微/奈米製程技術近年來發展快速且成熟，因此藉由該技術製作表面週期結構，使材料具有波長偏好或極化方向選擇性質的輻射性質便不再困難，至今有相當多光學或能源轉換元件被設計並且實現，例如特定波段之濾波器和熱放射器。本研究目的在承襲實驗室既有研究成果，更深入且完整探討樣本結構「尺寸變化」、「形貌複雜」及「材料多樣」對輻射性質之影響及伴隨之物理機制。關注的樣本是雙面拋光之矽基板，上有金屬(Al、Cr和Ti)覆蓋矽結構或無金屬覆蓋之矽結構，而結構本身為一維或二維之週期微米結構，結構上表面則平行基本底面。文中係針對樣本在波長範圍2.5 μm 至 25 μm下的輻射性質做數值與實驗結果的對照，並且探討輻射性質頻譜中特殊現象之物理機制，以及性質隨結構尺寸、材料及入射極化方向的差異。研究分為三大部份︰結構實作、性質量測與數值模擬，其中週期結構的製作是透過微/奈米製程技術，在矽基板上進行曝光顯影、蝕刻、移除光阻與金屬蒸鍍這些步驟完成；輻射性質量測部份則是使用傅立葉轉換紅外線(FTIR)光譜儀，量測樣本在正向入射的穿透率與30度入射的反射率；而數值模擬是以嚴格耦合波理論(RCWA)為基礎，計算樣本的輻射性質與電磁場分佈。

Recent advancement in micro/nano-fabrication has facilitated tailoring radiative properties with periodic structures of designed profiles. A lot of optical or energy conversion devices have been successfully realized, such as band filter and thermal emitter. The purpose of this work is to discuss more deeply and completely about radiative properties of samples influenced by dimension variation, morphology complexity, and material diversity with physical mechanisms following research results established by our laboratory. Radiative properties of a silicon substrate with 1-D or 2-D metallic (Al, Cr, and Ti)/silicon periodic microstructures are both numerically and experimentally investigated at wavelengths between 2.5 m and 25 m. This thesis is divided into three parts: structure fabrication, radiative properties measurements, and numerical study. First, the periodic structures are fabricated with lithography, dry etching, stripping the photoresist, and metal deposition. Second, normal transmittance and reflectance at oblique incidence from samples are measured by the Fourier Transform Infrared (FTIR) spectrometer. Third, simulation results based on the rigorous coupled-wave analysis (RCWA) is employed to calculate radiative properties and electromagnetic field distributions. In the end, measurement results are compared with the simulation ones to analyze the radiative properties. Unique features in spectra are explained with physical mechanisms.

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