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研究生: 張書瑋
Zhang, Shu-Wei
論文名稱: 生醫級Ti6Al4V合金經氣體氮化以及濺鍍Ti-C:H後的電化學反應、生物相容性和磨耗性質之研究
The study of tribological property, electrochemical behavior and biocompatibility of gas- nitrided and deposited Ti-C:H on Ti6Al4V alloy
指導教授: 蘇演良
Su, Yen-Liang
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2014
畢業學年度: 102
語文別: 中文
論文頁數: 150
中文關鍵詞: 非平衡磁控濺鍍含鈦類鑽碳磨潤極化曲線小鼠巨噬細胞
外文關鍵詞: CFUMBS, Ti-C:H, wear, corrosion, biocompatibility
相關次數: 點閱:138下載:2
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  • 利用非平衡磁控濺鍍法被覆含鈦類鑽碳於Ti6Al4V合金及高溫氣體氮化後的Ti6Al4V合金。本研究有四種不同底材,分別為Ti6Al4V合金(Ti6Al4)、高溫氣體氮化後的Ti6Al4V合金(N-Ti6Al4V)以及在前兩者被覆含鈦類鑽碳(Ti-C:H/Ti6Al4V、Ti-C:H/N-Ti6Al4V)。分析氮化後的Ti6Al4V合金和類鑽碳鍍層之微結構、機械性值,並以Schwingung Reibungund Verschliss SRV在模擬人體內環境條件下磨耗試驗研究其磨潤特性與磨耗機構;以電化學分析法評估各種底材的抗腐蝕能力;培養Raw 264.7小鼠單核巨噬細胞於Ti6Al4V、N-Ti6Al4V、Ti-C:H/Ti6Al4V、Ti-C:H/N-Ti6Al4V上,探討這些材料的生物相容性。
    結果顯示含鈦類鑽碳(Ti-C:H)能夠大幅提升磨潤性值,擁有佳的抗腐蝕能力以及良好的生物相容性。

    Ti-C:H were deposited on untreated Ti6Al4V alloy and high temperature nitride Ti6Al4V alloy by Closed Field Unbalanced Magnetron Sputtering (CFUMBS). Therefore, four type of specimens, Ti6Al4V, nitride Ti6Al4V(N- Ti6Al4V), T-C:H deposition on former specimens (T-C:H/Ti6Al4V, T-C:H/ N-Ti6Al4V). The characterization of the Ti-C:H film behavior was studied by means of XRD, SEM, scratch tester, nanoindenter. To simulate human body environment, wear experiments were performed by using Schwingung Reibungund Verschliss(SRV) wear tester in 0.64% NaCl solution. Corrosion performance of Ti-C:H coatings was investigated by potentio statin strument (Jiehan ECW-5000,Taiwan). All tests were carried out in a 0.64% NaCl solution. To evaluate the biocompatibility of the specimens were cultured by Purified mouse leukaemic monocyte macrophage cells (Raw 264.7) and variations of cell morphology following various periods were observed. The result indicate that Ti-C:H film show great wear residence. In addition , Ti-C:H film have good corrosion resistance and biocompatibility in this study.

    摘要 I The study of tribological property, electrochemical behavior and biocompatibility of gas- nitrided and deposited Ti-C:H on Ti6Al4V alloy II 誌謝 IX 總目錄 X 表目錄 XII 圖目錄 XIII 附錄 XVI 第一章 緒論 1 1-1 前言 1 1-2 研究動機 3 第二章 理論基礎與文獻回顧 5 2-1 金屬表面氮化處理 5 2-1-1氣體氮化原理 5 2-2類鑽碳基本性質 5 2-3 DLC鍍膜製程方法 8 2-4利用非平衡磁控濺鍍法製DLC膜的特性 9 2-5奈米壓痕分析於薄膜上的應用 10 2-6赫茲接觸應力在磨耗方面之應用 12 2-7拉曼光譜分析在類鑽碳膜上的應用 13 2-8磨耗機構 14 2-9電化學腐蝕原理 17 2-10 生物相容性 18 第三章 實驗方法與步驟 22 3-1 實驗目的 22 3-2實驗流程 22 3-3表面氮化處理及參數 23 3-4鍍膜製作 23 3-4-1濺鍍參數與鍍層安排 23 3-4-2 濺鍍系統與靶材配置 23 3-5實驗方法 24 3-5-1氮化層、類鑽碳鍍膜顯微結構分析 24 3-5-2氮化層、鍍膜成分與元素分佈分析 25 3-5-3硬度實驗 26 3-5-4附著性實驗 27 3-5-5磨耗實驗 28 3-5-6接觸角量測實驗 28 3-5-7電化學腐蝕實驗 29 3-5-8生物相容性實驗 30 3-4 實驗設備 32 第四章 實驗結果與討論 34 4-1類鑽碳膜基本性質 34 4-1-1類鑽碳膜微結構分析 34 4-1-2類鑽碳膜附著性分析 35 4-1-3表面粗糙度及接觸角分析 36 4-2 SRV磨耗性能測試 37 4-2-1點磨耗試驗 37 4-3 SRV磨耗機構探討 41 4-3-1磨耗機構討論 42 4-3-2氮化後表面粗糙度對磨耗實驗結果的影響 48 4-3-3磨耗實驗結果整理與討論 50 4-4 電化學腐蝕實驗結果 51 4-4-1 Ti6Al4V系列底材極化曲線 52 4-5 生物相容性實驗結果 52 4-5-1 Ti6Al4V系列表面生長型態 52 4-5-2細胞增殖數量統計 53 第五章 結論 56 5-1 結論 56 5-2 實驗心得與改進空間 57 第六章 參考文獻 58

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