本論文分成兩部分研究，第一部分為具梯度之組合式濺鍍製備ZTO透明導電膜，第二部分為共濺鍍之組合式濺鍍製備高熵合金催化劑。
透明導電氧化物薄膜 (transparent conducting oxide, TCO) 由於其高透明度和優異的導電性而被廣泛用作太陽能電池和顯示器的電極。因此，Zn-Sn-O (ZTO) 等多組分氧化物引起了廣泛關注。儘管ZTO中沒有昂貴的元素，但製造和研究具有不同Zn/Sn比的ZTO 是昂貴且耗時的，在這項工作中，應用組合方法的概念來沉積交替的ZnO 和 SnO 楔，兩個傾斜表面接觸以形成具有均勻厚度的薄膜。如此製備的ZTO薄膜因此具有跨膜的組成分佈，進而研究ZTO薄膜的晶體結構和物理性質。
高熵合金(high entropy alloy, HEA)催化劑以不同形態的薄膜催化劑在氣體析氧反應（oxygen evolution reaction, OER）中提供了優於催化劑顆粒的顯著優勢，所以利用了濺射沉積的優勢在此論述了用於析氧反應的HEA薄膜電催化劑，不僅研究了沉積狀態下的催化劑特性，而且還研究了 OER 期間和之後的催化劑特性，為了進行比較，本研究製備了一元、二元、三元、四元、五元薄膜催化劑。使用密度函數理論計算在實驗和理論上研究了由於添加金屬引起的表面電子結構改性。證明了濺射的 FeNiMoCrAl 高熵薄膜的OER性能優於所有文獻的HEA催化劑，具有強大的電催化活性，在 10 mAcm-2 下具有220 mV的低過電勢，並持續50 小時測試，在 10 和 100 mAcm-2 的不同恆定電流密度下具有出色的電化學穩定性。此外，我們還研究了OER過程中的微觀結構轉變，這對於理解 HEA 電催化劑提供的 OER 機理很重要，這樣的發現將有助於未來的催化劑設計。

This paper is divided into two parts. The first part is the ZTO gradient film by combinatorial sputtering. The ZTO thin film thus prepared has compositional spread across the film. The electrical resistance and crystallinity decreases and increases with the Zn concentration. The average transmittance of the ZTO thin film is 96.8%, and the optimized sheet resistance is 24Ω/□ at Zn-rich side. The second part is the high-entropy alloy catalyst by combined sputtering of co-sputtering. The finding is important since it bears information for future catalyst design. We demonstrate that the best-performed catalyst outperforms all the reported HEA catalysts, giving an outstanding overpotential of 220 mV at 10 mA cm-2, and excellent electrochemical stability at different constant current densities of 10 and 100 mA cm-2 for 50 h.

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