arrays of ZnO nanoparticle seed-layer. The study was focused on the effects of the pH of the suspensions, the surface charge of the particles in the suspension, the deposition characteristics of the deposited ZnO nanoparticle seed-layer, and the ZnO nanorod arrays. By electrophoretic deposition, hollow and solid hexagonal-patterned ZnO nanoparticle seed-layer could be obtained by controlling the processing parameters.
Oriented ZnO nanorod arrays are successfully pattern-grown using an organic template by microcontact printing on ZnO-coated Si substrate. The use of SAMs of OTS as a template helps to site-selectively produce ZnO nanorods from an aqueous solution. The growth behavior between contact and noncontact areas was investigated. Different formation mechanisms are proposed, and it is found that the key difference between nanorod and microrod formation is attributed to the direct growth on the ZnO seed-layer and the attraction of homogenerously nucleated microrods by van der Waals force at specific conditions, respectively. The lowest turn-on applied field strength is 4.65 V/μm for dot pattern ZnO nanorod arrays.
ZnO nanorods with different array density were synthesized on the hexagonally arranged circular patterns surrounded by nickel membranes prepared by electrodeposition and nanosphere lithography. Electrodeposition of Ni was performed for different durations to control the pore diameter. The pores were used to guide the growth of ZnO nanorods from the exposed ZnO seed-layer. The field emission measurement shows that ZnO nanorod arrays with an array density of 1.73 rods/μm2 has the lowest turn-on field of 2.98 V/μm. The increase of the ZnO array density results in inferior emission properties.
Finally, a novel and one-step templating synthetic strategy has been presented in this report for preparation of the aligned TiO2 nanotube and nanorod arrays on Si substrate from a solution and at ambient temperature. In the reported studies, it is common for the template-assisted methods to obtain nanotubes only by removing the core materials through an additional wet etching step and to leave the aligned arrays of inorganic nanotubes on the Si substrate. Therefore, the only structure, i.e. nanotubular structure could be obtained by the template method. However, in our study, we successfully utilized the selective-etching of ZnO nanorod template and the concurrent deposition of TiO2 to prepare the arrays of end-closed TiO2 one-dimensional nanostructures. Furthermore, the different thickness of TiO2 sheaths, leading to the formation of nanotubes or nanorods, can be precisely controlled by the deposition time.

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