本論文提出一製程方法以避免圓孔圖樣電極液晶透鏡陣操作時之不連續線(disclination line)問題發生，其方法是製作整面或圓孔圖樣陣列之SU8光阻薄膜於圓孔圖樣銦錫氧化物電極表面，當SU8光阻薄膜條件使電場分佈改變，則液晶分子所受到作用力將有可能使其轉向一致而達到避免不連續線發生的目的。實驗結果顯示利用緩慢增加電壓的方式操作具有SU8光阻膜的液晶透鏡陣列確實可以達到避免不連續線產生，同時，液晶透鏡陣列的特性未受影響，其成像品質也較佳。此外，我們也利用先前本實驗室以聚合物穩定避免不連續線產生的方法施行於液晶透鏡陣列的製程，但效果不佳，仍須實驗找尋較適當的製程參數。

In this thesis, a proposed method used to prevent the problem of disclination line occurrence in liquid crystal lens arrays is investigated, which way is extra non-patterned or patterned SU8 photoresist films coated on patterned ITO films. When SU8 films achieve suitable conditions such as film thickness or film morphology, they will possibly provide modified electric fields in cells so that the reoriented LC molecules have same rotational directions and no disclination line occurrence. We have demonstrated and confirmed that SU8 films largely suppress possibility of disclination line occurrence when operating liquid crystal lens arrays with slowly increasing voltages. In addition, the optical performance of liquid crystal lens arrays with or without extra SU8 films is very consistent. Furthermore, the way of polymer stabilization used to prevent disclination lines is also investigated for liquid crystal lens arrays. However, the experimental results are not good enough, so that more advanced studies are needed.

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