本研究主要討論雷射製程中雷射光壓作用於微粒之影響，利用雷射光壓施加於微粒之作用力將物體定位、排列或堆積，可成為雷射製程中一種新的應用。由於光壓現象是雷射光與微粒之間複雜的交互作用，目前並沒有一種可廣泛適用於所有狀況的理論模型，常用的模型分為「幾何光學模型」及「電磁波模型」。本文將對「幾何光學模型」進行修正，討論如何降低在計算微粒較小的粒子時的誤差，使此模型能準確預估微粒所受的光壓作用力，達到準確控制微粒的目的。
文中提出修正高斯光束模式，考慮光束經由曲線聚焦後為一個面而非一個點，並由文獻及實驗中分別比較不同參數條件下，使用一般幾何光學模型及修正模式分別得到的理論計算值，與實驗量測值互相比較的結果。
從研究中可以發現幾何光學模型在配合使用高倍率物鏡及較大微粒粒徑的情形下，理論值與實驗值相當接近；但是在使用低倍率物鏡或小粒徑微粒時，誤差會增大。而經過修正後之模型，在高倍率物鏡、微粒粒徑足夠大的情形下得到的結果與幾何光學模型之結果相當接近；且在使用低倍率物鏡或小粒徑微粒時，與實驗值相較仍具有相當的準確度，因此修正後的模型適用的情形更廣泛，可用來準確估算光壓作用力。

The aim of this thesis is to study the radiation pressure of laser beam distributed on the spherical particle. The particles in laser processes can be located and concentrated by the radiation pressure. Since the phenomenon of radiation pressure is complicated and there is no existing model that can fit all situations. The prediction of radiation pressure mainly involves two approaches - ray optics model and electromagnetics model. This study has modified the ray optics model to reduce the deviations in the calculation for smaller particles.
Considering the Gaussian beam mode, it was assumed that the beam focus is on a plane but not on a point as treated in most cases of literature. From the results of the modified ray optic model, the computation results have been compared with the experiments with various parameters from the literature.
It can be found that the errors between the calculation results based on the ray optics model and the experiment results increase with low numerical aperture lenses or small particles. And there is a good agreement between the calculation results based on the modified ray optics model and the experiment results. However the modified ray optics model provides an accurate prediction in most situations, and it shows the possibilities of the new model in the applications for the laser material processes.

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