類鑽碳材料為同時具有sp2與sp3鍵結的晶格結構，類似鑽石型態的物質，其具有許多特性，機械性質良好、耐磨耗、抗沾黏、硬度高、低摩擦係數、表面平滑、以及絕佳的化學惰性，因而比其他材料更適合用在模具、刀具、光學領域上，目前已在工業界被廣泛的使用。
本研究利用高功率脈衝磁控濺鍍(high power impulse magnetron sputtering, HiPIMS)與中空陰極放電(hollow cathode discharge)結合，利用高功率脈衝磁控濺鍍的瞬間高電流，給予電子高能量，再利用中空陰極管，電子在管壁間來回震盪，以提升電子與粒子碰撞的機率，增加電漿整體的解離率。後來再添加外加磁場，使中空陰極管中的電漿更加的集中，使電漿密度更高。並利用苯為碳源，來沉積類鑽碳薄膜。
研究結果透過SEM觀察薄膜橫截面結構與薄膜厚度，以拉曼光譜(Raman)來鑑定薄膜的微結構分析，再以光學顯微鏡(OM)觀察薄膜的表面型態。由結果顯示，隨著外加線圈的電流增加，類鑽碳薄膜的鍍膜速率會有顯著的提升；在適當的外加磁場下，薄膜的ID/IG下降，整體薄膜的sp3含量增加，類鑽碳薄膜的品質提升。

In this study, in order to decrease the process pressure, the different diameters of hollow cathode were changed. And a solenoid coil was added around the hollow cathode to increase the hollow cathode discharge current. The diamond-like carbon (DLC) films were deposited on Si (100) substrate by high power impulse magnetron sputtering (HiPIMS) and hollow cathode discharge (HCD). Scanning electron microscope (SEM), Raman spectrum, and optical microscope (OM) were used to examine the microstructure and mechanical properties of the films. The results showed that the DLC films with coil current 4A had the best sp3 bonding and mechanical properties.

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