本研究應用奈米壓印技術於高解析度圖案轉移與大面積微奈米結構之製作，整體內容可分為兩大部分。
第一部分為利用奈米壓印技術（Nanoimprint Lithography, NIL）結合金屬遮罩與乾式蝕刻製程，成功將奈米圖案轉移至具高折射率的二氧化鈦（TiO₂）薄膜，實現具高精度與良好垂直性的結構。製程中透過熱壓印成型、殘留層去除、金屬蒸鍍與舉離，完成遮罩定義，再結合蝕刻將圖案轉移至 TiO₂薄膜。
第二部分則透過奈米壓印技術於6 吋玻璃基板上之大面積均勻性結構製作進行研究。分別採用熱壓成形式奈米壓印與UV 固化壓印技術，並透過結構高度、線寬與平面誤差等量測方式分析轉印品質。實驗結果顯示，熱壓製程可成功複製與模具尺寸高度吻合之結構，展現良好的圖案再現性；而 UV 固化壓印在多區域誤差比對中，誤差小於 1 μm 的面積占比皆達到 86%以上，顯示其具備穩定的大面積轉印能力與高均勻性表現。
綜合而言，本研究建立一套結合高解析度、低成本與大面積可行性的奈米壓印製程，並成功將 TiO₂ 奈米結構製作與壓印均勻性驗證，對未來奈米光學元件與功能性表面製程之發展具有參考價值。

This study applies nanoimprint lithography (NIL) for high-resolution pattern transfer and large-area micro/nanostructure fabrication, which is divided into two main parts.
In the first part, NIL is combined with metal masking and dry etching to successfully transfer nanoscale patterns onto high-refractive-index titanium dioxide (TiO₂) thin films, resulting in structures with high precision and vertical profile. The fabrication process involves thermal imprinting, residual layer removal, metal deposition, and lift-off to define the metal mask, followed by reactive ion etching to transfer the pattern onto the TiO₂ layer.
The second part investigates the fabrication of large-area uniform structures on 6-inch glass substrates using NIL. Both thermal nanoimprinting and UV-curing imprinting techniques are adopted. Structural height, linewidth, and planar deviation are analyzed to evaluate the transfer quality. Experimental results show that thermal imprinting can faithfully replicate mold dimensions with excellent pattern fidelity, while UV-curing NIL achieves over 86% of the area within ±1 μm error across multiple regions, demonstrating its high uniformity and large-area transfer capability.
In conclusion, this study establishes a NIL process that integrates high resolution, low cost, and scalability, successfully demonstrating the fabrication of TiO₂ nanostructures and verifying large-area imprint uniformity. This process provides valuable insights for the future development of nanophotonic devices and functional surface manufacturing.

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