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研究生: 陳彥志
Chen, Yen-Chih
論文名稱: 氧化鎵奈米線及氧化銦顆粒成長及分析
Growth and charactization of gallium oxide and indium oxide crystals
指導教授: 劉全璞
Liu, Chuan-Pu
學位類別: 碩士
Master
系所名稱: 工學院 - 材料科學及工程學系
Department of Materials Science and Engineering
論文出版年: 2004
畢業學年度: 92
語文別: 中文
論文頁數: 81
中文關鍵詞: 奈米線
外文關鍵詞: nanowires
相關次數: 點閱:93下載:3
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  •   本研究是去探討氧化鎵的一維奈米結構及氧化銦顆粒,實驗中藉由簡單的加熱式管狀爐(Thermal CVD)來成長氧化鎵奈米線和氧化銦顆粒,針對不同的實驗參數的改變,可以得到許多不同的一維奈米結構,例如:奈米針、奈米柱、奈米帶,並且從奈米線的頂端未含催化劑可知成長機制不是一般用於成長奈米線的VLS 方法,而是屬於VS 的成長模式,並且在奈米線和奈米柱的成長中,由顆粒和VS 成長模式共同控制其成核及成長,另外由實驗中改變氧分壓及真
    空度的多寡會造成由奈米線改變成奈米帶,奈米線的結構我們藉由TEM 的電子繞射圖可知其為單斜晶的β相氧化鎵所組成,從電性的量測中我們可以得到有關於氧化鎵奈米線的field emission 性質;在另外一方面,我們同時利用金屬銦反應形成氧化銦的顆粒,實驗中可以獲得許多不同的型態的顆粒,但是並無氧化銦奈米線的生成,因此在本研究中我們對於氧化鎵及氧化銦所造成的不同結構做比較及探討。

      This research uses thermal chemical vapor deposition (CVD) to grow gallium oxide one dimensional nanostructures and indium oxide crystals.For the former,we studied various morphologies of the gallium oxide one dimensional nanostructures such like nano-wires, nano-rods, nano-belts by changing experimental parameters.Due to no catalysts on the Ga2O3 nano-wires and nano-wires only nucleate on crystals,so it can be proposed that Ga2O3 nano-wires followed the complex growth mechanisms composed by vapor-solid(VS) models and crystals nucleation and growth.But we can observe nano-belts only followed by VS growth methods.While changing oxygen partial pressure and working pressure,the shapes of gallium oxide one dimensional nanostructures can be transformed from nano-wires to nano-belts. We can obtain TEM electron diffraction pattern indicates that as-synthesized products are monoclinic β-gallium oxide nanowires. Finally we can obtain Ga2O3 nano-wires had good field emission property
      For the indium oxide crystals,we also studied various morphologies of the indium oxide crystals.We tried to use the same experimental parameters on Ga2O3 nano-wires to grow indium oxide nanowires but we can find as-synthesized products were indium oxide crystals by TEM and XRD measurements.

    第一章緒論----------------------------------------------1 第一節前言------------------------------------------------------------------- 1 第二節研究動機及目的----------------------------------- 8 第二章理論基礎----------------------------------------9 2-1 化學氣相沈積法---------------------------------------- 9 2-2 奈米線之成長方法------------------------------------- 10 2-2.1 VLS 成長機制-----------------------------------------------10 2-2.2 SLS 成長機制------------------------------------------------14 2-2.3 VS 成長機制-------------------------------------------------15 2-2.4 其他直接反應機制-----------------------------------------18 第三章實驗方法----------------------------------------25 3.1 化學氣相沈積製作氧化鎵奈米線及氧化銦顆粒-- 25 3-1.1 實驗流程-----------------------------------------------------25 3-1.2 基板處理-----------------------------------------------------26 3-1.3 實驗裝置-----------------------------------------------------28 3-1.4 實驗步驟-----------------------------------------------------30 3.2 實驗分析-------------------------------------------------- 33 3-2.1 掃瞄式電子顯微鏡-----------------------------------------33 3-2.2 穿透式電子顯微鏡-----------------------------------------34 3-3.1 粉末X 光繞射儀-------------------------------------------35 3-3.1 場發射性質量測--------------------------------------------36 第四章結果與討論-------------------------------------38 第一節氧化鎵奈米線的製作與性質-------------------- 38 4-1.1 成長氧化鎵奈米線-----------------------------------------38 4-1.2 奈米線的成分及結構分析--------------------------------45 4-1.3 反應物對奈米線的影響-----------------------------------53 4-1.4 氧化鎵的奈米帶--------------------------------------------56 4-1.5 奈米線成核及成長之探討--------------------------------58 4-1.6 奈米線的性質分析-----------------------------------------65 第二節氧化銦顆粒的製作與性質----------------------- 67 4-2.1 成長氧化銦顆粒--------------------------------------------67 4-2.2 氧化銦之成分及結構分析--------------------------------69 4-2.3 氧化銦之成長分析-----------------------------------------71 4-2.4 氧化銦顆粒與氧化鎵奈米線之綜合討論--------------73 第五章結論----------------------------------------------75 第六章參考文獻----------------------------------------77

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