研究生: |
廖至為 Liao, Chih-Wei |
---|---|
論文名稱: |
硒化鉍拓樸絕緣體摻雜銻及鉻之電性及磁性探討 Magnetic and Electrical Properties of Cr and Sb Doped Bi2Se3 Topological Insulator |
指導教授: |
黃榮俊
Huang, Jung-Chun |
學位類別: |
碩士 Master |
系所名稱: |
理學院 - 物理學系 Department of Physics |
論文出版年: | 2016 |
畢業學年度: | 104 |
語文別: | 英文 |
論文頁數: | 85 |
中文關鍵詞: | 硒化鉍 、銻摻雜 、鉻摻雜 、角分辨光電子能譜 、磁導 |
外文關鍵詞: | Bi2Se3, Sb doping, magnetic doping, ARPES, magnetocinductivity |
相關次數: | 點閱:87 下載:9 |
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本實驗是透過分子束磊晶(MBE)成長硒化鉍拓樸絕緣體摻雜銻及鉻之20奈米薄膜,由反射式電子高能繞射(RHEED)、X-ray繞射分析(XRD)及原子力顯微鏡(AFM)去觀察不同參數的樣品晶格結構,經過成大微奈米中心的微影系統將樣品製作成Hall bar元件以便量測精準電性,元素分析及能帶結構分別是在國家同步輻射中心(NSRRC)進行X光射線電子能譜(XPS)及 角分辨光電子能譜(ARPES)之量測,再將已選好之最佳成長參數樣品送去量測PPMS,藉由量測樣品之磁阻變化可分別在有摻雜磁性原子鉻及無摻雜磁性原子鉻之拓樸絕緣體看到弱返局域性(WAL)及弱局域性(WL)的轉變;另外,我們也可藉由磁導的曲線變化證明在硒化鉍拓樸絕緣體共摻替及鉻中,固定鉻的含量且增加銻的含量可有效增加磁性對於局域性的影響,進一步推論,我們可以在避免過量摻雜磁性造成的結構破壞的狀況下,單純增加銻的含量就可以去提高樣品的居禮溫度(Tc)。
Sb doped and Cr doped Bi2Se3 topological insulators have been established on sapphire (0001) substrate by molecular beam epitaxy (MBE). Structural characterization and electrical properties were verified by in-situ reflection high energy electron diffraction (RHEED), ex-situ atomic force microscopy (AFM), X-ray diffraction (XRD) and carrier density measurements. The real concentration of each element in our sample were verified by X-ray photoelectron spectroscopy (XPS) and the band structure of samples were revealed by angle-resolved photoemission spectroscopies (ARPES). The weak-anti localization (WAL) and weak localization (WL) performance were investigated in Sb doped Bi2Se3 and Cr-doped Bi2Se3 through the magnetoconductivity. Further increase Sb doping with Cr-doping fixed would enhance WL behavior in Sb,Cr co-doped Bi2Se3. In addition, the curie temperature of Cr-doped Bi2Se3 was observed by the exchanging performance of magnetoconductivity with the altering measured temperature.
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