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研究生: 閻祥宇
Yen, Hsiang-Yu
論文名稱: 以實驗設計探討超短脈衝雷射矽通孔之最佳矽材移除率
Maximizing Silicon Removal Rate for Through-Silicon-Via by using Ultrashort Laser and Experimental Design Approach
指導教授: 賴新一
Lai, Hsin-Yi
學位類別: 碩士
Master
系所名稱: 工學院 - 機械工程學系
Department of Mechanical Engineering
論文出版年: 2014
畢業學年度: 102
語文別: 中文
論文頁數: 83
中文關鍵詞: 矽通孔實驗設計分子動力矽通孔移除率
外文關鍵詞: Through-Silicon-Via, molecular dynamics, experimental design, silicon removal rate
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  • 為提升脈衝雷射矽穿孔之生產效率,以達到有效降低成本及提高產量之目的,本研究以實驗設計探討提升矽通孔矽材移除率最有佳解,並更進一步提出降低能耗與提高產率之方案,以下為詳述。
    矽通孔成型的技術有化學蝕刻與脈衝雷射加工兩種類型,目前在業界採用蝕刻技術,主要原因在於蝕刻製程之效率較雷射加工高,但蝕刻有著機台昂貴、精度受限、汙染環境且對非金屬材料製程難以繼續突破,而脈衝雷射加工雖然的效率雖不及蝕刻,但產品精度高,也沒有上述的汙染及製程難以繼續突破的問題;故本文之目標即為如何在雷射脈衝較弱項矽材移除率作一有效之提升,以便在未來業界發展更精細孔洞時能有更廣的應用。
    本研究以分子動力學配合實驗設計法設計出一套完整的實驗系統,並選擇七項因子作為變數,而後透過實驗本研究發現單一脈衝能量、脈衝頻率、通孔直徑及材料厚度等四項因子對系統有顯著的影響,且系統模型配適度達98.38%,代表此模型夠符合實際狀況。最後再透過調控貢獻度提出一套在能耗與在矽材移除率優化後之模型,而此模型在考量成本後發現,在同成本之情形下,有效的提高生產效率達18.7%。

    This study is targeting on how to enhance the silicon drilling materials removal rate of Through-Silicon-Via (TSV) by using ultrashort laser and experimental design for the purpose to raise the production efficiency, and to lower the cost for a better silicon removal rate.
    This work is to simulate the hole-drilling process by ultrashort laser using molecular dynamics modeling technique and experimental design. First, seven related variables are selected as associated factors and being tested. Four significant ones to the system are identified by fractional factorial design technique. Those include the laser energy per pulse, laser frequency, hole diameter, and the thickness of our silicon product. To further prove the accuracy of the model, exhaustive factorial design is then used to fit with the numerical experimental data and to get the model as well. The results obtained are found for up to 98.38% adequacy being suitable to the real data.
    To build a better model on both higher silicon removal rate and lower energy consumption, the inverse Yates algorithm is then used for optional redesign. As compared to the results from laser pulse technique are found much better in process accuracy. By combining ultrashort laser pulse with experimental design technique, a good enhancement on the efficiency up to 18.7% increase are obtained. Although the molecular dynamics and numerical experimental data are relatively ideal, the results are found not to far away from the real processes with great satisfaction.

    中文摘要 I Abstract II 誌謝 VII 目錄 VIII 圖目錄 XII 表目錄 XIII 符號表 XV 第一章 緒論 1 1.1 研究動機 1 1.2 研究目的 3 1.3 分子動力系統之選用 4 1.4 章節架構 4 第二章 超短脈衝雷射矽穿孔文獻回顧與實驗理論 6 2.1 超短脈衝雷射矽穿孔與模擬之文獻回顧 6 2.1.1 超短脈衝雷射加工微孔成形發展之文獻回顧 6 2.1.2 矽穿孔於不同加工參數下之影響回顧 8 2.2 以實驗設計建構矽通孔矽材移除率之應用回顧 10 2.2.1 實驗設計方法回顧 11 2.2.1(a) 以部分因子設計法篩選顯著因子 13 2.2.1(b) 以變異數分析探就因子效應 16 2.2.1(c) 以完全因子設計法分析因子主交效 19 2.2.1(d) 透過順向分析法求得系統回歸方程 21 2.2.1(e) 以逆向分析逆推得實驗反應值 24 2.2.2 實驗設計應用於超短脈衝雷射微孔成型之文獻回顧 27 2.3 以分子動力理論建構雷射矽通孔模擬之應用回顧 27 2.3.1 分子動力學模擬之方法回顧 28 2.3.1(a) Tersoff勢能函數 28 2.3.1(b) Verlet數值積分法 31 2.3.1(c) Neighbor list 鄰居表列法 32 2.3.2 以分子動力模擬超短脈衝雷射矽通孔之文獻回顧 32 2.4 本文之基本假設與研究總流程 33 第三章 超短脈衝雷射矽通孔矽材移除模型建構 36 3.1 矽通孔理論架構與提升矽材移除率系統建構流程 36 3.2 以分子動力學建構超短脈衝雷射矽通孔理論架構 38 3.2.1 矽通孔矽材原子動能與位置計算系統 40 3.2.2 矽通孔之超短脈衝雷射加工系統 40 3.2.3 矽穿孔之模型建立與靶材邊界條件 42 3.3 以實驗設計法建構矽通孔矽材移除率之精省模型 44 3.3.1 定義矽通孔矽材移除率與選用相關因子及其級別 44 3.3.2 以實驗設計法建構矽通孔矽材移除率精省模型 46 3.3.2(a) 以部分因子篩選影響矽材移除率之顯著因子 47 3.3.2(b) 以完全因子建構完整矽材移除率精省回歸模型 49 3.4 針對能耗及矽材移除率建構矽通孔最佳化模型 51 3.4.1 以調控貢獻度對能耗及矽材移除率之最佳化方案流程 51 3.4.2 針對能耗及矽材移除率最佳化之貢獻度調控流程 54 3.5 矽材移除率及能耗最佳化後與現行業界比對方案 55 第四章 矽通孔矽材矽材移除率模擬結果與分析 58 4.1 影響矽材移除率之因子顯著性篩選 58 4.2 矽材移除率之主交效分析與回歸方程求取 60 4.3 因子對矽材移除率之影響分析 63 第五章 提高矽材移除率與降低能耗之最佳化設計 64 5.1 對矽材移除率及能耗之最佳化方案 64 5.2 在指定能耗內求取最佳矽材移除率之結果 66 5.3 依給定矽材移除率求取最低能耗 68 5.4 以實驗設計建構矽材移除率精省模型之結果整理 71 5.5 能耗及矽材移除率最佳化成果與業界概況比較 74 第六章 總結與未來展望 77 6.1 總結 77 6.2 未來展望 78 參考文獻 80

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